Glass coating structure manufacturing method

Abstract

The invention provides a glass coating structure manufacturing method. The method comprises feeding nitrogen and oxygen into a vacuum space of which the upper part is provided with a glass substrate according to a fixed ratio of nitrogen to oxygen of 0.8: 1 to 1: 1 and alternately carrying out a titanium-nitrogen oxide coating film formation process and a silicon-nitrogen oxide coating film formation process to downward form alternately overlapped silicon-nitrogen oxide coating films and titanium-nitrogen oxide coating films at the lower surface of the glass substrate. The silicon-nitrogen oxide coating film and titanium-nitrogen oxide coating film are alternately overlapped at the lower surface of the glass substrate and nitrogen-oxygen ratios are the same and are in a range of 0.8: 1 to 1: 1 so that insulating properties are guaranteed, a glass coating structure with minute surface effects is formed and coating thickness has small influence on fingerprint detection in a very small range.

Description

technical field [0001] The invention relates to a method for manufacturing a glass coating structure, in particular to a method for manufacturing a glass coating structure applied to fingerprint detection. Background technique [0002] At present, the fingerprint identification technology has been applied to products such as mobile terminals (eg, computers). Among them, the capacitive pressing fingerprint detection method is widely used, and is specifically divided into active pressing detection and passive pressing detection. [0003] The basic principle of passive press detection is as follows figure 1 As shown, the entire detection system includes: a capacitive fingerprint sensor 10 at the bottom and an isolation layer (or called a protective layer, which is also an area directly touched by fingers) 11 covering the capacitive fingerprint sensor 10, wherein the capacitive fingerprint sensor 10 includes a plurality of capacitive plates arranged in a two-dimensional array ...

AI Technical Summary

Problems solved by technology

However, due to the above-mentioned many limitations, most of the isolation layers 11 in the fingerprint identification area of ​​mobile terminals using capacitive pressing fingerprint detection methods in the prior art are made of materials such as ceramics or plastics, and only simply realize the function of protecting capacitors. The function of isolating and encapsulating the type fingerprint sensor 10, however, the glass mirror surface cannot be realized on the fingerprint detection device

[0008] In the prior art, the coating technology of glass mirrors is relatively mature. However, due to the general mirror coating, it does not require high insulation and thickness. Generally, direct metal plating is used, or multi-layer coatings are used to achieve the desired effect. To achieve the desired effect, the coating layer formed in this way is generally thick or not insulating, so it cannot meet the thickness requirements of fingerprint detection.

In addition, the above-mentioned fingerprint detection system itself adopts the capacitance detection principle. The skin of the finger 12 and the capacitor plate array are respectively used as two poles of the capacitor. According to the capacitance calculation formula, the size of the capacitor is not only related to the distance between the capacitor plates, It is also related to the medium between the capacitor plates. The introduction of the coating layer will increase the amount of the medium between the capacitor plates, thereby affecting the capacitance value. The greater the thickness of the coating layer, the greater the impact on the capacitance value. Therefore, in order not to have a serious impact on fingerprint detection, it is impossible to allow the existence of a very thick coating layer objectively.

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