Unlock instant, AI-driven research and patent intelligence for your innovation.

A purification chemical workstation

A workstation and chemical technology, applied in the field of microelectronic process equipment, can solve the problems of gas leakage and the unsafe and reliable purification workbench, and achieve the effect of preventing airflow rebound, improving airflow ordering, and preventing leakage.

Active Publication Date: 2018-09-21
南通华梦聚氨酯材料有限公司
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] However, this kind of purification workbench will inevitably have a small amount of gas leaking from the high-pressure area. When there is high-risk toxic gas, the purification workbench becomes less safe and reliable

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A purification chemical workstation
  • A purification chemical workstation
  • A purification chemical workstation

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] Such as figure 1 As shown, this embodiment purifies the chemical workstation, the purification workbench, and the water bath heating pool 10 and the cleaning pool 11 placed inside the purification workbench. Among them, the purification workbench includes an air intake system and an exhaust system. A diffuser plate 1 is provided under the intake system, a working cavity 2 is arranged under the diffuser plate 1, and a base 12 is provided under the working cavity 2, a water bath heating pool 10 and The cleaning pool 11 is embedded in the base. The outer end of the working cavity 2 close to the staff has a transparent end plate 2 with operating holes 9 (see Figure 4 ), the side of the working chamber 2 close to the end plate 3 is a transparent partition 4, which has an operation hole for the staff to reach into the working chamber with both hands (the partition 4 can be structured with the end plate Same), a barrier is formed between the transparent end plate 3 and the tra...

Embodiment 2

[0034] Such as image 3 As mentioned, the purification chemistry workstation of this embodiment is a simplified solution of the purification chemistry workstation of the first embodiment. The specific difference is that no purified air is passed through the compartment above the purification workstation. Specifically, the purification chemical workstation of this embodiment includes a purification workbench and a water bath heating pool 10 and a cleaning pool 11 placed inside the purification workbench. The purification workbench includes an air intake system and an exhaust system. A diffuser 1 is arranged below the intake system, a working cavity 2 is arranged below the diffuser 1 and a base 12 is arranged below the working cavity. The outer end of the working cavity 2 close to the staff has a transparent end plate 2 with operating holes 9. The side of the working cavity 2 close to the end plate 3 is a transparent partition 4, and the transparent partition 4 has room for the st...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a clean chemical work station which includes a clean work bench and a water bath heating tank and a clean water tank which are arranged therein. The clean work station includes a gas inlet system, a gas exhaust system and a work chamber. A transparent end plate, in which an operation hole is formed, is arranged on the outer end of the work chamber. One side, which is closed to the transparent end plate, of the work chamber is a transparent insulation plate. An insulation layer is formed between the transparent end plate and the transparent insulation plate. The gas exhaust system includes a gas exhaust port which is arranged below the insulation layer, and a gas pumping apparatus which is connected to the gas exhaust port through a gas exhaust pipeline. In the invention, the water bath heating tank and the clean water tank are disposed in the clean work bench, so that a clean environment for chemical etching is provided, and meanwhile, volatile gas is prevent from escaping into atmosphere, so that damage of the volatile gas to body during the chemical etching is avoided. A user can carry out work with the clean work bench in a normal environment without any special dust-free room, so that the clean work station can greatly reduce cost and has important significance on scientific research and education.

Description

Technical field [0001] The invention relates to a purification chemical workstation and belongs to the technical field of microelectronic process equipment. Background technique [0002] Chemical etching is a common process step in the solar cell manufacturing process. The exposed silicon wafer is put into an etching solution for etching, and then deionized water is used for cleaning. Since the microelectronics industry requires a dust-free environment, chemical etching and cleaning are performed in a dust-free room. However, for the operators who are also in the clean room, the harmful substances volatilized during the etching process have an adverse effect on their health. [0003] In industrial production and scientific research, many places need to use dust-free working environment. The clean bench can provide an effective working environment for these purposes and improve the efficiency of production and scientific research. The inventor envisions that if the chemical part ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B01L1/04
Inventor 王强邓洁朱海峰
Owner 南通华梦聚氨酯材料有限公司