Rotary magnetron target and horizontal magnetron sputtering coating equipment
Patent Information
- Authority / Receiving Office
- CN Β· China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- ZHAOQING KERUN VACUUM EQUIP
- Publication Date
- 2018-08-24
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Abstract
Description
technical field
[0001] The invention relates to the technical field of magnetron sputtering coating, in particular to a rotary magnetron target and a horizontal magnetron sputtering coating device with the rotary magnetron target. Background technique
[0002] In the magnetron sputtering coating system, a planar magnetron target or a rotating magnetron target is generally used in the coating chamber to sputter and coat the surface of the workpiece. Among them, the rotary magnetron target coating is to rely on electrons to hit argon molecules to turn them into argon ions, and then under the action of magnetic and electric fields, argon ions bombard the surface of the target at high speed, and the required materials are converted into ions and molecules. Splash out, plated on the surface of the workpiece. At present, in the general-purpose rotary magnetron target, the end of the magnet is generally a planar structure. In actual production, the distribution of the magnetic fie...