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High-barrier nano-inorganic non-metallic thin film, its preparation method and vacuum winding coating equipment

A nano-inorganic, coating equipment technology, applied in vacuum evaporation coating, metal material coating process, sputtering coating and other directions, can solve the problems of sensitive expansion and deformation, uneven film, poor barrier performance, etc., to achieve excellent barrier properties performance, increased economic efficiency, and the effect of increasing production rates

Active Publication Date: 2020-06-02
GUANGDONG ZHENHUA TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the thermal evaporation reaction process is difficult to control. Due to the brittleness of the alumina barrier layer, the barrier performance of the film layer is sensitive to the expansion and contraction deformation of the substrate film, and the barrier performance of the product is at a medium level.
[0006] When the above-mentioned winding coating method is used to prepare high-barrier inorganic non-metal oxide films, there are defects such as poor barrier properties, uneven and dense films, etc.

Method used

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  • High-barrier nano-inorganic non-metallic thin film, its preparation method and vacuum winding coating equipment
  • High-barrier nano-inorganic non-metallic thin film, its preparation method and vacuum winding coating equipment
  • High-barrier nano-inorganic non-metallic thin film, its preparation method and vacuum winding coating equipment

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0041] The aluminum oxide evaporation particles were evenly added to the annular crucible of the electron gun, and the distance between adjacent electron guns during evaporation was adjusted to be 350 mm. Place the 12μm thick PET roll on the unwinding shaft of the unwinding device, and complete the film-threading preparation according to the winding film path. Close the coating vacuum chamber and prepare to evacuate.

[0042] When the vacuum degree in the coating vacuum chamber reaches 5.0×10 -3 When the Pa background is vacuum, input oxygen through the oxygen input port on the upper end of the electron gun crucible, and adjust the coating working pressure to 5.0×10 -2 Pa. Turn on the e-type electron gun to work, the electron beam current is 550mA, the voltage is -8.0kV, and the aluminum oxide evaporation particles are evaporated at a high temperature of about 2100°C. Turn on the winding transmission system, set the winding speed of the winding transmission system to 100m / m...

Embodiment 2

[0045] The silicon oxide evaporation particles were evenly added to the annular crucible of the electron gun, and the spacing between adjacent e-type electron guns was adjusted to be misplaced during evaporation, and the distance between adjacent electron guns was 350mm. Place the 12μm thick PET roll on the unwinding shaft of the unwinding device, and complete the film-threading preparation according to the winding film path. Close the vacuum chamber and prepare for vacuuming.

[0046] Vacuum up to 5.0×10 -3 When the Pa background is vacuum, input oxygen through the oxygen input port on the upper end of the electron gun crucible, and adjust the coating working pressure to 5.0×10 -2 Pa. Turn on the e-type electron gun to work, the electron beam current is 500mA, the voltage is -7.8kV, and the silicon oxide evaporation particles are evaporated at a high temperature of 1600°C. Turn on the winding transmission system, set the winding speed of the winding transmission system to ...

Embodiment 3

[0049] Such as image 3 As shown, the electron gun crucible groups to be evaporated silicon oxide and aluminum oxide particles were placed in a row, and the distance between adjacent electron guns during evaporation was adjusted to be 350mm. Place the 12μm thick PET roll on the unwinding place, and follow the winding film path to complete the film-threading preparation. Close the vacuum chamber and prepare for vacuuming.

[0050] When the vacuum degree in the coating vacuum chamber reaches 5.0×10 -3 When the Pa background is vacuum, input oxygen through the oxygen input port on the upper end of the electron gun crucible, and adjust the coating working pressure to 5.0×10 -2 Pa. Turn on the e-type electron gun to work, the electron beam current of the e-type electron gun for evaporating alumina is 550mA, and the voltage is -8.0kV, the electron beam current of the e-type electron gun for evaporating silicon oxide is 500mA, and the voltage is -7.8kV. The silicon oxide vapor-de...

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Abstract

The invention discloses a high-barrier nano inorganic nonmetal thin film, a preparation method thereof and vacuum coiling coating equipment. the preparation method comprises the steps that to-be-evaporated materials are placed in an electronic gun annular crucible of an e-shaped electronic gun set evaporation device; a flexible substrate is arranged on an uncoiling device of a coiling transmission system, and film penetrating is completed according to a coiling film moving path; the vacuum degree of a coating chamber is adjusted and controlled, a coiling transmission system and the e-shaped electronic gun set evaporation device are started, high-temperature evaporation is conducted on the to-be-evaporated materials, so that an evaporation thin film is formed on the surface of the flexible substrate, and an e-shaped electronic gun set is formed by combining at least two e-shaped electronic guns; and the power of the e-shaped electronic guns is 1-10 kW. In the evaporation process, the e-shaped electronic guns are adopted for emitting electron beams in a linear one-line or para-position staggered arrangement mode, the evaporation rate is increased, the production rate of coiling coating is increased, production cost is reduced, and what is more, the nano inorganic nonmetal oxide high-barrier thin film with excellent performance is obtained.

Description

technical field [0001] The invention relates to the technical field of vacuum coating, in particular to a high-barrier nano-inorganic non-metallic thin film, a preparation method thereof and vacuum winding coating equipment. Background technique [0002] Inorganic non-metallic oxides such as silicon oxide (SiO 2 ), alumina (Al 2 o 3 ), titanium oxide (TiO 2 ), etc., as a type of high barrier material, it has good barrier properties, especially for oxygen and water vapor. The above-mentioned inorganic non-metallic nano-barrier materials have many advantages. For example, they have a wide range of applications and can be used for refrigeration or direct heating. Moreover, these materials have good microwave permeability and can be directly used for microwave heating; inorganic non-metallic barrier materials The layer has excellent chemical resistance and can be used for the packaging of chemicals such as acids and bases; the inorganic non-metallic high-barrier film materia...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/30C23C14/08C23C14/10
CPCC23C14/081C23C14/10C23C14/30
Inventor 潘振强
Owner GUANGDONG ZHENHUA TECH CO LTD