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Micro-nano hollow diamond drill bit and manufacturing method thereof

The technology of a diamond drill bit and its manufacturing method is applied in the directions of repairing drills, manufacturing tools, drilling tool accessories, etc., which can solve the problems of no micro-nano hollow diamond bit processing method, no micro-nano hollow diamond bit, etc., and achieve low equipment cost and good quality. The effect that the processing and process are simple

Active Publication Date: 2019-07-26
DONGGUAN HUICHENG VACUUM TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] After investigation, there is no micro-nano hollow diamond bit in the current micro-nano processing, and there is no micro-nano hollow diamond bit processing method

Method used

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  • Micro-nano hollow diamond drill bit and manufacturing method thereof
  • Micro-nano hollow diamond drill bit and manufacturing method thereof
  • Micro-nano hollow diamond drill bit and manufacturing method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0055] Choose high-purity silicon with a thickness of 1cm as the raw material, and process it with a precision CNC machining center figure 2 As shown in the micro drill bit, the working area 1a of the drill bit has a length of 5 mm, a diameter of 50 microns, and a cube 4 with a side length of 4 mm at the root.

[0056] Suspend the silicon micro-drill into the nano-diamond powder emulsion with a particle size of 100nm, grind it ultrasonically for 15 minutes, spray it with alcohol and set it aside.

[0057] Put the silicon micro-drill cleaned by ultrasonic grinding into the chamber of the microwave plasma CVD diamond deposition system, pay attention to the vertical placement of the silicon micro-drill, and the root 4a is grounded and supported.

[0058] The working pressure is 10kPa, the working gas and its ratio are H2 / CH4=100 / 3, the microwave power is 2kW, and the deposition time is 10 hours. The analysis shows that the thickness of the obtained diamond film is 3 microns.

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Abstract

The invention discloses a micro-nano hollow diamond drill bit and a manufacturing method thereof. The micro-nano hollow diamond drill bit is in the shape of a thin-walled circular tube, the outer surface is provided with thread grooves, the rear end is fixed with a connecting head connected with an external device, and the front end is a blade with serrated teeth. department. The production method is as follows: Step 1, processing the substrate material that can be used as a CVD diamond substrate into a drill blank; Step 2, using nano-diamond powder or nano-diamond emulsion to grind the drill blank; Step 3, using chemical Vapor deposition technology processes the drill blank so that the diamond film is evenly deposited on the surface of the drill blank; step 4, the edge of the drill blank with the diamond film deposited on the surface is processed, and the substrate material of the blade is exposed ; Step 5, corroding the substrate material on the drill bit blank tire with the corrosive liquid that can corrode the substrate material, and finally obtain the micro-nano hollow diamond drill bit. The present invention provides tools for micro-nano machining.

Description

technical field [0001] The invention relates to a micro-nano hollow diamond drill bit of micro-nano scale. The invention also relates to a manufacturing method of the drill bit. Background technique [0002] Micro-nano devices and micro-nano processing are booming advanced manufacturing products and methods in the field of advanced manufacturing. Nano-chips manufactured by micro-nano technology have profoundly changed the way of life of human beings. Micro-motors, micro-machine tools, micro-drones, The application of ultra-light materials with micro-nano structures is increasingly entering the lives of ordinary people. [0003] Photolithography, 3D printing, ion beam or electron beam etching are currently the most important methods for processing micro-nano structures. However, currently used technologies such as lithography, ion beam etching, and 3D printing have extremely high equipment costs, high process difficulty, and low processing efficiency and speed, which cannot...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B23B51/04C23C16/27C23C16/01
CPCC23C16/01C23C16/27B23B2251/408B23B51/04
Inventor 罗志明李志荣杨武保
Owner DONGGUAN HUICHENG VACUUM TECH