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Method for preparing SiC hollow microspheres

A technology of hollow microspheres and silicon doping, applied in the field of laser inertial confinement fusion, which can solve the problems of large diameter dispersion and failure to meet the requirements, and achieve the effects of good sphericity, simple operation, and high uniformity of wall thickness

Inactive Publication Date: 2017-05-31
LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this method mainly uses polystyrene microspheres as templates, and the diameters of the prepared SiC microspheres are all on the order of several microns and the diameter dispersion is large, which cannot meet the requirements of laser inertial confinement fusion for target materials.

Method used

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  • Method for preparing SiC hollow microspheres
  • Method for preparing SiC hollow microspheres
  • Method for preparing SiC hollow microspheres

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0042] Step 1. Select poly-α-methylstyrene hollow microspheres with a diameter range of 900±50 μm, and place the microspheres in the sample tray of the chemical vapor deposition device;

[0043] Step 2, vacuumize the closed device, then feed the mixed gas of tetramethylsilane, trans-dibutene and hydrogen, and adjust the air pressure in the device to 15Pa; 0.1ml / min, 0.4ml / min, 10ml / min;

[0044] Step 3. Turn on the 40.68MHz RF power supply and adjust it to 10W to ionize the working gas to form plasma;

[0045] Step 4, start the vacuum motor to drive the poly-α-methylstyrene hollow microspheres to roll in the sample tray, so that the silicon-doped glow discharge polymer is deposited on the surface of the microspheres for 54 hours;

[0046] Step 5. Place the microspheres prepared in step 4 in a crucible, place them in the quartz tube of the tube furnace, close the quartz tube, evacuate, and feed argon as a protective gas; first heat it at a rate of 1°C / min to 300°C, and keep t...

Embodiment 2

[0049] Step 1. Select poly-α-methylstyrene hollow microspheres with a diameter range of 2000±20 μm, and place the microspheres in the sample tray of the chemical vapor deposition device;

[0050] Step 2, vacuumize the closed device, then feed the mixed gas of tetramethylsilane, trans-dibutene and hydrogen, and adjust the air pressure in the device to 15Pa; 0.3ml / min, 0.4ml / min, 10ml / min;

[0051] Step 3. Turn on the 40.68MHz RF power supply and adjust it to 20W to ionize the working gas to form plasma;

[0052] Step 4, start the vacuum motor to drive poly-α-methylstyrene hollow microspheres to roll in the sample tray, so that the silicon-doped glow discharge polymer is deposited on the surface of the microspheres for 60 hours;

[0053] Step 5. Place the microspheres prepared in step 4 in a crucible, place them in the quartz tube of the tube furnace, close the quartz tube, evacuate, and feed argon as a protective gas; first heat to 350°C, and keep the temperature for 14 hours...

Embodiment 3

[0056] Step 1. Select poly-α-methylstyrene hollow microspheres with a diameter range of 900±50 μm, and place the microspheres in the sample tray of the chemical vapor deposition device;

[0057] Step 2. Vacuumize the closed device, then feed the mixed gas of tetramethylsilane, trans-dibutene and hydrogen, and adjust the air pressure in the device to 25Pa; 0.3ml / min, 0.4ml / min, 10ml / min;

[0058] Step 3. Turn on the 40.68MHz RF power supply and adjust it to 40W to ionize the working gas to form plasma;

[0059] Step 4, start the vacuum motor to drive the poly-α-methylstyrene hollow microspheres to roll in the sample tray, so that the silicon-doped glow discharge polymer is deposited on the surface of the microspheres for 54 hours;

[0060] Step 5. Place the microspheres prepared in step 4 in a crucible, place them in the quartz tube of the tube furnace, close the quartz tube, evacuate, and feed argon as a protective gas; first heat it at a rate of 1°C / min to 300°C, and keep t...

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Abstract

The invention belongs to the field of laser inertial confinement fusion, and concretely relates to a method for preparing SiC hollow microspheres. The method comprises the following steps: uniformly depositing a silicon doped glow-discharge polymer on the surface of poly-alpha-methylstyrene or polystyrene hollow microspheres in a chemical vapor deposition manner, decomposing and removing the poly-alpha-methylstyrene or polystyrene hollow microspheres at the inner layer, and pyrolyzing the silicon doped glow-discharge polymer at the outer layer to form SiC in order to obtain the SiC hollow microspheres. The SiC hollow microspheres prepared through the method have the characteristics of controllable diameter and wall thickness, good sphericility and high wall thickness uniformity, and is applied to fusion igniting engineering as a pelleting layer of a fusion target pellet.

Description

technical field [0001] The invention belongs to the field of laser inertial confinement fusion, in particular to a method for preparing SiC hollow microspheres. Background technique [0002] In the field of laser inertial confinement fusion, the target pellet is used as the carrier of deuterium-tritium fuel, and its preparation is one of the key factors that determine the success of the experiment. The traditional ICF experimental target capsule has various design models, but the basic structure of the traditional target capsule is composed of a fuel layer and an ablation layer. Due to the low implosion efficiency of traditional target capsules, which cannot meet the needs of ICF experiments, a new target capsule model has emerged in recent years, that is, a pressure-assisting layer is added between the fuel layer and the ablation layer to further improve the target capsule. Implosion efficiency, SiC hollow microspheres are the only choice for pressure-assisting layer mater...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B32/977
CPCC01P2002/72C01P2004/02C01P2004/03C01P2004/34C01P2004/60
Inventor 王涛唐翠兰何智兵黄景林何小珊陈果刘艳松
Owner LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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