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Core shell structure n - titanium dioxide @ p - cobalt titanate nanocrystalline thin film and preparing method thereof

A technology of titanium dioxide and core-shell structure is applied in the field of core-shell structure n-titanium dioxide@p-cobalt titanate nanocrystalline thin film and its preparation, and achieves the effects of improving sensitivity, increasing the tendency of carrier migration and short response recovery time

Active Publication Date: 2017-11-03
SHAANXI UNIV OF SCI & TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[Hashemian S, Foroghimoqhadam A. Effect of copper doping on CoTiO 3 ilmenite type nanoparticles for removal of congo red from aqueous solution[J].Chemical Engineering Journal,2014,235:299-306.] found that CoTiO 3 The film responds quickly to the ambient humidity [Jing Lu, Yabin Zhang, Zhuan Li, Jianfeng Huang, Yong Wang, Jianpeng Wu, Haiyan He. Rapid response and recovery humidity sensor based on CoTiO 3 thin filmprepared by RF magnetron co-sputtering with post annealing process[J].Ceramics International,2015,41(10):15176–15184], but there is still a certain gap between its sensitive characteristic indicators and the requirements of practical applications

Method used

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  • Core shell structure n - titanium dioxide @ p - cobalt titanate nanocrystalline thin film and preparing method thereof
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  • Core shell structure n - titanium dioxide @ p - cobalt titanate nanocrystalline thin film and preparing method thereof

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preparation example Construction

[0026] The preparation method of the present invention comprises the following steps:

[0027] (1) Install the cleaned substrate on the sample stage of the magnetron sputtering instrument, CoTiO 3 Target and TiO 2 The targets are respectively installed on two different RF target positions of the magnetron sputtering apparatus.

[0028] (2) Regulation of CoTiO 3 The angle between the normal direction of target sputtering and the substrate normal is 0°~90°, and then adjust the CoTiO 3 The distance between the target and the substrate is between 1cm and 7cm.

[0029] (3) Vacuumize to make the vacuum degree of the sputtering coating chamber reach 1.0×10 -4 Pa~9.9×10 -4 Pa, and then inject Ar gas, so that the working pressure of Ar gas in the sputtering coating chamber is 0.1Pa ~ 2Pa, CoTiO 3 The pre-sputtering of the target takes 5-15 minutes, preferably 10 minutes, and the target power is 100W-400W.

[0030] (4) Set the substrate heating program, the temperature rise rate ...

Embodiment 1

[0035] (1) Install the cleaned substrate on the sample stage, CoTiO 3 Target and TiO 2 The targets are respectively installed on two different RF target positions of the magnetron sputtering apparatus.

[0036] (2) Regulation of CoTiO 3 The angle between the normal direction of target sputtering and the substrate normal is 80°, and the CoTiO 3 The distance between target and substrate is 5cm.

[0037] (3) Vacuumize to make the vacuum degree of the sputtering coating chamber reach 1.0×10 -4 Pa, the working pressure of Ar gas in the sputtering coating chamber is 0.2Pa, CoTiO 3 The target is pre-sputtered for 10 minutes, and the target power supply is 400W.

[0038] (4) Set the substrate heating program, the heating rate is 10°C / min, the temperature is raised to 400°C and kept warm. Then CoTiO 3 The target starts sputtering, the target power is 400W, the sputtering time is 90min, and CoTiO 3 Ordered nanocrystalline films after switching off CoTiO 3 target power.

[0039...

Embodiment 2

[0044] (1) Install the cleaned substrate on the sample stage, CoTiO 3 Target and TiO 2 The targets are respectively installed on two different RF target positions of the magnetron sputtering apparatus.

[0045] (2) Regulation of CoTiO 3 The angle between the normal direction of target sputtering and the substrate normal is 50°, and the CoTiO 3 The distance between the target and the substrate is 1 cm.

[0046] (3) Vacuumize to make the vacuum degree of the sputtering coating chamber reach 1.0×10 -4 Pa, the working pressure of Ar gas in the sputtering coating chamber is 0.5Pa, CoTiO 3 The target is pre-sputtered for 10 minutes, and the target power supply is 300W.

[0047] (4) Set the substrate heating program, the heating rate is 20°C / min, the temperature is raised to 400°C and kept warm. Then CoTiO 3 The target starts sputtering, the target power is 300W, the sputtering time is 90min, and CoTiO 3 Ordered nanocrystalline films after switching off CoTiO 3 target power....

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Abstract

The invention relates to a core shell structure n - titanium dioxide @ p - cobalt titanate nanocrystalline thin film and a preparing method thereof. A clean substrate is installed on a sample stage of a magnetron sputtering device firstly, and a CoTiO3 target and a TiO2 target are installed at two radio frequency target positions of the magnetron sputtering device correspondingly; a sputtering film coating chamber of the magnet control sputtering device is vacuumized and injected with inactive gas, and gas pressure of the sputtering film coating chamber is kept at 0.1Pa - 2Pa; the CoTiO3 target is pre-sputtered for 5min - 15min; the substrate is heated up to 300 DEG C - 600 DEG C and is subjected to heat preservation, sputtering of the CoTiO3 target is started for 30min - 90min, and a CoTiO3 orderly nanocrystalline thin film is obtained; and the CoTiO3 orderly nanocrystalline thin film is adjusted to be parallel with the TiO2 target, the TiO2 target is sputtered for 10s - 120s, and the core shell structure n - titanium dioxide @ p - cobalt titanate nanocrystalline thin film is obtained. According to the core shell structure n - titanium dioxide @ p - cobalt titanate nanocrystalline thin film and the preparing method thereof, appearance of the thin film can be adjusted effectively, the film-forming property is good, operation is convenient, the producing period is short, efficiency is high, and the core shell structure n - titanium dioxide @ p - cobalt titanate nanocrystalline thin film and the preparing method thereof are suitable for industrial production.

Description

technical field [0001] The invention relates to the field of nanocrystalline thin films, in particular to a core-shell structure n-titanium dioxide@p-cobalt titanate nanocrystalline thin film and a preparation method thereof. Background technique [0002] Ferro-titanium CoTiO 3 is a kind from Al 2 o 3 Oxygen compounds of corundum structure. [Hashemian S, Foroghimoqhadam A. Effect of copper doping on CoTiO 3 ilmenite type nanoparticles for removal of congo red from aqueous solution[J].Chemical Engineering Journal,2014,235:299-306.] found that CoTiO 3 The film responds quickly to the ambient humidity [Jing Lu, Yabin Zhang, Zhuan Li, Jianfeng Huang, Yong Wang, Jianpeng Wu, Haiyan He. Rapid response and recovery humidity sensor based on CoTiO 3 thin filmprepared by RF magnetron co-sputtering with post annealing process[J].Ceramics International,2015,41(10):15176–15184], but there is still a certain gap between its sensitive characteristic indicators and the requirements of ...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/08
CPCC23C14/08C23C14/352
Inventor 卢靖史欢梁阔燚姚恺徐培光权潇白杨杨陶赟
Owner SHAANXI UNIV OF SCI & TECH