Negative photoresist regeneration method for part of mask aligner during yellow-light process

Abstract

The invention relates to the technical field of photoelectricity, in particular to a negative photoresist regeneration method for a part of a mask aligner during the yellow-light process. According to the negative photoresist regeneration method for the part of the mask aligner during the yellow-light process, negative photoresist of the part of the mask aligner during the yellow-light process is cleaned and removed for regeneration and use by combining a conventional ketone organic solvent and an amide solvent which are low in toxicity and even almost have no toxicity, the ketone organic solvent and the amide solvent are combined according to a scientific and reasonable proportion, the dissolving capacity and the evaporation rate of a compound solvent are greatly improved, the cleaning effect is good, a cleaning liquid is low in cost, and the method is friendly to an environment; and meanwhile, the amide solvent and the ketone organic solvent both have reducibility, thus, corrosion and aging of a surface of the part can be prevented very well, the part can be prevented from being corroded and aged very well, the regeneration and usage effect of the part is ensured, and the application of the part cannot be affected. By using an immersion cleaning liquid and the regeneration method, the regeneration frequency of the negative photoresist of the part of the mark aligner during the yellow-light process can reach 100 times.

Description

technical field [0001] The invention relates to the field of optoelectronic technology, in particular to a method for regenerating the negative photoresist of parts of a yellow light process photolithography machine. Background technique [0002] Lithography technology is to transfer the pattern on the photomask to PR first, and then dissolve or retain the part of PR exposed to light by soaking in a solvent to form a photoresist pattern that is identical or complementary to the photomask; the technology used for yellow light is Lithography technology, yellow light process means that the ambient lighting source of the lithography process uses yellow light, and the accuracy of the yellow light process line is high; the lithography machine (Mask Aligner) is also known as: mask alignment exposure machine, exposure system , photolithography system, etc.; the optical cup is the core component of the photolithography machine. After the photolithography development, the defect abnor...

AI Technical Summary

Problems solved by technology

[0002] Lithography technology is to transfer the pattern on the photomask to PR first, and then dissolve or retain the part of PR exposed to light by soaking in a solvent to form a photoresist pattern that is identical or complementary to the photomask; the technology used for yellow light is Lithography technology, yellow light process means that the ambient lighting source of the lithography process uses yellow light, and the accuracy of the yellow light process line is high; the lithography machine (Mask Aligner) is also known as: mask alignment exposure machine, exposure system , photolithography system, etc.; the optical cup is the core component of the photolithography machine. After the photolithography development, the defect abnormality needs to be cleaned and removed after the photolithography development; the photoresist is divided into positive photoresist and negative photoresist In the field of photolithography technology, the positive photoresist occupies a dominant position. Most of the existing technologies use alkaline solvents to remove the negative photoresist. The cleaning agent with this alkaline solvent formula has poor cleaning effect and will cause damage to parts. Aging and corrosion; or use special cleaning equipment, high production cost

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