Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Natural silk facial mask base cloth and preparation method thereof

A natural silk and facial mask technology, applied in non-woven fabrics, silk fiber production, fabric surface trimming, etc., can solve the problems of high processing cost, waste of sericin protein, waste of resources, etc., achieve short processing process and increase hydrophilicity , the effect of improving softness

Active Publication Date: 2015-07-08
肖家涛
View PDF16 Cites 27 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0016] It can be seen that the silk non-woven fabrics involved in the data mainly use silk short fibers, that is, the leftovers produced during the silk reeling process. After degumming and refining processes, they are mixed, loosened, and carded. Then it is made by spunlace reinforcement, which has a long production process and high processing cost. In the production process, all the sericin on the surface of the silk must be removed, and sericin itself is also a protein with excellent cosmetic effects. For the smooth progress of subsequent processing, all sericin must be removed during the refining process, and then the waste liquid containing sericin is discharged into the environment, which wastes resources and pollutes the environment
Therefore, in order to overcome the complex technological process, high cost and waste of sericin in the existing silk mask base fabric production method, the present invention provides a kind of silk mask prepared from 100% natural silk filaments, which is thin and transparent, moisture-absorbing and moisturizing, and contains some Silk mask base material of sericin and preparation method thereof

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Natural silk facial mask base cloth and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0041] 1. Preparation of flat silk sheet

[0042] Put the mature and uniform silkworms on the flat spinning net, the size of the spinning net is 2m x 1m in length and width, and the amount of cooked silkworms is 500 heads / square meter. , Catch the cooked silkworms on another flat silk spinning net to continue spinning, and so forth until the silk spinning stops.

[0043] 2. Degreasing and softening treatment

[0044] 1) Use an aqueous solution with a bath ratio of 1:90, in which the amount of deoiling spirit is 0.05%, Na 2 CO 3 The dosage is 0.05%, the dosage of penetrant JFC is 0.2%, the treatment temperature is 40℃, the treatment time is 50min, and then washed with water until the pH value is neutral;

[0045] 2) Use an aqueous solution with a bath ratio of 1:120, in which the amount of softener is 0.8%, the amount of glacial acetic acid is 0.2%, the treatment temperature is 40°C, the treatment time is 60 minutes, and then washed with water until the pH value is neutr...

Embodiment 2

[0052] 1. Preparation of flat silk sheet

[0053] Put the mature and uniform silkworms on the flat spinning net. The size of the spinning net is 2m x 1m in length and width. The amount of cooked silkworms is 600 heads / square meter. , Catch the cooked silkworms on another flat silk spinning net to continue spinning, and so forth until the silk spinning stops.

[0054] 2. Degreasing and softening treatment

[0055] 1) Use an aqueous solution with a bath ratio of 1:90, in which the amount of deoiling spirit is 0.1%, Na 2 CO 3 The dosage is 0.1%, the dosage of penetrant JFC is 0.4%, the treatment temperature is 50℃, the treatment time is 60min, and then washed with water until the pH value is neutral;

[0056] 2) Use an aqueous solution with a bath ratio of 1:120, in which the amount of softener is 1.2%, the amount of glacial acetic acid is 0.6%, the treatment temperature is 50°C, the treatment time is 70 minutes, and then washed with water until the pH value is neutral;

...

Embodiment 3

[0063] 1. Preparation of flat silk sheet

[0064] Put the mature and uniform silkworms on the flat spinning net, the size of the spinning net is 2m x 1m, and the amount of cooked silkworms is 700 heads / square meter. When the silk spinning amount of cooked silkworms reaches 50 g / square , Catch the cooked silkworms on another flat silk spinning net to continue spinning, and so forth until the silk spinning stops.

[0065] 2. Degreasing and softening treatment

[0066] 1) Use an aqueous solution with a bath ratio of 1:90, in which the amount of deoiling spirit is 0.3%, Na 2 CO 3 The dosage is 0.2%, the dosage of penetrant JFC is 0.6%, the treatment temperature is 60℃, the treatment time is 70min, and then washed with water until the pH value is neutral;

[0067] 2) Use an aqueous solution with a bath ratio of 1:120, in which the amount of softener is 2%, the amount of glacial acetic acid is 1%, the treatment temperature is 60°C, the treatment time is 80 minutes, and then w...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Lengthaaaaaaaaaa
Lengthaaaaaaaaaa
Lengthaaaaaaaaaa
Login to View More

Abstract

The invention discloses natural silk facial mask base cloth which is made of a 100% natural silk filament sheet. The silk filament sheet is subjected to deoiling and softening treatment and then subjected to hot rolling by a roller so that sericin left on the surfaces of silk filaments can be fixed in a bonding mode, and then the natural silk facial mask is formed. The natural silk facial mask base material is of a filament structure and is good in transparency, water absorbency and water-retaining performance and soft and is closely attached to the skin without fiber tows; moreover, sericin protein left on the surface of silk has various beautifying functions of whitening, absorbing ultraviolet light and the like, and the natural silk facial mask base cloth can be used in cooperation with beauty fluid and can also be used independently, is an ideal material for making a beauty make and has good market prospects.

Description

technical field [0001] The invention relates to the field of cosmetic products, in particular to a 100% natural silk filament facial mask base fabric which is thin and transparent, has good water absorption and water retention properties, is close to the skin without dandruff, is soft, and has cosmetic functions on the skin. Background technique [0002] Mask is a very widely used beauty product, usually composed of mask base cloth and beauty liquid, when in use, the beauty essence is applied to the face through the mask base cloth, here the base cloth not only acts as a carrier, but also The base fabric plays a very important role in the facial mask to transmit its own functionality with the help of close contact with the skin. [0003] Mask base fabrics are generally made of non-woven fabrics, which use the porosity of non-woven fabrics and the moisture absorption and functionality of the fibers used to achieve better cosmetic effects. The research on non-woven base fabri...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): D04H3/015D04H3/14D06C19/00
CPCD01B7/00D04H3/015D04H3/14
Inventor 钱程
Owner 肖家涛
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com