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Pressure-reducing heating and drying device

A drying device, decompression heating technology, applied in the direction of heating device, heating to dry solid materials, drying solid materials, etc., can solve the problems of difficult decompression drying treatment and heating drying treatment, cumbersome drying treatment process, and long time consumption

Active Publication Date: 2016-07-20
WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, since the decompression drying device and the heating and drying device are separated, the substrate needs to be transported to the heating and drying device after the decompression drying treatment, and it is difficult to quickly perform the decompression drying treatment and the heating and drying treatment.
[0005] Since the drying process needs to be processed by a split decompression drying device and a heating and drying device, the drying process is cumbersome and time-consuming, and the production cost is high

Method used

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Embodiment Construction

[0020] In the following description, for purposes of illustration rather than limitation, specific details, such as specific system architectures, interfaces, and techniques, are set forth in order to provide a thorough understanding of the present invention.

[0021] The decompression heating and drying device described in the following embodiments of the present invention is used to carry out decompression heating and drying treatment on the coated color filter (Colorfilter, CF) substrate, so that the coated color filter has photoresist The thin film of the agent is fully developed, so that the next step can be processed.

[0022] see figure 1 , figure 1 It is a structural schematic diagram of an embodiment of the vacuum heating drying device of the present invention. The decompression heating and drying device in this embodiment includes a chamber 110 , a carrying mechanism (not shown in the figure), a heating mechanism 120 , a decompression mechanism 130 , and an air pre...

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Abstract

The invention discloses a pressure-reducing heating and drying device. The pressure-reducing heating and drying device comprises a cavity, a bearing mechanism, a heating mechanism, a pressure reducing mechanism and an air pressure adjusting mechanism; the bearing mechanism and the heating mechanism are arranged in the cavity; the pressure reducing mechanism and the air pressure adjusting mechanism communicate with the cavity; the cavity is used for covering the periphery of a substrate; the bearing mechanism is used for bearing the substrate in the state that the main face of the substrate faces upwards; the heating mechanism is used for heating the substrate; the pressure reducing mechanism is used for reducing pressure in the cavity when the heating mechanism heats the substrate; and the air pressure adjusting mechanism is used for adjusting the intensity of the pressure in the cavity when the intensity of the pressure in the cavity and the temperature of the substrate meet preset requirements, and therefore the intensity of pressure inside and outside the cavity can be balanced. In this way, the pressure-reducing heating and drying device can effectively accelerate the drying process, shortens the production process and saves the production cost.

Description

technical field [0001] The invention relates to the field display field, in particular to a decompression heating and drying device. Background technique [0002] The current manufacturing process of color filter (Colorfilter, CF) generally includes: sputtering, coating, drying, exposure, and development. Specifically, first sputtering an indium tin oxide (ITO) film on the back of the white substrate, then coating a thin film with photoresist on the front of the substrate, and then drying the coated substrate under reduced pressure and heating. The solvent in the film is volatilized, and then the coated substrate is subjected to alignment exposure after cooling, and the unexposed area is washed off under the action of the developing solution to leave the exposed area. [0003] Wherein, the coated wet film is dried under low pressure by a vacuum drying device to remove part of the photoresist solvent in the wet film, and then heated and dried by a heating and drying device t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F26B9/06F26B23/08F26B25/00G02B5/20
CPCF26B3/347F26B9/06F26B25/008G02B5/20
Inventor 唐宗园
Owner WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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