A method for preparing multifunctional nano protective coating by cyclic high duty cycle pulse discharge

Abstract

A method for preparing a multifunctional nano-protective coating by cyclic large-duty ratio pulse discharge belongs to the field of plasma technology. Enter the monomer vapor into the reaction chamber for chemical vapor deposition. The deposition process includes the pretreatment stage and the coating stage. The plasma discharge method in the pretreatment stage is high-power continuous discharge, and the plasma discharge method in the coating stage is pulse discharge with a large duty cycle. , cyclically repeat the pretreatment stage and the coating stage at least once. During the coating process, the cyclic introduction introduces more active sites on the surface of the substrate, increases the effective coating, and the film structure is denser. A nano-coating with a multilayer composite structure is obtained. Layer provides multi-layer protection for the product itself, microscopically shows a denser coating structure, and macroscopically shows excellent hydrophobicity, adhesion, acid and alkali resistance, mechanical properties and heat and humidity resistance.

Description

technical field [0001] The invention belongs to the technical field of plasma chemical vapor deposition, and in particular relates to a method for preparing a multifunctional nano protective coating. Background technique [0002] Corrosive environments are the most common cause of damage to electronic devices. Corrosion of solid materials in electronic devices, reduction of conductor / semiconductor insulation, and fault phenomena such as short circuit, open circuit or poor contact caused by environmental corrosion. At present, in the products of high-tech industries such as national defense and aerospace, the proportion of electronic components is increasing, and the requirements for moisture-proof, mildew-proof and corrosion resistance of electronic products are becoming more and more stringent. In the field of communication, with the continuous advancement of technology, the continuous increase of communication frequency, the heat dissipation of communication equipment, an...

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Problems solved by technology

[0012] The British P2i company has developed a polymer nano-coating based on a specific small duty cycle pulse discharge method using chemical vapor deposition technology. The small duty cycle is less than 1:1000. The preparation process of the discharge method cannot achieve effective coordination and control of the bond length, bond energy, molecular weight of the material and energy provided by different groups in the chemical raw materials, and the scratch resistance and durability of the prepared coating are not ideal.

It is also due to the performance limitation of the coating that the current coating can only form a lyophobic nano-coating on electronic and electrical equipment, and the corrosion resistance to the environment cannot be effectively solved.

Moreover, the dense protective coating prepared based on a specific small duty cycle pulse discharge method has a fatal disadvantage: from a microscopic point of view, the small power density in the coating process is not conducive to the formation of a dense structure, and even cannot form a stable film. Structure; from a macro point of view, a small power density is not conducive to the large rate growth of the coating, and the efficiency is low in actual production, which limits its application

[0013] In the existing plasma chemical vapor deposition coating preparation process, the substrate is fixed, and the movement state of the substrate has no correlation with the discharge energy of the plasma; the static substrate in the chamber is treated by the continuous discharge method, The activated chain scission in the monomer is generally combined into a film through simple stacking under the action of continuous discharge, and the resulting coating generally has a loose structure, or even a high degree of powderization, which is not conducive to the formation of a microscopic dense structure of the coating. Therefore, the coating's Waterproof, moisture-proof, corrosion-resistant, solvent-resistant and other protective properties are poor

[0014] Due to the regional differences in plasma density and chemical raw material density in the reaction chamber, the static substrate will also lead to slow coating deposition in some areas, low production efficiency, and there are also large differences in uniformity and compactness.

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