Polishing skin and method for polishing cambered surface of micro ceramic product through same

A kind of skin grinding and product technology, applied in the field of polishing, can solve the problems of complex process and other problems, and achieve the effect of streamlined process, simplified overall structure and short production cycle

Inactive Publication Date: 2015-07-01
LENS TECH
View PDF5 Cites 14 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to meet the requirements for the development of high-end micro-ceramic products and obtain high-brightness, low-roughness curved surfaces, chemical-mechanical polishing must be performed on ceramics. In the prior art, a combination of grinding and polishing fluid is used. The existing grind

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Polishing skin and method for polishing cambered surface of micro ceramic product through same
  • Polishing skin and method for polishing cambered surface of micro ceramic product through same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] A kind of microdermabrasion 1 for polishing, its structure is detailed in figure 1 , including the first layer 11, the second layer 12 and the third layer 13 arranged in sequence from away from the product to be processed (tiny ceramic product to be processed) to close to the product to be processed (tiny ceramic product to be processed), the overall structure is simplified.

[0030] The material of the first layer 11 is sponge, its thickness is 2.0-4.0 mm, its compression ratio is 10%-30%, and its compression elasticity is 70%-95%.

[0031] The material of the second layer 12 is adhesive glue with a thickness of 30-200 microns, and the adhesive glue is acrylic adhesive.

[0032] The third layer 13 is made of resin, preferably polyurethane, with a thickness of 1.0-2.0 mm and a hardness of 50-80 degrees.

[0033] The whole structure of the polishing microdermabrasion of the present invention is simplified, and the production is convenient; the polishing microdermabrasio...

Embodiment 2

[0035] This embodiment discloses a method for polishing the curved surface of a micro ceramic product using a polishing microdermabrasion as described in Example 1. During the polishing process, the schematic diagram of the contact point between the polishing microdermabrasion and the micro ceramic product to be processed is shown in figure 2 .

[0036] The inventive method specifically comprises the following steps:

[0037] Step 1: Fix the polishing dermabrasion 1 on the lower polishing disc of the polishing machine; paste tiny ceramic products 2 to be processed with a diameter of 3-60 mm and a curved surface on the ceramic disc in batches, And be attached to the ceramic dish that the micro ceramic product 2 to be processed is fixed in the indenter of polishing machine, the processing surface of described micro ceramic product 2 to be processed is positioned at the directly above described polishing with abrasive skin; The rotating speed of described polishing disc is 40 r...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Login to view more

Abstract

The invention aims to provide a polishing skin. The polishing skin comprises a first layer, a second layer and a third layer in sequence. The first layer is made of sponge, the second layer is made of bonding rubber, and the third layer is made of resin. The polishing skin is simple in overall structure and convenient to produce; due to the combination of the sponge and the resin, the polishing skin can deform according to the cambered surface of the product to be machined in the polishing process to achieve overall cambering zero-damage polishing, and practicability is high. The invention further aims to provide a method for polishing the cambered surface of the micro ceramic product. The process is simple, and the production cycle is short. Components are easy to obtain, and the cost is low. By combining mechanical grinding with chemical etching and adopting accurate pressure control, overall cambering ultra-smooth nano-scale zero-damage precision polishing is achieved, the removal amount of 15 microns-50 microns of the ceramic product can be achieved, the first pass yield is larger than 90%, and the surface roughness is smaller than 5 nanometers.

Description

technical field [0001] The invention relates to the technical field of polishing, in particular to an abrasive skin for polishing and a method for polishing an arc surface of a tiny ceramic product using the abrasive skin. Background technique [0002] Ceramics have good wear resistance, and the hardness is second only to diamond, reaching Mohs 9. At the same time, the compactness of ceramics makes it stronger than tempered glass. The above two characteristics are very suitable for high-end watches, mobile phones and other electronic products. button etc. Therefore, the use of more environmentally friendly ceramics to replace traditional plastics and tempered glass materials as the buttons of electronic products has gradually changed from concept to reality. [0003] Because of the tiny size of the ceramic products, ordinary polishing technology is difficult and the production capacity is low, such as watch buttons with a diameter of 3-8mm and a thickness of 0.3-1.0mm. [...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): B24D11/02B32B27/06B32B5/18B24B19/26
CPCB24D11/02B24B19/26B32B5/18B32B7/12B32B27/065B32B27/40B32B2250/02B32B2305/022B32B2375/00
Inventor 周群飞饶桥兵郑涛
Owner LENS TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap