A kind of preparation method of sio2/tio2 anti-reflection film
An anti-reflection film and substrate technology, applied in the direction of instruments, coatings, optics, etc., can solve the problems of cumbersome implementation, changes in the microstructure of the film, difficult adjustment of the refractive index, etc., and achieve strong operability and continuously adjustable refractive index , fast response effect
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[0024] The technical solutions of the present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.
[0025] SiO of the present invention 2 / TiO 2 The preparation method of the anti-reflection film, the specific operation steps are as follows:
[0026] Step 1, mix anhydrous ethanol, ammonia water, deionized water and ethyl orthosilicate with a molar ratio of 37.6:0.17:3.25:1, stir evenly and let stand in a stable environment for about 7 days to obtain alkali-catalyzed SiO 2 Sol; SiO 2 The mass percent concentration of sol is 3%, SiO 2 The effect of sol concentration on the obtained SiO 2 Thin films (about 100nm in thickness) will have an impact; in the above reaction system, ammonia water is the catalyst, tetraethyl orthosilicate is the silicon source, and absolute ethanol is the solvent;
[0027] Step 2, add a certain amount of butyl titanate into the mixture of absolute ethanol and toluene (the volume ratio of ...
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