Film system structure of ZnS substrate with inverse 0.5-0.8[Mu]m visible light, laser with 1.064[Mu]m and transparent medium wave infrared colour separation with 3.7-4.8[Mu]m

A film structure, visible light technology, applied in optics, optical components, instruments, etc., can solve the problems of large absorption loss in the visible light band, and achieve the effects of reducing the difficulty of the plating process, good stress matching, and improving control accuracy.

Active Publication Date: 2016-08-10
西安应用光学研究所
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the paper, the film system has different spectral bands, and the zinc selenide material is used for design, and the absorption loss in the visible band is relatively large

Method used

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  • Film system structure of ZnS substrate with inverse 0.5-0.8[Mu]m visible light, laser with 1.064[Mu]m and transparent medium wave infrared colour separation with 3.7-4.8[Mu]m
  • Film system structure of ZnS substrate with inverse 0.5-0.8[Mu]m visible light, laser with 1.064[Mu]m and transparent medium wave infrared colour separation with 3.7-4.8[Mu]m
  • Film system structure of ZnS substrate with inverse 0.5-0.8[Mu]m visible light, laser with 1.064[Mu]m and transparent medium wave infrared colour separation with 3.7-4.8[Mu]m

Examples

Experimental program
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Effect test

Embodiment 1

[0029] Embodiment 1: The transparent substrate adopts multi-spectral ZnS, and the dichroic film system is composed of three film layers made of thin film materials. Wherein, the first film layer is zirconia, plated on the surface of the ZnS substrate; the second film layer is ytterbium fluoride, plated on the first film layer; the third film layer is zinc sulfide, plated on the second film layer; the fourth film layer is ytterbium fluoride, and plated on the third film layer; and so on, zinc sulfide film layer and ytterbium fluoride film layer alternately film layer; the fifty-first film layer is zirconia, plated on the fiftieth film layer. That is, the number of film layers of the dichroic film system is 51 in total, the first layer and the 51st layer are zirconia film layers, the even-numbered layers from the second to the 50th layer are ytterbium fluoride film layers, and the odd-numbered layers are sulfide films. Zinc film layer. The thicknesses of the first to fifty-fir...

Embodiment 2

[0034] Embodiment 2: The transparent substrate adopts multi-spectral ZnS, and the dichroic film system is composed of three film materials superimposed on each other. Wherein, the first film layer is made of zirconium oxide, on the surface of the ZnS substrate; the second film layer is ytterbium fluoride, plated on the first film layer; the third film layer is zinc sulfide, plated on the second film layer; the fourth film layer is ytterbium fluoride, and plated on the third film layer; and so on, zinc sulfide film layer and ytterbium fluoride film layer alternately film layer; the fifty-first film layer is zirconia, plated on the fiftieth film layer. That is, the number of film layers of the dichroic film system is 51 in total, the first layer and the 51st layer are zirconia film layers, the even-numbered layers from the second to the 50th layer are ytterbium fluoride film layers, and the odd-numbered layers are sulfide films. Zinc film layer. The thicknesses of the first to...

Embodiment 3

[0039] Embodiment 3: The transparent substrate adopts multi-spectral ZnS, and the dichroic film system is formed by alternately superimposing film layers made of three thin film materials. Wherein, the first film layer is zirconia, plated on the surface of the ZnS substrate; the second film layer is ytterbium fluoride, plated on the first film layer; the third film layer is zinc sulfide, plated on the second film layer; the fourth film layer is ytterbium fluoride, and plated on the third film layer; and so on, zinc sulfide film layer and ytterbium fluoride film layer alternately film layer; the fifty-first film layer is zirconia, plated on the fiftieth film layer. That is, the number of film layers of the dichroic film system is 51 in total, the first layer and the 51st layer are zirconia film layers, the even-numbered layers from the second to the 50th layer are ytterbium fluoride film layers, and the odd-numbered layers are sulfide films. Zinc film layer. The thicknesses o...

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Abstract

The present invention provides a film system structure of ZnS substrate with inverse 0.5-0.8[Mu]m visible light, laser with 1.064[Mu]m and transparent medium wave infrared colour separation with 3.7-4.8[Mu]m. The film system structure comprises a ZnS substrate and a color separation film system, and the color separation film system is made of three film materials; the number of the film layers is 51, wherein the first layer and the 51th layer are oxidation zirconium film layer, the even layers from the second layer to the 50th layer are ytterbium fluoride film layers and the odd layers from the second layer to the 50th layer are zinc sulfide film layers. The transmittance is smaller than 2% with the waveband from 0.5 to 0.8 [Mu]m; the transmittance is smaller than 1% with the laser waveband of 1.064 [Mu]m; and the transmittance is larger than 95% with the medium wave infrared band from 3.7 to 4.8 [Mu]m. The film system structure is small in the number of layers, small in thickness, low in plating difficulty, good in technology repeatability, high in obtained film firmness and good in spectral property, is able to satisfy the use requirement of multi-waveband co-window optoelectronic system and the work requirement in the condition of the inclination with 45 degrees, and stand against the environment tests such as high and low temperature storage, temperature impact and the like, the adhesion test and the moderate friction test.

Description

technical field [0001] The invention belongs to the technical field of optical thin films, and specifically relates to a ZnS substrate that reflects 0.5-0.8 μm visible light and 1.064 μm laser light and transmits 3.7-4.8 μm mid-wave infrared dichroic film, which is used for airborne, ship-borne, and vehicle-mounted In the optical system of the multi-band common optical path of the optoelectronic platform. Background technique [0002] The current optoelectronic system platform is constantly developing towards the direction of small size, mobility, multi-functional integration, and all-weather use. Multi-band co-window technology is more and more widely used in optoelectronic system platforms. Sensing systems all combine multiple sensors in a single package, including visible and mid-wave infrared cameras, forward-looking infrared (FLIR), and laser range finders. These combined systems are all observed through a common aperture window, so as to achieve the purpose of miniatu...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B27/10
CPCG02B27/1006G02B27/1013
Inventor 张建付杨崇民米高园刘永强刘青龙王松林刘方杨华梅李明伟王颖辉孙婷黎明韩俊
Owner 西安应用光学研究所
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