Device and method for measuring film thickness

Abstract

The invention provides a measurement device and a measurement method for film thickness, and belongs to the field of photoelectric detection. A laser is used for transmitting laser to be functioned on the surface of a material through a focus lens, so as to generate a laser plasma flashing signal; the laser passes through the focus lens and a band elimination filter, enters a photoelectric detector, and then is converted into a voltage signal processed by a processor through an oscilloscope; when the laser energy is large enough, the laser punctures a film material, appears a pit in a flashing intensity curve of a laser-induced plasma, and a linear relation is formed between the time of appearing the pit and the thickness of the film material. According to the measurement device for the film thickness provided by the invention, expensive micro instruments, such as an AFM (Atomic Force Microscope), cannot be needed, the environmental requirement is lower, no tool contact is caused in an integral measurement process, and the cost of changing the measurement tool can be saved and changed; furthermore, the measurement device is easy to operate and is convenient for a worker to use, and can be integrated on an automatic production line, thereby being likely to be popularized and applied in an industrial field.

Description

Technical field [0001] The invention belongs to the field of photoelectric detection, especially a device and method for measuring film thickness. Background technique [0002] Films are widely used in industry, and many performance indicators of films are related to their thickness. The measurement of film thickness is one of the basic inspection items in the film manufacturing industry. With the advancement of manufacturing technology and the miniaturization of instruments and equipment, micro-nano thin films endow the matrix materials with special physical and chemical properties and produce special application values. Therefore, the thickness detection of micro-nano thin films has also become a hot spot in scientific research. [0003] Films can be divided into two types: transparent and opaque. The high-precision measurement of transparent film thickness is mostly achieved by optical methods. For example, Chinese patent CN 102607435 B uses double slit interferometry to measu...

AI Technical Summary

Problems solved by technology

[0004] For the measurement of micro-nano opaque films, there are mainly two types of existing technologies: (1) The film thickness is calculated according to the empirical law that the coating thickness increases linearly with the coating time, but the detection results are not reliable, because the conditions of each coating cannot be completely Similarly, the rate of coating will change, thereby not conforming to the linear rule; (2) adopt high-precision microscopic equipment, such as atomic force microscope, transmission electron microscope, etc., the price of microscopic equipment is expensive, and the operation is complicated, which is not conducive to popularization, and it is harmful to thin film There are also special requirements for the performance of the nanometer film. For example, the scanning probe microscopic technology of the atomic force microscope requires the nano film to be tested to have sharp edges; industrial production urgently needs to develop a high-precision measuring device and method for the thickness of the micro-nano film. Low cost, no expensive equipment, easy to operate and popularize

Images