Simple method for preparing carbon nanotube array-graphene mixed structure
A technology of carbon nanotube array and mixed structure, applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve problems such as unavoidable, multi-step growth process, complex parameters, etc., to reduce costs, reduce Preparation link and time, optimize the effect of the preparation process
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Embodiment 1
[0023] A simple method for preparing a carbon nanotube array-graphene hybrid structure, comprising the following steps:
[0024] 1. Slice the wafer, deionized water, and absolute ethanol for 10 minutes, then ultrasonically clean it. 2 Blow dry for later use;
[0025] 2. Weigh 2g of ferrocene with an electronic balance, measure 100ml of xylene with a graduated cylinder, mix it according to the 2% ratio, and dissolve it with ultrasound;
[0026] 3. Put the cleaned silicon wafer into the middle of the quartz tube and place it in the central heating zone of the heating furnace 2, put the prepared ferrocene and xylene solution near the inlet end of the quartz tube, and use a simple heating The device is wrapped outside the quartz tube at the position of the ferrocene and xylene solution, so as to heat the ferrocene and xylene. The experimental device diagram is shown in figure 1 shown;
[0027] 4. Using the chemical vapor deposition method, put the quartz tube into the furnace a...
Embodiment 2
[0031] 1. Slice the wafer, deionized water, and absolute ethanol for 10 minutes, then ultrasonically clean it. 2 Blow dry for later use;
[0032] 2. Weigh 6g of ferrocene with an electronic balance, measure 100ml of xylene with a graduated cylinder, mix it according to the 6% ratio, and dissolve it with ultrasound;
[0033] 3. Put the cleaned silicon wafer into the middle of the quartz tube and place it in the central heating zone of the heating furnace 2, put the prepared ferrocene and xylene solution near the inlet end of the quartz tube, and use a simple heating The device is wrapped outside the quartz tube at the position of the ferrocene and xylene solution, so as to heat the ferrocene and xylene;
[0034] 4. Using the chemical vapor deposition method, put the quartz tube into the furnace and heat it at a heating rate of 15°C / min. At the same time, pass Ar at a flow rate of 100 sccm to discharge the air in the tube, and raise the temperature to 850°C under the protection...
Embodiment 3
[0038] 1. Slice the wafer, deionized water, and absolute ethanol for 10 minutes, then ultrasonically clean it. 2 Blow dry for later use;
[0039] 2. Weigh 9g of ferrocene with an electronic balance, measure 100ml of xylene with a graduated cylinder, mix it according to the 9% ratio, and dissolve it with ultrasound;
[0040] 3. Put the cleaned silicon wafer into the middle of the quartz tube and place it in the central heating zone of the heating furnace 2, put the prepared ferrocene and xylene solution near the inlet end of the quartz tube, and use a simple heating The device is wrapped outside the quartz tube at the position of the ferrocene and xylene solution, so as to heat the ferrocene and xylene;
[0041] 4. Using the chemical vapor deposition method, put the quartz tube into the furnace and heat it at a heating rate of 30°C / min. At the same time, feed Ar at a flow rate of 100 sccm to discharge the air in the tube, and raise the temperature to 950°C under the protection...
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