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Low reflection coating, glass plate, glass substrate and photoelectric conversion device

A low-reflection and coating technology, applied in coating, photovoltaic power generation, optics, etc., to achieve excellent removability and high transmittance gain

Active Publication Date: 2017-08-18
NIPPON SHEET GLASS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

There is no description about the improvement of the average transmittance of light by the coating, but the coating has a refractive index of 1.40 or less

Method used

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  • Low reflection coating, glass plate, glass substrate and photoelectric conversion device
  • Low reflection coating, glass plate, glass substrate and photoelectric conversion device
  • Low reflection coating, glass plate, glass substrate and photoelectric conversion device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0082] (Preparation of coating solution)

[0083] Silica microparticle dispersion (Quartron PL-7, approximately spherical primary particles with an average particle diameter of 125 nm, solid content concentration 23% by weight, manufactured by Fuso Chemical Industry Co., Ltd.) 56.2 parts by mass, 1-methoxy-2- 23.3 parts by mass of propanol (solvent), 1 part by mass of 1N hydrochloric acid (hydrolysis catalyst) were stirred and mixed, and 12.1 parts by mass of tetraethoxysilane (tetraethoxysilane, manufactured by Tama Chemical Industry Co., Ltd.) and methyl 7.1 parts by mass of methyltriethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd.), stirred for 8 hours while continuing to keep warm at 40° C., hydrolyzed tetraethoxysilane and methyltriethoxysilane, and obtained stock solution A. In stock solution A, the ratio of the mass of silica fine particles to the mass of the hydrolysis condensation product of the hydrolyzable silicon compound contained in the binder is 67.7:3...

Embodiment 2

[0090] (Preparation of coating solution)

[0091] 28.3 parts by mass of the silica microparticle dispersion used in Example 1, 58.6 parts by mass of 1-methoxy-2-propanol (solvent), and 1 part by mass of 1N hydrochloric acid (hydrolysis catalyst) were stirred and mixed, and further stirred while Added 12.1 parts by weight of tetraethoxysilane (tetraethoxysilane, manufactured by Tama Chemical Industry Co., Ltd.), and stirred for 8 hours while continuing to keep warm at 40°C to hydrolyze the tetraethoxysilane to obtain stock solution B. In stock solution B, convert silica particles into SiO 2 The mass of the silicon oxide contained in the adhesive is converted into SiO 2 The mass ratio is 65:35, converted to SiO 2 The solid content concentration was 10% by mass. Stock solution B does not contain hydrophobic groups.

[0092] 70.0 g of the above stock solution B, 2.0 g of propylene glycol (solvent), 26.3 g of 1-methoxy-2-propanol (solvent), 1.7 g of the aluminum chloride aqueou...

Embodiment 4

[0099] Silica microparticle dispersion (Quartron PL-7, approximately spherical primary particles with an average particle diameter of 125 nm, solid content concentration 23% by weight, manufactured by Fuso Chemical Industry Co., Ltd.) 21.7 parts by mass, 1-methoxy-2- 64.5 parts by mass of propanol (solvent) and 1 part by mass of 1N hydrochloric acid (hydrolysis catalyst) were stirred and mixed, and a partial hydrolysis condensate of tetraethoxysilane (manufactured by Colcoat Co., Ltd., trade name: ethyl silicate 40 , abbreviation: ES-40, average pentamer oligomer) 7.7 parts by mass, methyltriethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd.) 5.1 parts by mass, and stirred for 8 hours while continuing to keep warm at 40°C, Hydrolyze ES-40 and methyltriethoxysilane to obtain stock solution C.

[0100] Stock solution C70.0g, propylene glycol (solvent) 2.0g, 1-methoxy-2-propanol (solvent) 25.9g, aluminum chloride aqueous solution (as AlCl 3 The concentration was 47.6 wt%...

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Abstract

A low reflection coating is able to be applied to at least one main surface of a substrate. This low reflection coating is a porous film which is obtained by fixing solid spherical fine silica particles having an average particle diameter of 80-600 nm by means of a binder that contains a hydrophobic group, while containing silica as a main component, and which has a film thickness of 80-800 nm. In addition, this low reflection coating contains, in mass%, 35-70% of fine silica particles, 25-64% of silica contained in the binder, and 0.2-10% of the hydrophobic group in the binder. The transmittance gain achieved by applying this low reflection coating to a substrate is 1.5% or more.

Description

technical field [0001] The present invention relates to a low-reflection coating, a glass plate with the low-reflection coating, a glass substrate with the low-reflection coating, and a photoelectric conversion device with the low-reflection coating. Background technique [0002] On the surface of substrates such as glass and ceramics, a low-reflection coating is formed for the purpose of improving the function of the substrate in use, to transmit more light, or to prevent halation due to reflection. [0003] The low-reflection coating is formed on vehicle glass, shop windows, glass plates used in photoelectric conversion devices, and the like. A so-called thin-film solar cell, which is a type of photoelectric conversion device, uses a glass plate in which a base film, a transparent conductive film, a photoelectric conversion layer made of amorphous silicon, etc., and a back-side thin-film electrode are sequentially laminated, and the low-reflection coating is used in conjun...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B1/111B32B5/16B32B9/00C03C17/25C03C17/34C09D7/12C09D183/02C09D183/04G02B1/18H01L31/0392
CPCB32B5/16B32B9/00C09D183/02C09D183/04G02B1/111H01L31/0392G02B1/18C09D7/40C03C17/007C03C2217/732C03C2218/32Y02E10/50C03C17/3417C03C2217/211C03C2217/213C03C2217/241C03C2217/94C03C2218/11H01L31/02168H01L31/048
Inventor 小用瑞穗河津光宏
Owner NIPPON SHEET GLASS CO LTD
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