Photosensitive resin composition, relief pattern film thereof, method for producing relief pattern film, electronic component or optical product comprising relief pattern film, and adhesive comprising photosensitive resin composition
A technology of photosensitive resin and composition, applied in the field of photosensitive resin composition, can solve the problems of difficult processing, lack of thermoplastic solubility of polyimide, etc.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Synthetic example 1
[0171] Nonionic Photoreactive Potential Basic Substance 1: Preparation of 8-Benzyl-1,8-diazabicyclo[5.4.0]undecane
[0172] Through the following procedure, 1,8-diazabicyclo[5.4.0]undecane represented by the following formula was produced.
[0173]
[0174] (i) Preparation of 1,8-diazabicyclo[5.4.0]undecane
[0175] Into a 2.5 L flask, 1470 mL of t-butyl methyl ether and 152 g (1 mol) of 1,8-diazabicyclo[5.4.0]undec-7-ene were charged. Thereafter, 18.97 g (0.5 mol) of lithium aluminum hydride was introduced into the flask several times, and the resulting emulsion was stirred at room temperature for 1 hour. Next, the reaction mixture was heated to 55˜57° C. over 2 hours, and then stirred overnight at room temperature. The completion of the reaction was confirmed by thin layer chromatography. The reaction mixture was cooled to 0° C., and 19 mL of water and then 19 mL of 10% aqueous sodium hydroxide solution were added with care. Further 57 mL of water was added. After th...
Synthetic example 2
[0183] Nonionic Photoreactive Potential Basic Substance 2: Preparation of 5-Benzyl-1,5-Diazabicyclo[4.3.0]nonane
[0184] In place of 1,8-diazabicyclo[5.4.0]undec-7-ene, 1,5-diazabicyclo[4.3.0]-5-nonene was used, and the synthesis example 1 The same procedure prepared 5-benzyl-1,5-diazabicyclo[4.3.0]nonane (pKa=7.46) represented by the following formula. The product was obtained as a yellowish oil. Confirmation of structure using 1 H-NMR performed. The pKa value of 5-benzyl-1,5-diazabicyclo[4.3.0]nonane was based on the method described in the above literature.
[0185]
[0186] In addition, 5-benzyl-1,5-diazabicyclo[4.3.0]nonane becomes DBN(1,5-diazabicyclo[4.3.0]- 5-nonene) (pKa=13.42) (refer to the literature mentioned above).
Synthetic example 3
[0188] Nonionic Photoreactive Potential Basic Substance 3: Preparation of 5-methylstyrene-1,5-diazabicyclo[4.3.0]nonane
[0189] Through the following procedure, 5-methylstyrene-1,5-diazabicyclo[4.3.0]nonane represented by the following formula was produced.
[0190]
[0191] Dissolve 1,5-diazabicyclo[4.3.0]nonane 77.14g ((0.5mol) in 500mL toluene in a 2.5L flask, add α-bromoacetophenone 99.52g (0.5mol) and The solution in 500mL toluene was further stirred overnight at room temperature.The reaction mixture was filtered, cleaned with deionized water, and dried on magnesium sulfate.Then, further dried in vacuum, obtained α - Aminoketones.
[0192] The dichloromethane solution of the α-aminoketone thus obtained was added to a solution obtained by stirring methyltriphenylphosphonium bromide and sodium amide in dichloromethane for 15 minutes, and the resulting mixture was stirred at room temperature 18 hours. The resulting solution was filtered, and the filtrate was concentra...
PUM
| Property | Measurement | Unit |
|---|---|---|
| boiling point | aaaaa | aaaaa |
| elongation | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More