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A kind of preparation method of boron-free ultrapure water

A technology for ultrapure water and tap water, applied in chemical instruments and methods, water/sewage treatment, non-polluted water treatment, etc., can solve the problems of not reaching ppt level, boron content cannot be effectively removed, etc. Process cost, simple process effect

Active Publication Date: 2019-04-02
JIANGSU DENOIR TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the boron content of ultrapure water prepared by these existing methods cannot be effectively removed, or cannot meet the ppt level requirements

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0016] A preparation method of boron-free ultrapure water, the specific preparation steps are as follows:

[0017] (1) Pass the tap water after three-stage pretreatment to remove impurities through a hollow fiber filter with ultrafiltration pores less than 0.01 micron at a pressure of 3 to 10 MPa to filter out harmful substances such as bacteria, rust, and colloid in the water, and retain the original water. Some trace elements and minerals;

[0018] (2) Introduce the ultra-filtered tap water into the reverse osmosis device to remove most of the soluble salt, microorganisms and all colloids in the water;

[0019] (3) Introduce the reverse osmosis treated tap water into the EDI device, remove the salt in the tap water by electrophoresis, and completely remove the bacteria in the water body;

[0020] (4) The tap water treated by the EDI device electrophoresis method is irradiated with UV ultraviolet light with a wavelength of 185nm, so as to decompose the organic matter in the ...

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PUM

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Abstract

The invention discloses a method for preparing boron-free ultrapure water. Tap water is sequentially subjected to ultrafiltration, reverse osmosis, EDI device, UV biological degradation, boron removing process and polishing resin treatment to prepare the boron-free ultrapure water, wherein the boron removing process comprises polyol complexing reverse osmosis boron removing and two-stage boron specific resin boron removing. The ultrapure water has a content of boron element being less than 100PPT and the content of other elements reaching the PPT grade, thereby being ultrapure water with excellent comprehensive performance and an ideal water source for preparing ultrapure chemical materials in the semiconductor industry. The method for preparing boron-free ultrapure water is simple and convenient in process, is easy to implement, and can be used for effectively controlling the content of each substance in the water and reducing process cost by means of combination of multiple treatment methods to prepare high-quality PPT-grade ultrapure water; and a step-wise boron removing process can be used for completely removing tenacious boron impurities in the ultrapure water to overcome the industrial problem, thus being a milestone for ultrapure water development.

Description

technical field [0001] The invention relates to the technical field of water purification, in particular to a method for preparing boron-free ultrapure water. Background technique [0002] In the semiconductor industry, doping a very small amount of impurity elements in a pure semiconductor product will greatly change the resistivity of the product. For example, if one part per million of boron is added to pure boron, its resistivity will be reduced from 214000Ω·cm to 0.4Ω·cm at once, that is, the conductivity of boron will be increased by more than 500,000 times. It can be seen that the semiconductor industry has extremely high requirements on the purity of chemical materials. [0003] Ultrapure water is an indispensable raw material for the preparation of ultrapure chemical materials used in the semiconductor industry. Its purity directly affects the performance of ultrapure chemical materials, thus restricting the development of the optical semiconductor industry, especi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C02F9/08C02F103/04
CPCC02F1/32C02F1/441C02F1/444C02F1/4696C02F1/58C02F9/00C02F2001/422C02F2103/04
Inventor 吴国新阮汝明徐驰
Owner JIANGSU DENOIR TECH CO LTD