Deep ultraviolet optics wave aberration detection apparatus and method

Abstract

The invention discloses a deep ultraviolet optics wave aberration detection apparatus and method; the apparatus comprises a quasi-molecular laser (1), an energy controller (2), a plano-concave cylindrical lens (3), a plano-convex cylindrical lens (4), a beam splitter (5), an energy detector (6), a first plane reflector (7), a diffractive optical element (8), a Fourier lens (9), a first collimating objective (10), a first 1 / 4 wave plate (11), a first 1 / 2 wave plate (12), a second plane reflector (13), a first focusing objective (14), an orifice plate (15), a second collimating objective (16), a second 1 / 2 wave plate (17), a polarizing splitting prism (18), a second 1 / 4 wave plate (19), a second focusing objective (20), a deep ultraviolet optical system (21) to be detected, a spherical reflector (22), a first relay lens (23), a second relay lens (24) and a Shack-Hartmann wavefront sensor (25). The deep ultraviolet optics wave aberration detection apparatus and method provide high-speed high-precision detection of system wave aberrations in integrated assembly and adjustment of deep ultraviolet optics.

Description

technical field [0001] The invention relates to the technical field of optical measurement, in particular to a device and method for detecting wave aberration of a deep ultraviolet optical system using the Shack-Hartmann method. Background technique [0002] In the field of scientific research and industry, optical systems working in the deep ultraviolet band play an increasingly important role, such as projection optical systems for semiconductor microlithography, observation systems used in the semiconductor industry, and micro-nano structure manufacturing processes The ultraviolet optical system used in the optical system, etc., these optical systems working in the deep ultraviolet band usually require extremely small wave aberration (on the order of several nanometers). Therefore, these optical systems must be tested for wave aberration in all aspects of processing, integration and work. [0003] The wave aberration detection methods of the deep ultraviolet optical syst...

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Problems solved by technology

[0004] U.S. Patents US6975387, US6914665 and the document "Portable phase measuring interferometer using Shack‐Hartmann method" (Proc. SPIE, 2003, 5038: 726~732) provide the method of measuring the wave of deep ultraviolet lithography objective lens by Shack‐Hartmann wavefront sensor. A device and a measurement method for aberration, but the device requires a collimating objective lens with a large numerical aperture, which brings difficulties to the detection of wave aberration

Chinese patent CN1016092668 effectively overcomes the difficulties caused by large numerical aperture collimating objective lenses by integrating the host and the first standard mirror on the mask stage and the second standard mirror on the silicon wafer stage, but the energy utilization rate of the system , signal-to-noise ratio, and detection accuracy all need to be improved

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