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Method for continuous adsorption and removal of carbonyl sulfide and dimethyl disulfide in carbon 4 left after etherification reaction

A technology of dimethyl disulfide and carbon four after ether, which is applied in chemical instruments and methods, separation methods, filter regeneration, etc., can solve the problem of reducing the content of dimethyl disulfide, and achieve simple equipment, The effect of mild adsorption conditions and convenient operation

Inactive Publication Date: 2016-06-15
CHINA UNIV OF PETROLEUM (BEIJING)
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Although the above patents consider the removal of carbonyl sulfide and dimethyl disulfide, they cannot reduce the content of dimethyl disulfide to below 1 mg / g

Method used

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  • Method for continuous adsorption and removal of carbonyl sulfide and dimethyl disulfide in carbon 4 left after etherification reaction
  • Method for continuous adsorption and removal of carbonyl sulfide and dimethyl disulfide in carbon 4 left after etherification reaction
  • Method for continuous adsorption and removal of carbonyl sulfide and dimethyl disulfide in carbon 4 left after etherification reaction

Examples

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Effect test

preparation example Construction

[0053] Preparation of dimethyl disulfide adsorbent:

[0054] The NaY molecular sieve adsorbent loaded with 6wt% metal Ag was prepared as the adsorbent of dimethyl disulfide.

[0055] 1. Take by weighing 20g of NaY type molecular sieve carriers with a particle size of 2-3mm, and place it in an enamel dish, bake it at 540° C. in a muffle furnace for 3 hours, then take it out, and naturally drop to room temperature in the air;

[0056] II. Add the NaY molecular sieve carrier treated in step I to the AgNO 3 Aqueous solution (1.9gAgNO 3 Dissolve in 4mL deionized water), impregnate with equal volume at 40°C, and the impregnation time is 24 hours;

[0057] III. Rinse the NaY-type molecular sieve carrier treated in step II with deionized water three times, filter, dry the filtered product at 110°C for 2 hours, and then bake it in a muffle furnace at 540°C for 3 hours to prepare The NaY type molecular sieve adsorbent of loading 6wt% metal Ag, as the adsorbent of dimethyl disulfide, ...

Embodiment 1

[0061] This embodiment provides a device for continuous adsorption and removal of carbonyl sulfide and dimethyl disulfide in carbon four after ether, the schematic diagram of which is shown in figure 1 As shown, the device includes a first desulfurization unit 1 and a second desulfurization unit 2;

[0062] The first desulfurization unit 1 includes a first carbonyl sulfide adsorption tower 11 and a second carbonyl sulfide adsorption tower 12, the first carbonyl sulfide adsorption tower 11 and the second carbonyl sulfide adsorption tower 12 are arranged in parallel, and the two can be switched mutually Use, when the carbonyl sulfide adsorbent X1 in the first carbonyl sulfide adsorption tower absorbs and breaks through, switch the carbon four behind the ether to the second carbonyl sulfide adsorption tower for adsorption and removal of carbonyl sulfide, and simultaneously treat the first carbonyl sulfide adsorption tower The carbonyl sulfide adsorbent that has been adsorbed and ...

Embodiment 2

[0065] This example provides a method for continuously adsorbing and removing carbonyl sulfide and dimethyl disulfide in C4 after ether, which is realized by using the device described in Example 1, wherein the method includes the following specific steps :

[0066] Both the first carbonyl sulfide adsorption tower and the second carbonyl sulfide adsorption tower are filled with 30mL of carbonyl sulfide adsorbent X 1 . At room temperature, pass C4 after ether with a COS content of 59 mg / g and a dimethyl disulfide content of 87 mg / g to the first carbonyl group of the carbonyl sulfide adsorption unit (the first desulfurization unit) at a rate of 60 mL / h. Sulfur adsorption tower, the fixed bed of the second carbonyl sulfide adsorption tower, after the treated ether, carbon four passes through the COS adsorbent from bottom to top X 1 , take samples from the upper part of the first carbonyl sulfide adsorption tower, take samples at regular intervals, and detect COS peaks in the sa...

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Abstract

The invention provides a method for continuous adsorption and removal of carbonyl sulfide and dimethyl disulfide in carbon 4 left after etherification reaction. The method includes the following steps that the carbon 4 left after etherification reaction is in contact with a carbonyl sulfur adsorbent to adsorb and remove the carbonyl sulfur in the carbon 4 left after etherification reaction; then the carbonyl sulfur adsorbent performing penetrating adsorption is subjected to regeneration treatment, and the operations of carbonyl sulfide removal and regeneration treatment are repeated; carbon 4 left after etherification reaction and without carbonyl sulfur is in contact with a dimethyl disulfide adsorbent to adsorb and remove the dimethyl disulfide in the carbon 4 left after etherification reaction; then the dimethyl disulfide adsorbent performing penetrating adsorption is subjected to regeneration treatment, and the operations of dimethyl disulfide removal and regeneration treatment are repeated. The method adopts the different adsorbents to adsorb and remove the carbonyl sulfur and the dimethyl disulfide in the carbon 4 left after etherification reaction and reduces the carbonyl sulfur content and the dimethyl disulfide content respectively to be below 1 mg / g, and the adsorbents can be regenerated and recycled.

Description

technical field [0001] The invention relates to a method for continuously adsorbing and removing carbonyl sulfide and dimethyl disulfide in post-ether C4, which belongs to the technical field of petrochemical industry, and specifically belongs to the technical field of catalytic cracking post-ether C4 impurity removal. Background technique [0002] After the FCC C4 fraction of the refinery produces methyl tert-butyl ether (MTBE), the remaining C4 fraction is usually called post-ether C4, which still contains 40%-50% (mass fraction, the same below) of C4 Monoolefins and 50%-60% alkanes are not fully utilized. Carbon tetraolefins can be isomerized to produce isobutene to produce MTBE, and can also be separated to produce butene-1 to produce polybutene-1. C4 alkanes can be dehydrogenated to produce isobutylene and then butyl rubber to increase the utilization value of C4. However, the remaining C4 generally contains sulfides, among which sulfides such as carbonyl sulfide, dim...

Claims

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Application Information

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IPC IPC(8): B01D53/04B01J20/34
CPCB01D53/04B01D2253/106B01D2257/306B01D2259/40086B01J20/3408
Inventor 周广林吴全贵周红军李芹
Owner CHINA UNIV OF PETROLEUM (BEIJING)
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