Internal heating type integrated evaporation basket with aluminum oxide vesicular structure buffer layer

A technology of porous structure and buffer layer, applied in vacuum evaporation plating, coating, metal material coating process, etc., can solve the problems of high energy consumption, low thermal efficiency, easy breakage of equipment, etc., achieve low porosity and prolong service life Lifetime, effect of increasing strain tolerance

Inactive Publication Date: 2017-10-13
FUZHOU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The present invention aims at the problems existing in the above-mentioned prior art and the problems that the metal evaporation source is alloyed with high-temperature molten metal and is easy to break, the heating wire / ceramic crucible type evaporation source has low thermal efficiency and high energy consumption of the equipment, and provides a A Vacuum Thermal Evaporation Coated Aluminum Oxide Coated Tungsten Evaporation Basket

Method used

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  • Internal heating type integrated evaporation basket with aluminum oxide vesicular structure buffer layer
  • Internal heating type integrated evaporation basket with aluminum oxide vesicular structure buffer layer
  • Internal heating type integrated evaporation basket with aluminum oxide vesicular structure buffer layer

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] Mix 50g of alumina submicron powder, 15ml of ethanol and 10ml of acetone, add 1g of triethanolamine as a dispersant, 0.15g of carboxymethyl cellulose as a rheological agent and pore-forming agent, and 1g of PVB as a binder, and put them in a planetary ball mill Ball mill for 2 hours and mix evenly to form a ceramic slurry with a pH value of 10. The tungsten basket soaked in 15wt% sodium hydroxide solution ( figure 2 ) into the slurry, spin-coated and dipped until the coating thickness is 350 μm and evenly covered. After natural drying, it is sintered in an aerobic atmosphere in a high-temperature box furnace. The sintering temperature is 25-500 ° C, and the heating rate is 2 ° C / min , and kept at 500°C for 2 hours; then the green body was sintered in a vacuum tube furnace, the temperature was 25°C~1650°C and the temperature was raised slowly, the heating rate was 2°C / min below 1400°C, and the heating rate was 0.8 at the stage of 1400~1650°C ℃ / min, 1650 ℃ for 30 minu...

Embodiment 2

[0038] Mix 50g of alumina powder with a particle size of 35~45μm, 15ml of ethanol and 15ml of acetone, add 0.5g of triethanolamine as a dispersant, 0.15g of carboxymethyl cellulose as a rheological agent and pore-forming agent, and 1g of nitrocellulose as a binder , and evenly mixed in a planetary ball mill for 2 hours to form a ceramic slurry with a pH value of 11. The tungsten basket ( figure 2 ) into the slurry, spin-coated and dipped until the coating thickness is 150 μm and covered evenly. After natural drying, it is sintered in an aerobic atmosphere in a high-temperature box furnace. The sintering temperature is 25-500 ° C, and the heating rate is 2 ° C / min , and kept at 500°C for 2 hours; then the green body was sintered in a tube furnace in vacuum, the temperature was slowly raised from 25°C to 1650°C, the heating rate was 1°C / min below 1400°C, and the heating rate was 0.9 at the stage of 1400°C to 1650°C ℃ / min, 1650 ℃ for 60 minutes, and the cooling process is con...

Embodiment 3

[0041] Add 110g of alumina powder with a particle size of 1.5~5μm, 60ml of ethanol and 40ml of acetone mixed solvent, add 1.5g of triethanolamine as a dispersant, 1g of carboxymethyl cellulose as a rheological agent and pore-forming agent, and 3g of nitrocellulose as a binder, Mix evenly in a planetary ball mill for 2 hours to form a ceramic slurry with a pH value of 10. The tungsten basket soaked in the high-concentration silica sol solution ( figure 2 ) into the slurry, spin-coated and dipped until the coating thickness is 500 μm and covered evenly. After natural drying, it is sintered in an aerobic atmosphere in a high-temperature box furnace. The sintering temperature is 25-500 ° C, and the heating rate is 2 ° C / min , and kept at 500°C for 2 hours; then put the green body in a vacuum tube furnace for sintering, the temperature is 25°C~1650°C and the temperature is raised slowly, the heating rate is 2°C / min below 1400°C, and the heating rate is 1 at the stage of 1400~165...

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Abstract

The invention discloses an internal heating type integrated evaporation basket with an aluminum oxide vesicular structure buffer layer. Two layers of coatings are totally arranged on the surface of the evaporation basket, the inner layer is a Al2O3 buffer layer of a loose vesicular structure, the outer layer is a compact and low-porosity corrosion resistance Al2O3 coating, and a spinning impregnation technology is adopted for preparing a Al2O3 buffer layer with the thickness ranging from 0.15 mm to 0.5 mm on the surface of a base; and then a plasma spraying technology is adopted for preparing a Al2O3 corrosion resistance layer with the thickness ranging from 0.5 mm to 1 mm on the evaporation basket on the buffer layer in a spraying manner. According to the internal heating type integrated evaporation basket, a composite process is adopted for preparing the Al2O3 coating evaporation basket of different microstructures, the buffer layer of the vesicular structure can achieve the stress releasing effect on service, and the problem of base oxidation caused by follow-up spraying can be prevented; and the compact and low-porosity Al2O3 coating layer has the excellent corrosion resistance, and the internal heating type integrated evaporation basket can be permanently and widely applied to the technical field of metal thin film vacuum evaporation.

Description

technical field [0001] The invention belongs to the technical field of vacuum coating, and in particular relates to an internal heating type integrated evaporation basket with a buffer layer of an alumina porous structure. Background technique [0002] The resistance heating evaporation source is widely used in various fields due to its simple structure, convenient installation, and low price. However, it also has a disadvantage that the range of evaporation materials is limited. As a device containing low melting point metal film materials (such as Al, Ag, Fe, Ti, Ni, etc.), it has high temperature resistance, metal melt corrosion resistance and thermal shock resistance, and conducts heat under high vacuum conditions. It is the most vulnerable core component in various vacuum thermal evaporation coating equipment, and it is also the key to affect the performance quality, production efficiency and manufacturing cost of metal thin films. The resistance heating evaporation so...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/26C23C4/134C23C4/11B05D1/18B05D3/02B05D3/04B05D5/00
CPCB05D1/18B05D3/0254B05D3/0406B05D5/00C23C4/11C23C4/134C23C14/243C23C14/26
Inventor 李强郑钦龙陈精杰乔星
Owner FUZHOU UNIV
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