Preparation method of evaporation material with low refractive index

Abstract

The invention discloses a preparation method of an evaporation material with low refractive index. The preparation method comprises the steps of material preparation, material mixing, slurry drying, press forming, sintered body preparation and cleaning and packaging. The preparation method is reasonable in design and convenient to operate, materials are subjected to wet ball-milling in a planet ball mill with water as a mixing medium, shorter ball-milling time is taken, and slurry with uniform and consistent components is obtained. The evaporation material prepared with the preparation method has the advantages as follows: splashing caused by light weight of the electronic gun bombardment evaporation material can be avoided; the density is large, the gas release amount in the coating process is reduced, and thus, the membrane layer quality is improved; the surface is a diffusion reflection plane, the evaporation angels are consistent, the evaporation rate is uniform and stable, and an electronic gun can be focused easily; the surface of the evaporation material is subjected to ultra-cleaning treatment and is clean, dust cannot fall off easily, and sputtering points can be avoided during coating.

Description

technical field [0001] The invention relates to the field of preparation of electrodeless functional materials, in particular to a method for preparing a low-refractive-index evaporation material suitable for coating an optical film on the surface of an evaporation-deposited plastic lens. Background technique [0002] Silicon dioxide is the most basic evaporation material widely used in the field of optical coating. The silicon dioxide film has good adhesion to the glass substrate, and the film layer is not easy to crack. However, the glass base material requires mechanical processing, and the processing cost is high. With the rapid development of plastic technology in recent years, plastic substrates have approached glass substrates in terms of transmittance and other properties. Compared with the glass substrate, the plastic substrate can be formed in one time according to the required shape, and the processing is simple and the cost is low. At present, coated plastic le...

AI Technical Summary

Problems solved by technology

At present, the silicon oxide and aluminum oxide evaporation materials used in the market are all granular materials. This material is directly sublimated from a solid state to a gaseous state during the evaporation process, so there is no pre-melting process. This feature causes the following problems in the use of granular materials : Light density, large amount of outgassing, easy to fly when the electron gun is evaporating; the spot of the electron gun hitting the corners of the particles and the surface of the particles will cause differences in the evaporation rate, resulting in instability of the evaporation rate; the spot hitting different positions will cause the evaporation angle to vary. Different, directly affect the quality of the film; the particle surface treatment is not clean, it is easy to cause splash points; the electron gun hits the surface of the particle, and after the surface evaporates, it will form a silicon oxide glass state, and the glass will emit spot energy, making it difficult to focus