Emission-rate-controllable heat control material and preparing method thereof

A technology of emissivity and thermal control, which is applied in the field of aerospace materials, can solve the problems of insufficient independent temperature control capability, small ratio variation range, and limited application range, etc., and achieve good resistance to atomic oxygen and space radiation, and low cost , The effect of convenient production process

Inactive Publication Date: 2017-05-31
LANZHOU INST OF PHYSICS CHINESE ACADEMY OF SPACE TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, the existing thermal control materials mainly include rare earth manganese oxide doped materials La1-x-yM1xM2yMnO3 and doped vanadium oxide V1-x-yMxNyO2. The infrared emissivity of these two types of materials can be changed according to the temperature change. Emissivity, however, the solar absorption of these two types of thermal control materials is relatively large, taking La1-x-yM1xM2yMnO3 as an example, the solar absorption ratio of its surface is greater than 0.85
In the case of direct sunlight, the temperature of the spacecraft will rise rapidly, and the ability of independent temperature control is not enough. Moreover, the solar absorption ratio of these two types of materials is fixed, and the ratio of the solar absorption ratio to the infrared emissivity varies in a small range. lead to a limited range of application

Method used

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  • Emission-rate-controllable heat control material and preparing method thereof

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] Such as figure 1 As shown, an emissivity-controllable thermal control material, on the surface of a flexible polyimide substrate, there are two aluminum oxide transition layers, a silver film, two aluminum oxide films and a silicon dioxide layer in sequence from the inside to the outside.

[0027] First, a 50nm aluminum oxide transition layer was prepared on a flexible polyimide substrate by pulse-reaction DC magnetron sputtering, then a 150nm silver film was prepared by DC magnetron sputtering, and finally pulse-reaction DC magnetron sputtering was used. A 2 μm aluminum oxide film and a 0.5 μm silicon dioxide layer were sequentially prepared by the irradiation method. Finally, the performance of the sample reaches: the solar absorption ratio is 0.15, and the emissivity is 0.56.

[0028] The specific operation process is as follows:

[0029] (1) Al2O3 transition layer was plated by pulse reaction DC magnetron sputtering method: the polyimide substrate was placed on th...

Embodiment 2

[0034] First, a 20nm AlO transition layer was prepared on a flexible polyimide substrate by pulse-reaction DC magnetron sputtering, then a 100nm silver film was prepared by DC magnetron sputtering, and finally pulse-reaction DC magnetron sputtering was used. A 1.5 μm Al2O3 film and a 0.2 μm SiO2 layer were sequentially prepared by the irradiation method. Refer to Example 1 for the specific operation process, and adjust the thickness of each coating layer by controlling the sputtering power and time. Finally, the performance of the sample reaches: the solar absorption ratio is 0.13, and the emissivity is 0.45.

Embodiment 3

[0036] A 80nm Al2O3 transition layer was prepared on a flexible polyimide substrate by pulse-reaction DC magnetron sputtering, then a 200nm silver film was prepared by DC magnetron sputtering, and finally pulse-reaction DC magnetron sputtering was used. A 1.0 μm Al2O3 film and a 0.1 μm SiO2 layer were sequentially prepared by the irradiation method. Refer to Example 1 for the specific operation process, and adjust the thickness of each coating layer by controlling the sputtering power and time. Finally, the performance of the sample reaches: the solar absorption ratio is 0.12, and the emissivity is 0.34.

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Abstract

The invention discloses an emission-rate-controllable heat control material. The emission-rate-controllable heat control material comprises a base, an aluminum oxide transition layer used for improving adhesion force, a silver film used for improving sunlight reflectivity, an aluminum oxide film used for improving the infrared emission rate and a silicon dioxide layer used for antireflection. The surface of the base is sequentially provided with the aluminum oxide transition layer, the silver film, the aluminum oxide film and the silicon dioxide layer from interior to exterior. According to the heat control material, regulation on different absorption rates / emission rates can be achieved, lightweight design can be achieved, the heat control material is suitable for emission-rate-controllable heat control coatings of new-generation spacecraft which have the beneficial effects of being low in weight, small in size and isothermal in whole-spacecraft, the cost is low, the technology is simple, the space environment is good in stability, and different requirements for emission rates of different parts on the surface of a spacecraft and the requirement for improving space irradiation resistance of the heat control material are met.

Description

technical field [0001] The invention belongs to the field of aerospace materials, and in particular relates to a thermal control material with controllable emissivity and a preparation method thereof. Background technique [0002] Spacecraft thermal control materials are mainly used to ensure that the structural components and instruments of the spacecraft are in a suitable temperature range in the space environment, so that they can work normally under all possible conditions. At present, the existing thermal control materials mainly include rare earth manganese oxide doped materials La1-x-yM1xM2yMnO3 and doped vanadium oxide V1-x-yMxNyO2. The infrared emissivity of these two types of materials can be changed according to the temperature change. Emissivity, however, the solar absorption of these two types of thermal control materials is relatively large, taking La1-x-yM1xM2yMnO3 as an example, the solar absorption ratio of its surface is greater than 0.85. In the case of d...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/08C23C14/10C23C14/18
CPCC23C14/35C23C14/081C23C14/10C23C14/185C23C14/3485
Inventor 王艺冯煜东王志民何延春杨淼王虎李学磊张凯锋
Owner LANZHOU INST OF PHYSICS CHINESE ACADEMY OF SPACE TECH
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