A method for preparing lithium strips by continuous electrodeposition
A technology of electrodeposition and lithium strips, which is applied in the field of continuous electrodeposition to prepare lithium strips, can solve problems such as the inability to continuously prepare ultra-thin lithium strips, and achieve the effects of easy storage and transportation, uniform film layers, and simple methods
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Embodiment 1
[0044] A high-purity copper foil strip with a thickness of 10 μm is used as the deposition base strip, and the surface is uniformly coated with a metal lithium layer with a thickness of about 15 μm through pre-treatment, electrodeposition, and post-treatment processes, and finally an ultra-thin lithium strip (such as figure 2shown). The pre-treatment conditions are: 1M sodium hydroxide solution for degreasing, 0.05M dilute nitric acid solution for second immersion activation, the activation here is actually a coarsening process, and the above-mentioned each treatment is washed with high-purity water and quickly dried at 80°C . Electrodeposition conditions are: use 10mA cm -2 The high-current deposition of 5s allows a small amount of lithium to deposit everywhere on the surface of the copper foil substrate, and then enters the 0.1mA·cm -2 The low current lithium electrodeposition, the low current lithium deposition time is 5h, the electrolyte formula is EC, PC, DMC, lithium ...
Embodiment 2
[0046] A high-purity copper foil tape with a thickness of 10 μm is used as the deposition base tape, and the surface is uniformly covered with a metal lithium layer with a thickness of about 8 μm through pretreatment, electrodeposition, and post-treatment processes, and finally an ultra-thin lithium strip (lithium layer) is obtained. thickness is 8 μm). The pre-treatment conditions are: 1M sodium hydroxide solution for degreasing, 0.05M dilute nitric acid solution for second immersion activation, the activation here is actually a coarsening process, and the above-mentioned each treatment is washed with high-purity water and quickly dried at 80°C . Electrodeposition conditions are: use 5.0mA·cm -2 The high-current deposition of 10s allows a small amount of lithium to deposit everywhere on the surface of the copper foil substrate, and then enters the 0.02mA·cm -2 The low-current lithium electrodeposition, the low-current lithium deposition time is 10h, and the electrolyte form...
Embodiment 3
[0048] A high-purity copper foil tape with a thickness of 10 μm is used as the deposition base tape, and the surface is uniformly covered with a metal lithium layer with a thickness of about 28 μm through pre-treatment, electrodeposition, and post-treatment processes, and finally an ultra-thin lithium tape (lithium layer) is obtained. thickness is 28 μm). The pre-treatment conditions are: 1M sodium hydroxide solution for degreasing, 0.05M dilute nitric acid solution for second immersion activation, the activation here is actually a coarsening process, and the above-mentioned each treatment is washed with high-purity water and quickly dried at 80°C . The electrodeposition condition is: use 50mA·cm -2 The high-current deposition of 0.5s allows a small amount of lithium to deposit everywhere on the surface of the copper foil substrate, and then enters the 1mA·cm -2 The low-current lithium electrodeposition, the low-current lithium deposition time is 1h, and the electrolyte form...
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