TFT array substrate manufacture method
A manufacturing method and array substrate technology, applied in semiconductor/solid-state device manufacturing, electrical components, electrical solid-state devices, etc., can solve the problems of ITO residue, increase in TFT size, and unfavorable improvement of pixel density, so as to increase pixel density and reduce effect of size
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Example Embodiment
[0051] In order to further illustrate the technical means adopted by the present invention and its effects, the following describes in detail the preferred embodiments of the present invention and the accompanying drawings.
[0052] See Figure 3-14 In the following, the fabrication of FFS (Fringe Field Switching, fringe field switching technology) type CMOS (Complementary Metal Oxide Semiconductor) TFT array substrate is taken as a preferred embodiment of the present invention. The method of fabricating a TFT array substrate provided by the present invention specifically includes the following step:
[0053] Step 1, such as Figure 4 As shown, a base substrate 10 is provided, a first metal layer is deposited on the base substrate 10, and the first metal layer is patterned to obtain a light shielding layer 20; on the light shielding layer 20 and the lining The base substrate 10 forms a buffer layer 23.
[0054] Specifically, the base substrate 10 is a transparent substrate, prefera...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.
© 2023 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap