A kind of preparation method of superluminescent light-emitting diode
A superluminescence and diode technology, which is applied in electrical components, circuits, semiconductor devices, etc., can solve the problems of difficulty in increasing the output power of fiber coupling, uneven longitudinal distribution of carriers, and low fiber coupling efficiency, so as to facilitate chip output Power, low divergence angle, easy to improve the effect
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[0014] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.
[0015] The invention provides a method for preparing a superluminescent light-emitting diode, comprising the following steps: (1) using MOCVD to epitaxially grow on an InP substrate to form an optimized epitaxial wafer; (2) depositing 200nm SiO on the surface of the epitaxial wafer 2 The dielectric layer is subjected to photolithography and wet etching to form a specific ridge waveguide structure; (3) The surface medium is removed from the film forming the ridge waveguide structure; the passivation layer is regrown; photolithography, metal sputtering, Thin and metal sputtering, so as to realize the preparation of P-type contact electrodes, thinning and N-type contact electrodes; Plated with high transparency and high reflection film.
[0016] Further, step (1) includes the following specific steps: using MOCVD epitaxial growth method to sequen...
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