Solar cell manufacturing method and solar cell

A technology for a solar cell and a manufacturing method, applied in the field of solar cells, can solve problems such as the complexity of the solar cell manufacturing process, and achieve the effects of low interface reference density, low resistance, and no absorption loss

Inactive Publication Date: 2016-11-16
MITSUBISHI ELECTRIC CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there is a problem that the manufacturing process of solar cells is complicated.

Method used

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  • Solar cell manufacturing method and solar cell
  • Solar cell manufacturing method and solar cell
  • Solar cell manufacturing method and solar cell

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Experimental program
Comparison scheme
Effect test

Embodiment approach 1

[0035] First, in the method of Embodiment 1, the case where the oxide film formed when the diffusion layer is formed on the entire surface during diffusion and the film formed during selective diffusion during thermal oxidation remains is described. figure 1 It is a figure which shows the solar cell of Embodiment 1, (a) is a top view, (b) is an AA cross-sectional view of (a), (c) is explanatory drawing which shows the density|concentration distribution of the diffusion layer of a light-receiving surface. figure 2 is a diagram showing a flow chart explaining the manufacturing process, image 3 (a)~(c), Figure 4 (a) to (c) and Figure 5 (a) to (c) are process sectional views showing the manufacturing process of the solar cell of the first embodiment.

[0036] In the present embodiment, when the high-concentration diffusion layer 5 is formed on a part of the first surface 1A of the substrate 1 on which the diffusion layer 2 on the light-receiving surface is formed, thermal ox...

Embodiment approach 2

[0051] In the first embodiment, the doping paste 4 is formed after the oxide film 3 formed in the diffusion step (step S103 ) is removed, but in this embodiment, the oxide film 3 is not removed and is left as it is. process. By remaining the oxide film 3 formed during diffusion, a high passivation effect is obtained. Image 6 is a diagram showing the solar cell of the second embodiment, Figure 7 is a diagram showing a flow chart explaining the manufacturing process, Figure 8 (a)~(c), Figure 9 (a) and (b) are process sectional views. like Image 6 As shown, the solar cell of this embodiment is figure 1 The solar cell of the first embodiment is the same as the solar cell of the first embodiment, except that the oxide film 3 remains on the light-receiving surface side. Therefore, description is omitted here, and the same symbols are attached to the same parts. Also in this embodiment, as in Embodiment 1, the thermally oxidized film 6 formed by thermal oxidation for ther...

Embodiment approach 3

[0064] In the above-described first embodiment, the thermal oxide film 6 formed in the thermal oxidation step (step S106 ) is left as it is without being removed, and the backside etching ( S107 ) and the antireflection film forming step ( S108 ) are performed, but in this case In the embodiment, the oxide film 3 formed at the time of diffusion is removed, and the film at the time of thermal oxidation, that is, the thermally oxidized film 6 is also removed, and the case where it does not remain will be described. Figure 10 is a diagram showing the solar cell of the third embodiment, Figure 11 is a diagram showing a flow chart explaining the manufacturing process, Figure 12 (a)~(c), Figure 13 (a) to (d) are process sectional views. The solar cell of this embodiment is figure 1 The solar cell of the first embodiment is the same as the solar cell of the first embodiment, except that the thermal oxide film 6 is not left on the light-receiving surface side. Therefore, the d...

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Abstract

The purpose of the present invention is to achieve high efficiency by reducing surface concentration of a light receiving surface and increasing impurity concentration under electrodes, while facilitating concentration control of a diffusion layer. At the time of forming a high concentration diffusion layer (5) on a part of a first surface (1A) of a substrate (1) having formed thereon a diffusion layer (2) of a light receiving surface, an impurity in the outermost surface of the diffusion layer (2) of the light receiving surface is taken into a thermally oxidized film (6) by performing thermal oxidation in a state wherein a diffusion source is formed. Consequently, an impurity concentration of the outermost surface of the diffusion layer (2) of the light receiving surface is set lower than the impurity concentration of the inner side.

Description

technical field [0001] The present invention relates to a method for manufacturing a solar cell and a solar cell. Background technique [0002] Conventionally, in a crystalline silicon solar cell, the diffusion concentration and depth of the diffusion layer on the light-receiving surface side are the main factors that determine the surface recombination speed and the recombination speed in the diffusion layer, and thus have a great influence on the conversion efficiency. As the impurity concentration dependence of the diffusion layer, when the concentration is high, the recombination speed increases, but on the other hand, the contact resistance with the electrode and the surface conductivity decrease, so the internal resistance loss decreases. The diffusion layer of the conventional solar cell has been designed in consideration of the balance between recombination and internal resistance loss. [0003] In order to improve the efficiency of the solar cell, a structure in wh...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/068H01L31/0224
CPCH01L31/022425Y02E10/547H01L31/068H01L31/1804Y02P70/50
Inventor 幸畑隼人
Owner MITSUBISHI ELECTRIC CORP
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