A shielding disk transmission device, reaction chamber and plasma processing equipment

Abstract

The invention relates to a shielding disc transfer device, a reaction chamber and a plasma processing apparatus. The shielding disc transfer device comprises a cylinder, a bearing arm, a first detection device, a second detection device, a third detection device and a fourth detection device; a shielding disc is arranged on the bearing arm; the cylinder is fixedly arranged on the chamber wall of the reaction chamber; the piston rod of the cylinder is connected with the bearing arm and used for driving the bearing arm to more straight back and forth, and then the shielding disc is capable of moving to a safe position or above a bearing device; the first detection device and the second detection device are arranged on the cylinder at an interval along the motion displacement of a piston in the cylinder and used for detecting the position of the piston; the third detection device corresponds to the inner edge of the shielding disc in the vertical direction and corresponds to the outer side of the bearing arm; the fourth detection device corresponds to the outer side of the shielding disc in the vertical direction, and is located in the motion path of the shielding disc between the safe position and the position above the bearing device. The shielding disc transfer device is lower in cost and simpler in the shielding disc transfer process.

Description

technical field [0001] The invention relates to the field of semiconductor equipment manufacturing, in particular to a shielding disk transmission device, a reaction chamber and plasma processing equipment. Background technique [0002] Physical vapor deposition (Physical Vapor Deposition, hereinafter referred to as PVD) equipment is a widely used plasma processing equipment, which is mainly used to deposit thin films on the surface of substrates and other processed workpieces. PVD methods include vacuum evaporation, sputtering coating, and arc plasma coating, and, so far, PVD methods can not only deposit metal films, but also deposit alloy films, compound films, ceramic films, semiconductor films, etc. [0003] In practical applications, before the deposition process, it is usually necessary to perform a cleaning process on the target exposed to the atmosphere or out of service for a period of time (that is, to clean off the oxides or other impurities formed on the surface ...

AI Technical Summary

Problems solved by technology

[0005] However, the use of the above-mentioned reaction chamber will inevitably have the following technical problems in practical applications: because the transmission of the shielding disk 15 between the garage 16 and the carrier 11 is realized by driving the shielding disk 15 to rotate through the shielding disk transmission device , its transmission movement process is relatively complicated; at the same time, the third drive unit 18 in the shielding disk transmission device adopts a rotating motor, and its cost is relatively high

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