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Preparation method of a non-uniform contour gradient cell capture chip

A non-uniform and contoured technology, which is applied in the field of rapid preparation of microfluidic chips, can solve the problems that microfluidic chips cannot be etched, and microfluidic chips with special-shaped channels cannot be etched, and achieve the effect of simple processing technology

Active Publication Date: 2017-09-22
WUHAN YZY MEDICAL SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the channels of microfluidic chips etched by traditional chemical etching methods are very regular, and microfluidic chips with special-shaped microfluidic channels cannot be etched.
Traditional etching methods cannot etch microfluidic chips with special-shaped channels

Method used

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  • Preparation method of a non-uniform contour gradient cell capture chip
  • Preparation method of a non-uniform contour gradient cell capture chip

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] Example 1: (to obtain a substrate with a continuous and smooth etching surface)

[0022] A method for preparing a non-uniform equal-height gradient cell capture chip, the steps of which are:

[0023] 1. Selection and treatment of the substrate: the substrate is selected as quartz, of which the length of the quartz substrate is 75mm, the width is 25mm, and the thickness is 2mm. The selected substrate is cleaned under flowing deionized water to remove oil stains on the quartz surface, etc. impurities;

[0024] 2. Preparation of etching mask: Dry the cleaned quartz substrate in an oven at 75°C. After drying, stick protective tape on the upper and lower surfaces of the substrate, and cut it out with a laser engraving machine. One length is 60mm. 1. For an area with a width of 20mm, tear off the protective tape in this area to obtain the area to be etched;

[0025] 3. Wet etching: The wet etching refers to that after the selected substrate is prepared by etching mask, the ...

Embodiment 2

[0029] A method for preparing a non-uniform equal-height gradient cell capture chip, the steps of which are:

[0030] 1. The substrate is selected as a silicon wafer. The length of the silicon wafer substrate is 90mm, the width is 35mm, and the thickness is 2mm. The selected substrate is cleaned under flowing deionized water to remove oil and other impurities on the surface of the silicon wafer;

[0031] 2. Dry in an oven at 50°C, then paste protective tape on the upper and lower surfaces of the treated substrate, cut out an area with a length of 75mm and a width of 20mm with a laser engraving machine, and tear off the protective tape in this area Paper;

[0032] 3. Put the mask-embedded substrate into the etching solution by rotating the fixture at a constant speed of 0.6mm / min, so that the rotation angle of the substrate in the etching solution ranges from 0° to 90°, etching for 200 minutes, at this time, the etching surface of the substrate is a smooth gradient surface wit...

Embodiment 3

[0035] Example 3: (obtaining a substrate with a stepped etched surface)

[0036] Such as figure 1 Shown, a kind of preparation method of heterogeneous contour gradient cell capture chip, its steps are:

[0037] 1. The substrate is selected as glass. The length of the glass substrate is 75mm, the width is 25mm, and the thickness is 2mm. The selected substrate is cleaned under flowing deionized water to remove oil and other impurities on the glass surface;

[0038]2. Dry in an oven at 100°C, then stick protective adhesive tape on the upper and lower surfaces of the treated substrate, cut out an area with a length of 60mm and a width of 15mm with a laser engraving machine, and tear off the protection of this area gummed paper;

[0039] 3. Put the mask-embedded substrate into the etching solution by rotating the jig at a rotation rate of 0.3 mm / min, so that the rotation angle of the substrate in the etching solution is from 0° to 90° °, etch for 290 minutes, and rotate for 50 m...

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Abstract

The invention discloses a manufacturing method of a non-uniform equal-height gradient cell-capturing chip. The method comprises the following steps: 1, selection and treatment of a substrate: selecting glass, quartz or silicon to serve as the substrate, cleaning, and removing impurities such as oil stains on the surface of the glass; 2, preparation of an etching mask: drying the glass substrate to obtain an area to be etched; 3, wet etching: treating the selected substrate through the etching mask, and rotationally placing the substrate into an etching solution according to a rotation speed to form a rotation angle of 0-90 degrees of the substrate in the etching solution in order to obtain a non-uniform equal-height gradient structure with different equal-height surfaces; 4, perforating; 5, combination of a cover plate and the substrate: selecting the cover plate, and combining the cover plate with the substrate to manufacture a microfluidic chip in order to obtain the non-uniform equal-altitude gradient cell-capturing chip with different equal-altitude surfaces. The method is feasible, is easy and convenient to operate, is easy for machining, and has high efficiency; the microfluidic chip has the characteristics of high biochemical stability and large and long chip cell capturing area.

Description

technical field [0001] The invention relates to a technology for rapidly preparing a microfluidic chip, and more particularly relates to a method for preparing a non-uniform contour cell capture chip. Background technique [0002] Microfluidic chips provide a large analysis and testing platform in the fields of chemistry, food, environment, and medicine, and are the core of microanalysis systems. The invention and application of microfluidic chips have promoted the miniaturization, efficiency, automation and convenience of some analysis. It greatly saves the consumption of precious biological and chemical reagents in some biological and chemical experiments, and also greatly improves the analysis efficiency and reduces the cost. [0003] Usually, the main materials for making microfluidic chips are quartz, glass and silicon wafers, as well as some polymers. Microfluidic chips made of polymers are easy to manufacture, but they also have some shortcomings. The shortcomings c...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C12M1/00
CPCB01L3/502707
Inventor 刘侃项坚真陈婷方义邹恒
Owner WUHAN YZY MEDICAL SCI & TECH
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