Fixed abrasive and grinding technique for sapphire
A technology of fixed abrasive and grinding process, applied in grinding tools, other chemical processes, chemical instruments and methods, etc., can solve the problems of wafer surface scratches, affecting work efficiency, high diamond cost, etc., and achieves fine grinding steps, Grinding flat surface stabilizes the effect of increasing connectivity
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Embodiment 1
[0023] A kind of consolidated abrasive for sapphire, the proportioning of described consolidated abrasive for sapphire is as follows: by weight, 55 parts of boron carbide powder of W14, 25 parts of silicon dioxide powder of W50, chrome-plated oxidation of W28 18 parts of aluminum powder, 5 parts of W28 copper powder.
[0024] The boron carbide powder of W14, the silica powder of W50, the chrome-plated alumina powder of W28 and the copper powder of W28 are mixed uniformly after drying respectively, and the consolidated abrasive for sapphire is prepared by mixing uniformly W14 boron carbide powder, W50 silica powder, W28 chrome-plated alumina powder and W28 copper powder are sintered and solidified at 1700°C with curing agent.
[0025] A kind of grinding technique for the solidified abrasive material of sapphire, comprises the steps:
[0026] S1. Prepare a grinding pad, make a grinding pad from the fired consolidated abrasive, and open a reserved slot on one side of the grindin...
Embodiment 2
[0035] A kind of consolidated abrasive for sapphire, the proportioning of described consolidated abrasive for sapphire is as follows: by weight, 57.5 parts of boron carbide powder of W14, 26.5 parts of silicon dioxide powder of W50, chrome-plated oxidation of W28 19 parts of aluminum powder, 6.5 parts of W28 copper powder.
[0036] The boron carbide powder of W14, the silica powder of W50, the chrome-plated alumina powder of W28 and the copper powder of W28 are mixed uniformly after drying respectively, and the consolidated abrasive for sapphire is prepared by mixing uniformly W14 boron carbide powder, W50 silica powder, W28 chrome-plated alumina powder and W28 copper powder are sintered and solidified at 1850°C with curing agent.
[0037] A kind of grinding technique for the solidified abrasive material of sapphire, comprises the steps:
[0038] S1. Prepare a grinding pad, make a grinding pad from the fired consolidated abrasive, and open a reserved slot on one side of the g...
Embodiment 3
[0047]A kind of fixed abrasive for sapphire, the described proportioning of the fixed abrasive for sapphire is as follows: by weight, 60 parts of boron carbide powder of W14, 28 parts of silicon dioxide powder of W50, chrome-plated oxidation of W28 20 parts of aluminum powder, 8 parts of W28 copper powder.
[0048] The boron carbide powder of W14, the silica powder of W50, the chrome-plated alumina powder of W28 and the copper powder of W28 are mixed uniformly after drying respectively, and the consolidated abrasive for sapphire is prepared by mixing uniformly W14 boron carbide powder, W50 silica powder, W28 chrome-plated alumina powder and W28 copper powder are sintered and solidified at 2100°C with curing agent.
[0049] A kind of grinding technique for the solidified abrasive material of sapphire, comprises the steps:
[0050] S1. Prepare a grinding pad, make a grinding pad from the fired consolidated abrasive, and open a reserved slot on one side of the grinding pad;
[...
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