Sterilizing, anti-dazzle, anti-reflection and wear-resisting lens and preparing method thereof
An anti-glare and lens technology, applied in the field of lenses, can solve problems such as unfavorable health of the wearer, the lens is easy to breed bacteria, and affects the light transmittance, etc., and achieves excellent killing of harmful bacteria, inhibiting the growth of bacteria or other microorganisms. stable effect
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Embodiment 1
[0058] A method for preparing a sterilizing, anti-glare, anti-reflection, anti-reflective and wear-resistant lens. When the substrate is formed of resin, the preparation method specifically includes the following steps:
[0059] 1) Clean and dry the substrate;
[0060] 2) Coating the inner and outer surfaces of the substrate respectively;
[0061] A. Coating the first film layer:
[0062] Adjust the vacuum degree in the vacuum coating chamber to less than or equal to 5.0×10 -3 Pa, and control the temperature in the vacuum coating chamber to 50-70°C, and use an electron gun to bombard the film material of the first film layer, and the film material of the first film layer evaporates and deposits on the outer surface of the substrate in the form of nano-scale molecules. Control the evaporation rate of the first film layer to be 2.5? / S, and the final thickness of the first film layer after formation is 10-100nm; wherein, the film material of the first film layer is trititanium ...
Embodiment 2
[0075] A method for preparing a sterilizing, anti-glare, antireflection and wear-resistant lens. When the substrate is formed from glass, the preparation method specifically includes the following steps:
[0076] 1) Clean and dry the substrate;
[0077] 2) Coating the inner and outer surfaces of the substrate respectively;
[0078] A. Coating the first film layer:
[0079] Adjust the vacuum degree in the vacuum coating chamber to less than or equal to 5.0×10 -3 Pa, and control the temperature in the vacuum coating chamber to be 200-300°C, use an electron gun to bombard the film material of the first film layer, and the film material of the first film layer evaporates and deposits on the outer surface of the substrate in the form of nano-scale molecules. Control the evaporation rate of the first film layer to be 2.5? / S, and the final thickness of the first film layer after formation is 10-100nm; wherein, the film material of the first film layer is trititanium pentoxide, formin...
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