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Method for depositing nanogold in microfluidic pore passage

A nano-gold, microfluidic technology, applied in chemical instruments and methods, laboratory containers, measuring devices, etc., to achieve high repeatability, low price, and good repeatability

Active Publication Date: 2016-12-07
DALIAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to overcome the deficiencies in the prior art, provide a kind of with (PDDA / PSS) n Multilayer self-assembled film of ITO glass as the substrate, with KAuCl 4 and H 2 SO 4 The mixed solution adopts chronoamperometry to deposit nano-gold in polydimethylsiloxane (PDMS) microfluidic channels, avoiding problems such as the use of expensive instruments and complex process conditions

Method used

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  • Method for depositing nanogold in microfluidic pore passage
  • Method for depositing nanogold in microfluidic pore passage
  • Method for depositing nanogold in microfluidic pore passage

Examples

Experimental program
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Effect test

Embodiment 1

[0022] (1) Pour PDMS liquid A (monomer) and liquid B (initiator) into a beaker at a mass ratio of 10:1, stir with a glass rod for 5 minutes, and then pour it into the above-mentioned petri dish with a silicon wafer.

[0023] (2) Put the petri dish in a concentrated desiccator, pump air with a diaphragm vacuum pump for 1.5 hours to remove air bubbles in PDMS, and then place it in a vacuum oven at 80° C. for 1 hour to solidify.

[0024] (3) After it cools naturally, gently peel off the PDMS from the silicon wafer template, cut it into small pieces with a cutting machine, and then punch holes in the corresponding parts with a manual chip puncher for experimental use.

[0025] (4) Ultrasonic clean the ITO glass with absolute ethanol, and then place it in a UV ozone cleaner for 30 minutes, then place the cleaned ITO with the conductive surface facing up, soak it in 1 mg / mL PDDA solution for 5 minutes, and take it out , washed with distilled water several times in a small amount, an...

Embodiment 2

[0033] (1) Pour PDMS liquid A (monomer) and liquid B (initiator) into a beaker at a mass ratio of 10:1, stir with a glass rod for 5 minutes, and then pour it into the above-mentioned petri dish with a silicon wafer. The culture dish was placed in a concentrated desiccator, evacuated with a diaphragm vacuum pump for 1.5 hours to remove air bubbles in PDMS, and then placed in a vacuum oven at 80°C for 1 hour to solidify. After it cooled naturally, the PDMS was gently peeled off from the silicon wafer template, cut into small pieces with a cutting machine, and then punched holes in the corresponding parts with a manual chip puncher for experimental use.

[0034] (2) Ultrasonic clean the ITO glass with absolute ethanol, then place it in a UV ozone cleaner for 30 minutes, then place the cleaned ITO with the conductive surface facing up, soak it in 10mg / mL PDDA solution for 5min, take it out , washed with distilled water several times in a small amount, and then blown dry with nitro...

Embodiment 3

[0038] (1) Pour PDMS liquid A (monomer) and liquid B (initiator) into a beaker at a mass ratio of 10:1, stir with a glass rod for 5 minutes, and then pour it into the above-mentioned petri dish with a silicon wafer. The culture dish was placed in a concentrated desiccator, evacuated with a diaphragm vacuum pump for 1.5 hours to remove air bubbles in PDMS, and then placed in a vacuum oven at 80°C for 1 hour to solidify. After it cooled naturally, the PDMS was gently peeled off from the silicon wafer template, cut into small pieces with a cutting machine, and then punched holes in the corresponding parts with a manual chip puncher for experimental use.

[0039] (2) Ultrasonic clean the ITO glass with absolute ethanol, then place it in a UV ozone cleaner for 30 minutes, then place the cleaned ITO with the conductive surface facing up, soak it in 10mg / mL PDDA solution for 5min, take it out , washed with distilled water several times in a small amount, and then blown dry with nitro...

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Abstract

The invention relates to a method for depositing nanogold in a microfluidic pore passage. ITO glass provided with a (PDDA / PSS)n self-assembled multilayer membrane is prepared by carrying out pretreatment on ITO glass, the prepared ITO glass is taken as a substrate and is sealed with a chip made from PDMS to form a microfluidic chip, then mixed solution of KAuCl4 and H2SO4 is injected into the microfluidic pore passage, nanogold is deposited in the microfluidic pore passage by virtue of a chronoamperometry, and nanogold surface topography detection shows that uniformly distributed nanogold particles can be seen in the microfluidic pore passage. The method provided by the invention has the characteristics of rapidness, simplicity, good repeatability and low cost and has a broad application prospect in the fields of medical biology engineering, biomedical sensors and the like.

Description

technical field [0001] The invention relates to a microfluidic channel surface treatment technology, in particular to a process method for depositing nanometer gold in a microfluidic channel. Background technique [0002] Microfluidics, also known as microfluidics chip or microfluidics laboratory, usually refers to the effective concentration of sampling, sample pretreatment, sample injection, separation, detection and other operations in the process of biomedical and chemical experiments in a few square meters A technology platform on a centimeter-sized chip [1] . Microfluidic technology is widely used in chemical [2，3] and biomedicine [4，5] In other fields, the operation steps are greatly simplified, the reaction time is shortened, the detection sensitivity is enhanced, and the overall efficiency is improved. Nanogold refers to particles with a particle size of 1-100nm. Through modification, nanogold can be combined with molecules such as DNA, RNA, and protein, and it ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N27/26G01N27/30B01L3/00
CPCB01L3/5027B01L2200/10B01L2300/0887B01L2300/12G01N27/26G01N27/30G01N27/307
Inventor 孙晶郎明非
Owner DALIAN UNIV
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