Magnetron sputtering aluminum plating + arc glow chromizing + recoil ion implantation to prepare fe‑al‑cr alloy layer
A magnetron sputtering plating and arc glowing technology, which is applied to the metal material coating process, coating, superimposed layer plating, etc., can solve the problem of Al depletion on the surface, concentrated distribution of high Al brittle phases, coating Reduce the service life and other problems, achieve the effect of excellent performance and uniform distribution of elements
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Embodiment 1
[0026] Present embodiment 1 is implemented under the following implementation conditions and technical requirements:
[0027] First, the surface of 304 stainless steel is ground and polished to make the surface roughness Ra reach 0.5 μm, and the ultrasonic time is 25 minutes.
[0028] Then magnetron sputtering technology is used to plate Al on the surface of 304 stainless steel, wherein the target material is 99.99wt% Al. The specific process parameters selected are: the working air pressure is 3.5Pa, the pole spacing is 18mm, the deposition time is 2.5h, and the working power is 145W.
[0029] Then, the outer surface of the Al plating layer obtained in the previous step is subjected to Cr infiltration treatment by using the arc glow technology, wherein the target material is 99.99% Cr. The selected process parameters are Ar gas pressure of 45Pa, arc current of 60A, pole spacing of 100mm, bias voltage of 500V, temperature of 800°C, and working time of 60min.
[0030] Finally...
Embodiment 2
[0033] This embodiment 2 is implemented under the following implementation conditions and technical requirements:
[0034] First, the surface of 316 stainless steel is ground and polished to make the surface roughness Ra reach 1.5 μm, and the ultrasonic time is 25 minutes.
[0035] Then magnetron sputtering technology is used to plate Al on the surface of 316 stainless steel, wherein the target material is 99.99wt% Al. The specific process parameters selected are: the working air pressure is 6.5Pa, the pole spacing is 22mm, the deposition time is 3.5h, and the working power is 155W.
[0036] The outer surface of the magnetron sputtering Al layer obtained in the previous step is further infiltrated with Cr by using the arc glow technology, wherein the target material is 99.99% Cr. The selected process parameters are Ar gas pressure of 55Pa, arc current of 80A, pole spacing of 140mm, bias voltage of 700V, temperature of 850°C, and working time of 100min.
[0037] Finally, the ...
Embodiment 3
[0040] This embodiment 3 is implemented under the following implementation conditions and technical requirements:
[0041] First, the surface of 430 stainless steel is ground and polished to make the surface roughness Ra reach 1 μm, and the ultrasonic time is 25 minutes.
[0042] Then magnetron sputtering technology is used to plate Al on the surface of 430 stainless steel, wherein the target material is 99.99wt% Al. The specific process parameters selected are: the working air pressure is 4.5Pa, the pole spacing is 20mm, the deposition time is 3h, and the working power is 150W.
[0043]The outer surface of the magnetron sputtering Al layer obtained in the previous step is further infiltrated with Cr by using the arc glow technology, wherein the target material is 99.99% Cr. The selected process parameters are Ar gas pressure of 50Pa, arc current of 70A, pole spacing of 120mm, bias voltage of 600V, temperature of 800°C, and working time of 80min.
[0044] Finally, the ion im...
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