Solvent recovering system and method, coating machine and photoresist coating method

A recycling system and coating machine technology, applied in the direction of photoplate making process coating equipment, etc., can solve the problems of photoresist liquid deterioration, inability to regenerate, increase production cost, etc., and achieve the effect of saving the cost of solvent supply

Inactive Publication Date: 2017-05-31
TUNGHSU KUNSHAN DISPLAY MATERIAL CO LTD +2
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although this method can reduce the waste of part of the photoresist fluid, it will increase the production cost in terms of transportation and processing back to the original supplier, and the photoresist fluid may deteriorate due to long-term storage or temperature changes , making it impossible to regenerate

Method used

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  • Solvent recovering system and method, coating machine and photoresist coating method
  • Solvent recovering system and method, coating machine and photoresist coating method
  • Solvent recovering system and method, coating machine and photoresist coating method

Examples

Experimental program
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Embodiment approach

[0034] The present invention has no particular limitation on the specific structure of the distillation tank, as long as the solvent in the mixed waste liquid can be evaporated without evaporating the photoresist so as to separate the solvent from the photoresist. Since the photoresist and the solvent belong to two substances with different boiling points, the boiling point of the solvent is lower, while the boiling point of the photoresist is higher, and the separation of the two can be achieved by evaporating the solvent, and it can be made under low pressure and / or heating conditions. The solvent evaporates faster, which facilitates solvent recovery. Correspondingly, according to a preferred embodiment of the present invention, the distillation tank includes: a tank body of the distillation tank, which is used to contain the mixed waste liquid to be recovered; and a low-pressure pump, which is used to lower the distillation tank during the distillation process. the pressure...

Embodiment 1

[0062] This example is used to illustrate the solvent recovery system and method provided by the present invention.

[0063] In this embodiment, the mixed waste liquid to be recovered contains 20% by weight of photoresist-BM sensitive material, 70% by weight of propylene glycol methyl ether acetate (excluding propylene glycol methyl ether acetate contained in photoresist) and 10% solid impurities by weight.

[0064] like figure 1 As shown, the mixed waste liquid to be recovered is introduced into the distillation tank for distillation to vaporize the solvent in the mixed waste liquid. During the distillation process, the distillation temperature is controlled at 160°C and the pressure is 30Pa. Cool and liquefy in the liquefaction cooling tank, filter and remove impurities in the filter, and the recovered solvent is introduced into the solvent recovery tank for storage. The results showed that the solvent recovery was 75%.

Embodiment 2

[0066] This example is used to illustrate the solvent recovery system and method provided by the present invention.

[0067] In this embodiment, the mixed waste liquid to be recovered contains 25% by weight of photoresist-OC material, 70% by weight of propylene glycol methyl ether acetate and 5% by weight of solid impurities.

[0068] like figure 1 As shown, the mixed waste liquid to be recovered is introduced into the distillation tank for distillation to vaporize the solvent in the mixed waste liquid. During the distillation process, the distillation temperature is controlled at 150°C and the pressure is 10Pa. Cool and liquefy in the liquefaction cooling tank, filter and remove impurities in the filter, and the recovered solvent is introduced into the solvent recovery tank for storage. The results showed that the solvent recovery was 78%.

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PUM

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Abstract

The invention relates to the field of recovery of photoresist liquid, and specifically discloses a solvent recovering system and method, a coating machine and a photoresist coating method. The solvent recovering system comprises a distillation tank, a liquefying cooling tank and a filter; mixed waste liquid which is to be recovered and contains photoresist and a solvent is distilled through the distillation tank so as to gasify the solvent and separate from the photoresist; the gasified solvent is sequentially cooled through the liquefying cooling tank and filtered and purified through the filter. According to the solvent recovering system and method, the solvent in the photoresist containing mixed waste liquid can be effectively recovered, thus the solvent supplying cost can be reduced, and the energy conservation and environmental protection are achieved; the solvent recovering system and method have high industrial application prospect.

Description

technical field [0001] The invention relates to the field of photoresist recovery, in particular to a solvent recovery system, a coating machine including the solvent recovery system, a solvent recovery method and a method for coating photoresist. Background technique [0002] In the manufacturing process of semiconductors or liquid crystal panels, etc., it is necessary to coat a photoresist solution (obtained by diluting the photoresist with a solvent) on the substrate for exposure and development. In this process, in order to make the photoresist liquid evenly coated on the substrate, a large amount of photoresist liquid is usually coated on the substrate first, so that the photoresist liquid can be uniformly coated on the entire substrate after coating, However, the utilization rate of the photoresist in this coating method is generally about 10%, and the remaining up to 90% of the photoresist is directly discharged into the waste liquid tank during the coating process, s...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/16
Inventor 汪杰陈聪文
Owner TUNGHSU KUNSHAN DISPLAY MATERIAL CO LTD
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