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Alkenyl-containing pyrazoline sensitizer as well as preparation method and application thereof

A technology of alkenyl pyrazoline and sensitizer, applied to alkenyl pyrazoline-containing sensitizer and preparation thereof, the application field of the sensitizer in the field of photocuring can solve the problem of odor, Easy migration, unsatisfactory solubility, etc.

Active Publication Date: 2015-09-09
CHANGZHOU TRONLY ADVANCED ELECTRONICS MATERIALS CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when these existing pyrazoline compounds are used as sensitizers, there are more or less disadvantages such as unsatisfactory solubility, odor, easy migration, and poor sensitivity enhancement effect.

Method used

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  • Alkenyl-containing pyrazoline sensitizer as well as preparation method and application thereof
  • Alkenyl-containing pyrazoline sensitizer as well as preparation method and application thereof
  • Alkenyl-containing pyrazoline sensitizer as well as preparation method and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0036]

[0037](1) Add 183g of p-hydroxybenzaldehyde, 5g of catalyst pyridinium p-toluenesulfonate, and 300mL of dichloromethane into a 1000mL four-neck flask, add 126g of dihydropyran dropwise at a temperature of 50°C, dropwise for about 1h, dropwise After completion, continue stirring for 10 h, track the reaction until the liquid phase does not change and close the reaction, and then remove the dichloromethane by rotary evaporation to obtain 275 g of intermediate 1a with a purity of 98%, which is directly used in the next reaction;

[0038] (2) Add 247g of intermediate 1a, 144g of acetophenone, and 300mL of methanol to a 1000mL four-neck flask, stir in a water bath at room temperature, add 80g of 40% sodium hydroxide solution dropwise within 2h, then continue to stir for 6h, and follow the reaction in the liquid phase to No change occurred, filtered, recrystallized from methanol, and dried to obtain 330 g of solid, namely intermediate 1b, with a purity of 93%;

[0039] (3...

Embodiment 2

[0046]

[0047] Add intermediate 1d (94.3g, 0.3mol), toluene (50mL), epichlorohydrin (27.8g, 0.3mol), tetrabutylammonium bromide (0.5g) to a 500mL four-necked flask, and control the temperature for 70 React at around ℃ for 5 hours, follow the liquid phase to complete the reaction, then lower it to room temperature, add 20g of sodium hydroxide, control the temperature below 30°C and react for 3 hours, follow the liquid phase to complete the reaction, then add 100mL of water and stir, extract the water layer with toluene, and combine The toluene layer was rotary evaporated to obtain 106.6 g of product intermediate e.

[0048] Take intermediate e (37.0g), methacrylic acid (8.6g, 0.1mol), toluene (30mL), triphenylphosphine (0.1g), p-hydroxyanisole (0.1g), react at 110°C for 5h, and react After completion, cool down to room temperature, wash the toluene layer with water, spin the toluene product solution, recrystallize methanol, and obtain 41.6 g of product 2 with a yield of 88%...

Embodiment 3-14

[0052] With reference to the method of Example 1 or 2, the product 3-14 with the structure shown below is synthesized:

[0053]

[0054]

[0055] performance evaluation

[0056] By preparing an exemplary photocurable composition (ie, a photosensitive resin composition), the application performance of the sensitizer represented by formula (I) of the present invention is evaluated.

[0057] 1. Preparation of performance evaluation objects

[0058]

[0059] Fully stir and mix the photosensitive resin composition and PGMEA (propylene glycol methyl ether acetate) with the composition shown in Table 1, and use a bar to coat the surface of a 19 μm thick polyethylene terephthalate film as a support Evenly coated on the surface, and then dried in a dryer at 95° C. for 4 minutes to form a photosensitive resin layer with a thickness of 40 μm.

[0060] Next, a polyethylene film having a thickness of 23 μm was bonded as a protective layer on the surface of the photosensitive re...

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PUM

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Abstract

The invention discloses an alkenyl-containing pyrazoline sensitizer as well as preparation method and application thereof. When used in a photocuring system, the alkenyl-containing pyrazoline sensitizer is very ideal in dissoluvability, free of odor and excellent in sensitivity improvement effect, and a film made of the alkenyl-containing pyrazoline sensitizer is very good in resolution ratio and adhesion property.

Description

technical field [0001] The invention belongs to the field of organic chemistry, and in particular relates to an alkenyl-containing pyrazoline sensitizer, a preparation method thereof, and an application of the sensitizer in the field of photocuring. Background technique [0002] Ultraviolet light curing technology has been widely used due to its advantages of fast curing speed and low environmental pollution, among which the photoinitiator plays a decisive role in the light curing efficiency. In actual use, some photoinitiators cannot initiate polymerization well due to the limitation of the absorption wavelength, and often need to be used in conjunction with a sensitizer to improve the initiation efficiency. The sensitizer can continuously transfer the absorbed energy to the photoinitiator, which is equivalent to the catalyst of the photochemical reaction. [0003] However, the application of sensitizers is restricted by many factors, such as solubility, matching of absorp...

Claims

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Application Information

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IPC IPC(8): C07D231/06C08F2/48G03F7/004
CPCC07D231/06C08F2/48G03F7/004
Inventor 钱晓春胡春青衡京王兵于培培
Owner CHANGZHOU TRONLY ADVANCED ELECTRONICS MATERIALS CO LTD
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