A kind of preparation method of Sico micron-scale porous hollow ceramic ball
A ceramic ball, micron-level technology, applied in the field of micron ceramics, achieves the effect of simple operation, low equipment investment and good stability
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Embodiment 1
[0022] The silicon wafers were cleaned with ethanol and ultrasonicated, and then placed in an oven for later use. Weigh 0.8 g of polyvinylsilazane and 0.032 g of dicumyl peroxide, dissolve them in a three-necked flask filled with 5 ml of ethanol, and stir magnetically for 2 h under the protection of nitrogen atmosphere to obtain solution A. Weigh 0.350g of F127, dissolve it in a three-necked flask filled with 5ml of xylene, and stir it magnetically for 2h under the protection of nitrogen atmosphere to form solution B. Mix solution A and solution B to obtain a mixed solution, pour the mixed solution into a three-neck flask, and magnetically stir for 20 h under the protection of nitrogen atmosphere. The mixture was poured into a silicon wafer, and kept in a vacuum oven at 70° C. for 48 hours. Then put the silicon wafer with a transparent film in a vacuumed oven at 140°C for cross-linking for 40 minutes, take it out and remove the film to obtain a light yellow film, put the film...
Embodiment 2
[0025] The silicon wafers were cleaned with ethanol and ultrasonicated, and then placed in an oven for later use. Weigh 0.8 g of polyvinylsilazane and 0.032 g of dicumyl peroxide, dissolve them in a three-necked flask filled with 5 ml of ethanol, and stir magnetically for 3 h under the protection of nitrogen atmosphere to obtain solution A. Weigh 0.350g of F127, dissolve it in a three-necked flask filled with 5ml of xylene, and stir it magnetically for 3h under the protection of nitrogen atmosphere to form solution B. Mix solution A and solution B to obtain a mixed solution, pour the mixed solution into a three-neck flask, and magnetically stir for 24 h under the protection of a nitrogen atmosphere. Pour the mixed solution into a silicon wafer, and keep it in a vacuum oven at 70° C. for 48 hours after vacuuming. Then put the silicon wafer with a transparent film in a vacuumed oven at 140°C for 40 minutes of cross-linking, take it out and remove the film to obtain a light yell...
Embodiment 3
[0028] The silicon wafers were cleaned with ethanol and ultrasonicated, and then placed in an oven for later use. Weigh 0.8 g of polyvinylsilazane and 0.032 g of dicumyl peroxide, dissolve them in a three-necked flask filled with 5 ml of ethanol, and stir magnetically for 3 h under the protection of nitrogen atmosphere to obtain solution A. Weigh 0.350 g of F127, dissolve it in a three-necked flask filled with 5 ml of xylene, and stir it magnetically for 3 h under the protection of nitrogen atmosphere to obtain solution B. Mix solution A and solution B to obtain a mixed solution, pour the mixed solution into a three-neck flask, and magnetically stir for 24 h under the protection of a nitrogen atmosphere. The stirred mixture was poured into a silicon wafer, and kept in a vacuum oven at 70° C. for 50 h. Then put the silicon wafer with a transparent film in a vacuum oven at 140°C for cross-linking for 40 minutes, take it out and remove the film to obtain a light yellow film, put...
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