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Ion bombardment device and substrate surface cleaning method using same

An ion bombardment, substrate technology, applied in ion implantation plating, metal material coating process, vacuum evaporation plating and other directions, can solve the substrate etching amount obstruction, etching amount does not meet the etching amount, uniform evaporation obstruction And other issues

Active Publication Date: 2015-10-07
KOBE STEEL LTD
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  • Claims
  • Application Information

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Problems solved by technology

Conversely, when the base material is etched in a region where the plasma density is low, there is a possibility that the etching amount of the surface of the base material is not sufficient for the required etching amount.
[0007] Such variations in the amount of etching of the base material may hinder the uniform vapor deposition of the hard film on the surface of the base material and hinder the improvement of the wear resistance of the base material, etc.

Method used

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  • Ion bombardment device and substrate surface cleaning method using same
  • Ion bombardment device and substrate surface cleaning method using same
  • Ion bombardment device and substrate surface cleaning method using same

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Embodiment Construction

[0023] Hereinafter, embodiments of the present invention will be described based on the drawings.

[0024] figure 1 and figure 2 The ion bombardment apparatus 1 of the first embodiment of the present invention is shown. The ion bombardment apparatus 1 is an apparatus for cleaning the surface of the substrate W before the protective film is formed by a physical vapor deposition method (PVD method) or a chemical vapor deposition method (CVD method). The ion bombardment apparatus 1 includes a vacuum chamber 2 that accommodates the substrate W, and has a function of performing the cleaning by irradiating the substrate W loaded in the vacuum chamber 2 with gas ions generated in the vacuum chamber 2 .

[0025] As the base material W to be cleaned by the ion bombardment apparatus 1, various base materials are considered, but there are, for example, cutting tools, dies used in press working, and the like. A large load is applied to these cutting tools and dies during cutting and p...

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Abstract

Provided is an ion bombardment device (1) for stabilizing and cleaning the surface of a substrate. The device is provided with the following: a vacuum chamber (2); at least one electrode (3) that is disposed on the inner wall face of the vacuum chamber (2) and emits electrons; a plurality of anodes (4) that receive the electrons from the electrode (3) and that are arranged so as to face the electrode with the substrate sandwiched therebetween; and a plurality of discharge power sources (5) corresponding to the anodes (4) respectively. Each of the discharge power sources (5) is insulated from the vacuum chamber (2) and provides to the anode (4) corresponding to the relevant discharge power source (5) currents and voltages that can be set independently of one another, thereby generating a glow discharge between such anode (4) and the electrode (3).

Description

technical field [0001] The present invention relates to an ion bombardment device for cleaning the surface of a substrate as a pretreatment for film formation, and a method for cleaning the surface of a substrate using the device. Background technique [0002] Generally, for the purpose of improving the wear resistance of cutting tools and improving the sliding properties of the sliding surfaces of machine parts, the surface of a substrate (object to be film-formed) is subjected to PVD method or CVD method for hard coating. film. As an apparatus for forming such a hard protective film, there are physical vapor deposition apparatuses such as arc ion plating apparatuses and sputtering apparatuses, and chemical vapor deposition apparatuses such as plasma CVD apparatuses. [0003] As a method for forming a hard protective film with high adhesiveness using such a physical vapor deposition apparatus and chemical vapor deposition apparatus, it is known to clean the surface of the ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/02
CPCC23C14/022C23C16/0227C23C16/4584C23C16/0245H01J37/32568H01J37/3266H01J2237/3321H01J2237/335C23C16/44C23C16/486
Inventor 广田悟史野村誉
Owner KOBE STEEL LTD
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