A trench isolated lateral insulated gate bipolar transistor
A bipolar transistor and trench isolation technology, applied in semiconductor devices, electrical components, circuits, etc., can solve problems such as increasing the concentration of the N-type drift region, enhancing the performance of the device by turn-off loss, and reducing the breakdown voltage of the device. , to achieve the effect of improving forward voltage drop and turn-off loss, improving turn-on voltage drop and turn-off loss, and low forward voltage drop
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[0024] Combine below figure 2 , the present invention is described in detail, a trench-isolated lateral insulated gate bipolar transistor, comprising: a P-type substrate 1, a buried oxide layer 2 is arranged on the P-type substrate 1, and a buried oxide layer 2 is arranged on the buried oxide layer 2. The N-type drift region 3 is provided with a P-type body region 5 and an N-type buffer layer 6 below the upper surface of the N-type drift region 3, and a P-type collector region 10 is arranged in the N-type buffer layer 6. In the P-type A collector aluminum electrode 19 is connected to the collector region 10, a passivation layer 23 and a first gate oxide layer 13 are provided on the upper surface of the N-type drift region 3, and the first gate oxide layer 13 and the P-type body region 5 are partially overlapped, there is a first polysilicon gate 16 on the first gate oxide layer 13, a first gate electrode 22 is connected to the first polysilicon gate 16, and a N Type emitter ...
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