A kind of nano-magnetic multilayer film for temperature sensor and its manufacturing method
A temperature sensor and multi-layer film technology, applied in the manufacture/processing of magnetic thin films, electromagnetic devices, thermometers, etc., can solve the problems of large volume, poor linearity of thermistors, and small application range
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Embodiment 1
[0064] figure 1 Shown is a magnetic nano-multilayer film according to an embodiment of the present invention, which includes from bottom to top: substrate 1 (abbreviated as SUB), seed layer 2 (abbreviated as SL), bottom composite magnetic layer 3, intermediate barrier layer 4 (referred to as Space), the top composite magnetic layer 5 and the cover layer 6 (referred to as CAP), wherein under certain conditions, the magnetic moment direction of the top cover layer 5 is antiparallel to the magnetic moment direction of the bottom composite magnetic layer 3 . Each layer will be described in detail below.
[0065] Substrate 1 is Si substrate, SiC, glass substrate or Si-SiO 2 The substrate, or organic flexible substrate, etc., has a thickness of 0.3-1 mm.
[0066] The seed layer (also called the bottom layer) 2 is a non-magnetic metal layer (including a single layer or a multilayer) with good electrical conductivity and a tighter bond with the substrate, and its material is prefera...
example 1
[0083] 1) Choose a Si‐SiO with a thickness of 1mm 2 The substrate is used as the substrate SUB, and the vacuum on the magnetron sputtering equipment is better than 2×10 ‐6 Pa, the deposition rate is 0.1nm / s, and the argon pressure during deposition is the condition of 0.07Pa, the seed layer SL of Ta(5nm) / Ru(20nm) / Ta(5nm) is deposited on the substrate;
[0084] 2) On the magnetron sputtering equipment, the vacuum is better than 2×10 ‐6 Pa, the deposition rate is 0.1nm / s, and the argon pressure is 0.07Pa, and the first antiferromagnetic layer AFM1 with a thickness of 15nm of IrMn is deposited on the seed layer SL;
[0085] 3) On the magnetron sputtering equipment, the vacuum is better than 2×10 ‐6 Pa, the deposition rate is 0.06nm / s, the condition of argon pressure is 0.07Pa, on the first antiferromagnetic layer AF1 deposit the first ferromagnetic layer FM1(1) of CoFeB with a thickness of 2.5nm;
[0086] 4) On the magnetron sputtering equipment, the vacuum is better than 2×10...
example 2～6
[0097] Prepare example 2~6 by the method similar to example 1, difference is the material of the magnetic nano multilayer film of example 2~6, and its structure is A namely:
[0098] SUB / SL / AFM1 / FM1(1) / NM1 / FM1(2) / Space / FM2(1) / NM2 / FM2(2) / AFM2 / CAP as image 3 The composition and thickness of each layer are shown in Table 1 below.
[0099] Table 1
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[0102] (Unless marked, the thickness units in the list are in nanometers)
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