Light-operated terahertz modulator based on graphene/silicon-doped compound double-layer structure
A composite double-layer, graphene technology, applied in the field of terahertz wave applications, can solve the problems that cannot meet the needs of high-speed modulation, and the modulation rate is only on the order of kHz, so as to improve power utilization, increase modulation depth, and increase modulation amplitude Effect
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Publication Date
- 2016-08-03
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Figure 1 Figure 2 Figure 3
Abstract
Description
technical field
[0001] The invention belongs to the technical field of terahertz wave applications, and provides a terahertz modulation device, specifically a light-controlled terahertz modulator based on a graphene / doped silicon composite double-layer structure. Background technique
[0002] Terahertz wave (THz) refers to electromagnetic waves with a frequency in the range of 0.1THz-10THz (wavelength 0.03-3mm). Its band is located between microwave and infrared waves, and occupies an important position in the electromagnetic spectrum. the transition area. Terahertz waves have very important applications in the fields of wireless communication, non-destructive detection, security inspection, and radar imaging. In the terahertz application system, active control devices (activedevices) can realize a series of functions such as modulation, switching, attenuation, and steering of the terahertz beam, and are the core components of the construction of the terahertz application s...
Examples
Embodiment Construction
[0025] The present invention will be further described below with reference to the accompanying drawings.
[0026] In this embodiment, an optically controlled terahertz wave modulator based on a "graphene / doped Si semiconductor" composite double-layer structure is provided, and its structure is as follows figure 1 As shown, it includes a substrate 1 , an insulating layer 2 , a gold lattice doped semiconductor layer 3 , a graphene film 4 and a pumping laser beam 5 arranged sequentially from bottom to top. In this embodiment, an SOI substrate is used, that is, the substrate is a sapphire substrate with a thickness of 400 μm, and the insulating layer is SiO with a thickness of about 200 nm. 2 , Si semiconductor is intrinsic N-type high-resistance Si, its resistivity is greater than 1000Ω / cm, thickness is 50μm, doped metal is Au, doping type is lattice doping, and its gold point distribution is as follows figure 2 As shown, it should be noted that the metal dots in lattice dopin...