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A kind of exposure method of direct writing screen plate making equipment

A technology of screen plate making and exposure method, which is applied in the direction of exposure device, plate preparation, optomechanical equipment, etc.

Active Publication Date: 2019-06-14
ADVANCED DIGITAL SCREEN SYST INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] In the existing laser direct writing equipment, the displacement sensor next to the exposure point is generally used to measure the distance between the optical lens and the screen at the exposure point position. Although the exposure point position is close to the displacement sensor, there is a short distance between them, but They are not actually in the same position; therefore, the distance measured by the displacement sensor is not the actual distance from the optical lens to the screen, although they are very close in most cases
[0003] In the prior art, the above-mentioned measured distance is used to adjust the focal plane of the optical lens at the exposure point, because the assembly position of the displacement sensor is inconsistent with the position of the exposure point, and using the distance measured by the displacement sensor to adjust the focal plane of the optical lens will lead to errors
[0004] In addition, in the existing laser direct writing equipment, the digital micromirror device is often used on the whole page. Since the digital micromirror device is composed of a large number of micromirrors, when the function of some micromirrors fails, the entire digital micromirror device is scrapped, resulting in digital micromirror devices. The disadvantages of low utilization rate of mirror devices and relatively short service life
[0005] In addition, in the existing laser direct writing equipment, during the scanning process of the digital micromirror device, on the scanning track of each micromirror point, the energy distribution of each track is uneven, resulting in the distribution of energy output on the digital micromirror device. uneven problem
Affect image exposure quality

Method used

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  • A kind of exposure method of direct writing screen plate making equipment
  • A kind of exposure method of direct writing screen plate making equipment
  • A kind of exposure method of direct writing screen plate making equipment

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0076] Refer to attached figure 1 And attached figure 2 , a direct-writing screen plate-making equipment, used for the plate-making process of screen printing, including a host 1, a motion system 2, a light source controller 3, a light source 4, a data processing module 5, a digital micromirror device 6, and a Z-axis control Device 7, optical lens 8, signal splitter 9, displacement sensor 10, Z-axis mechanism 11 and micro-motion mechanism 12;

[0077] The motion system 2 is composed of a stepping platform 2-1, a scanning platform 2-2 and a platform driver 2-3; wherein the platform driver 2-3 is connected with the host computer 1 for driving the stepping platform 2-1 and the scanning platform. platform 2-2 movement;

[0078] Described light source controller 3 is connected with main frame 1 and controls the switching status and light intensity of light source 4, and light source 4 is the light energy of continuous output that digital micromirror device 6 provides, and the li...

Embodiment 2

[0087] Refer to attached Figure 4 (b), attached Figure 4 (b) The scanning direction of the digital micromirror device 6 forms an included angle θ with the row direction of the micromirrors in the digital micromirror device. To repeat once, the image area 20 to be scanned is divided into subdivision blocks with a pitch of pw2, pw2=d×sinθ;

[0088] Refer to attached Figure 4 (a), attached Figure 4 (b) The scanning direction of the digital micromirror device 6 has no angle with the row direction of the micromirror in the digital micromirror device, and the image area 20 to be scanned with the band is divided into subdivided blocks with a pitch of pw1, pw1=d, due to pw2=d×sinθ, obviously pw2 is less than pw1, under the situation that the scanning direction of digital micromirror device 6 and the row direction of micromirror whole row in digital micromirror device form an included angle θ, the image region 20 to be scanned is divided More detailed, high data resolution, hig...

Embodiment 3

[0101] The inclined laser direct writing technology cannot directly use the TIF image used in the printing field. The existing technology is to enlarge the image, but the amount of calculation and data in this process is extremely large. Compared with the prior art, the amount of computation and data in the processing process of this embodiment is small, and the obtained graphics have high resolution, which is conducive to the low-load operation of the equipment, and can improve the pattern refresh rate of the digital micromirror device (DMD).

[0102] In this embodiment, the TIF image is converted into a vector diagram, and the specific implementation process adopts the following process.

[0103] Refer to attached figure 1 , the TIF image processing method on the direct-write screen plate-making equipment is divided into the following steps:

[0104] (11) Image processing software is first installed in the host computer 1;

[0105] (12) set the path of the TIF image to be ...

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Abstract

The present invention discloses an apparatus for making direct writing screen plate and a using method thereof. In the prior art, there is a problem that a measured focal plane is inconsistent with an actual focal plane due to the position deviation between an assembled displacement sensor and an exposure point. The present invention provides a direct writing screen plate making apparatus and a focal plane control method. A Z-axis controller is used to pre-establish a mapping relation between the focal plane position of the scanning band to be scanned in the next step and the scanning platform position signal. During the next step of scanning, the position of the optical lens is adjusted according to the mapping relation, thus avoiding the problem of inconsistency between the calculated focal plane and the actual focal plane caused by the position deviation between the assembled displacement sensor and the optical lens. The present invention also provides a method for exposing a region of interest and a method for compensating the on-line real-time light uniformity, which solve the problems of short service life of the digital micromirror device and uneven distribution of energy output on the digital micromirror device.

Description

technical field [0001] The invention relates to the technical field of screen plate making, in particular to an exposure method of a direct-write screen plate making device Background technique [0002] In the existing laser direct writing equipment, the displacement sensor next to the exposure point is generally used to measure the distance between the optical lens and the screen at the exposure point position. Although the exposure point position is close to the displacement sensor, there is a short distance between them, but They are not actually in the same position; therefore, the distance measured by the displacement sensor is not the actual distance from the optical lens to the stencil, although they are very close in most cases. [0003] In the prior art, the above-mentioned measured distance is used to adjust the focal plane of the optical lens at the exposure point, because the assembly position of the displacement sensor is inconsistent with the position of the ex...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/2055G03F7/70383G03F7/70508B41C1/145G03F7/12G03F7/2057G03F7/70291G03F9/7026G03F7/70275G03F7/70591G03F7/70641
Inventor 吴景舟马迪陈修涛王运钢董辉李泽忠其他发明人请求不公开姓名
Owner ADVANCED DIGITAL SCREEN SYST INC
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