Method for preparing high silicon-aluminum alloy electronic packaging material through spray deposition and near-melting point compacting densification
An electronic packaging material, high-silicon aluminum alloy technology, applied in the field of modern electronic packaging, can solve the problems of high cost, complex processing procedures, long processing time, etc., and achieve the effect of low equipment requirements, simple process and low energy consumption
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
example 1
[0023] Example 1, Al-30%Si Alloy Densified by Spray Deposition Near Melting Point
[0024] Melting, refining and degassing pure aluminum and high-purity silicon in a medium-frequency induction furnace, with a Si content of 30%, using a circular slit airflow atomization nozzle, using high-pressure liquid nitrogen as the atomization cooling medium, atomization system and deposition substrate The matching method is oblique spraying and straight pulling, and the specific process parameters for preparing Al-30% Si alloy by spray deposition are as follows: the inclination angle is 20°, the atomizing gas pressure is 0.6MPa, the melt temperature is 1273K, the eccentricity is 20mm, the deposition distance The diameter of the nozzle is 300 mm, the diameter of the nozzle is 3 mm, the rotation speed of the deposition disc is 500 r·min-1, and the descending speed of the deposition disc is 12.8 mm·min-1. Process the deposited blank into a size of Φ100×100mm, put it into a mold, heat it to 7...
example 2
[0026] Example 2. Densification of Al-40% Si alloy by spray deposition near melting point
[0027] Melting, refining and degassing pure aluminum and high-purity silicon in a medium-frequency induction furnace, with a Si content of 40%, using a circular slot airflow atomization nozzle, using high-pressure liquid nitrogen as the atomization cooling medium, atomization system and deposition substrate The matching method is oblique spraying and straight pulling, and the specific process parameters for preparing Al-40% Si alloy by spray deposition are as follows: the inclination angle is 20°, the atomizing gas pressure is 0.8MPa, the melt temperature is 1393K, the eccentricity is 20mm, the deposition distance The diameter of the nozzle is 380mm, the diameter of the nozzle is 4mm, the rotation speed of the deposition disk is 500r / min, and the descending speed of the deposition disk is 15.5mm / min. Process the deposited blank into a size of Φ100×100mm, put it into a mold, heat it to 8...
example 3
[0029] Example 3, Al-50% Si Alloy Densified by Spray Deposition Near Melting Point
[0030] Melting, refining and degassing pure aluminum and high-purity silicon in a medium-frequency induction furnace, with a Si content of 50%, using a circular slot airflow atomization nozzle, using high-pressure liquid nitrogen as the atomization cooling medium, atomization system and deposition substrate The matching method is oblique spraying and straight pulling, and the specific process parameters for preparing Al-50% Si alloy by spray deposition are as follows: the inclination angle is 20°, the atomizing gas pressure is 1MPa, the melt temperature is 1473K, the eccentricity is 25mm, and the deposition distance is 380mm, the diameter of the nozzle is 4.5mm, the rotation speed of the deposition disk is 500r / min, and the descending speed of the deposition disk is 17.2mm / min. Process the deposited blank to a size of Φ100×100mm, put it into a mold, heat it to 900°C with an induction coil, and...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 