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Absolute wavelength calibration and adjustment device and method

A technology for calibrating devices and wavelengths, which is applied in the laser field, can solve the problems of not being able to obtain at the same time, and achieve the effect of eliminating the influence of calibration accuracy

Active Publication Date: 2016-09-28
RAINBOW SOURCE LASER RSLASER
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  • Claims
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Problems solved by technology

It avoids the disadvantage of not being able to obtain at least two atomic absorption lines with high absorption intensity at the same time within the tunable range of 193nm by using a single-element cathode lamp for absolute wavelength calibration

Method used

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  • Absolute wavelength calibration and adjustment device and method
  • Absolute wavelength calibration and adjustment device and method

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Embodiment Construction

[0024] Exemplary embodiments of the present disclosure will be described in more detail below with reference to the accompanying drawings. Although exemplary embodiments of the present disclosure are shown in the drawings, it should be understood that the present disclosure may be embodied in various forms and should not be limited by the embodiments set forth herein. Rather, these embodiments are provided for more thorough understanding of the present disclosure and to fully convey the scope of the present disclosure to those skilled in the art.

[0025] figure 1 Schematic diagram of the optical path for the absolute wavelength calibration and calibration proposed by the present invention. 1 is a positive lens, 2 is a homogenizing sheet, 3 is a positive lens, 4a and 4b are semi-transparent and semi-reflective lenses, 5a and 5b are hollow cathode lamps made of different elements, 6a and 6b are positive lenses, 7a and 7b are Filters, 8a, 8b and 8c are ultraviolet photodetecti...

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Abstract

The invention discloses an absolute wavelength calibration and adjustment device and method. The absolute wavelength calibration and adjustment device and method are used for calibrating and adjusting the absolute wavelength of an excimer laser. The device sequentially comprises a first positive lens (1), a homogenizing sheet (2), a second positive lens (3), a first semi-transparent and semi-reflecting lens (4a), a second semi-transparent and semi-reflecting lens (4b), a first hollow cathode lamp (5a), a second hollow cathode lamp (5b), a third positive lens (6a), a fourth positive lens (6b), a first light filter (7a), a second light filter (7b), a first ultraviolet photoelectric detector (8a), a second ultraviolet photoelectric detector (8b) and a third ultraviolet photoelectric detector (8c) according to the direction of a light path, wherein the first hollow cathode lamp (5a) and the second hollow cathode lamp (5b) are made of different elements. According to the method, calibration and adjustment of the absolute wavelength of the laser are carried out through the two hollow cathode lamps filled with different elements respectively on the basis of a method of at least two high-absorption intensity atomic absorption lines of about 193nm emitted from two different elements; the absolute wavelength calibration and adjustment accuracy is improved through high-contrast signal variations generated at the two strong atomic absorption lines; and the requirements on the detection circuit accuracy can be reduced.

Description

technical field [0001] The invention belongs to the technical field of lasers, and in particular relates to a device and method for calibrating and calibrating the absolute wavelength of an excimer laser. Background technique [0002] ArF excimer laser is the light source for lithography exposure widely used in the integrated circuit chip manufacturing industry. The emission spectrum of ArF excimer lasers for lithography is in the range of 193.0-193.6nm, and the center wavelength is around 193.37nm. The accuracy of the center wavelength is usually higher than 0.1pm, and the wavelength is fine and stable. The central wavelength is a key parameter of the excimer laser, which affects the imaging quality of the subsequent illumination imaging system and the final lithography resolution node. Therefore, excimer lasers used in lithography need to have an on-line accurate calibration and calibration device for the central wavelength, which can achieve regular accurate calibration ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01S3/081H01S3/08H01S3/13
CPCH01S3/08H01S3/081H01S3/13H01S3/1306
Inventor 李慧赵江山刘广义韩晓泉冯泽斌白路军周翊
Owner RAINBOW SOURCE LASER RSLASER
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