Diamond-like film
A technology of diamond film and diamond layer, which is applied in the direction of metal material coating process, superposition layer plating, vacuum evaporation plating, etc., can solve the problems of low friction coefficient, poor bonding force between DLC film layers, and unsightly appearance. Achieve low friction coefficient and ensure high hardness
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Embodiment 1
[0029] The present embodiment is a kind of diamond-like carbon (DLC) thin film, and its structure is as follows figure 1 shown, including:
[0030] Substrate 1;
[0031] The metal primer layer 2 deposited on the substrate has a thickness of 0.4 μm;
[0032] The metal carbide transition layer 3 deposited on the metal primer layer 2, the C content in the metal carbide transition layer 3 is gradually increased from 2% to 50%, and gradually changes from the metal primer layer 2 to the first DLC layer 4. Incremental; the total thickness of the metal carbide transition layer 3 is 1 μm; during the preparation of the metal carbide transition layer 3, C 2 h 2 、CH 4 The carbon source gas is supplied in a gradually increasing manner; specifically, the metal carbide transition layer 3 can be formed by one unit transition layer or by more than two stacked unit transition layers;
[0033] The first DLC layer 4 deposited on the metal carbide transition layer 3, the first DLC layer 4 is ...
Embodiment 2
[0045] A kind of diamond-like carbon (DLC) thin film of the present embodiment comprises:
[0046] Substrate;
[0047] The metal primer layer deposited on the substrate is deposited by magnetron sputtering with a Ti target, and a bias voltage of -50 to -200V is applied to the substrate during the deposition process, with a thickness of 0.3μm;
[0048] The metal carbide transition layer deposited on the metal primer layer, the C content in the metal carbide transition layer gradually increases from 2% to 50%, and gradually increases from the metal primer layer to the first DLC layer; its use Cr target + W target for reactive magnetron sputtering deposition, C 2 h 2 、CH 4 The carbon source gas is supplied in a gradually increasing manner, and a bias voltage of -50 to -400V is applied to the substrate, and the thickness of the metal carbide transition layer is 1.2 μm;
[0049] a first DLC layer deposited on the metal carbide transition layer, having a refractive index of 2.3 ...
Embodiment 3
[0053] A kind of diamond-like carbon (DLC) thin film of the present embodiment comprises:
[0054] Substrate;
[0055] The metal primer layer deposited on the substrate is deposited by magnetron sputtering with a Ti target, and a bias voltage of -50 to -200V is applied to the substrate during the deposition process, with a thickness of 2 μm;
[0056] The metal carbide transition layer deposited on the metal primer layer, the C content in the metal carbide transition layer is 2% to 50% and gradually increases, and gradually increases from the metal primer layer to the first DLC layer; its Reactive magnetron sputtering deposition with Cr target + W target, C 2 h 2 、CH 4 The carbon source gas is supplied in a gradually increasing manner, and a bias voltage of -50 to -400V is applied to the substrate, and the thickness of the metal carbide transition layer is 0.1 μm;
[0057] a first DLC layer deposited on the metal carbide transition layer, having a refractive index of 1.9 an...
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Abstract
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