148 results about "Post annealing" patented technology

The invention relates to the technical field of aluminum foil processing, in particular to a method for producing high-stability 3102 alloy air-conditioning foil in a short process, which comprises the following steps of: smelting, continuously casting and continuously rolling an aluminum alloy raw material to obtain a strip, directly trimming the strip, rolling the strip on a cold rolling unit, preparing a cold-rolled coil with the thickness of 0.15-0.2 mm after three-pass rolling, rolling the cold-rolled coil by an aluminum foil rolling mill, and rolling the cold-rolled coil by an aluminum foil rolling mill to obtain the high-stability 3102 alloy air-conditioning foil. The tensile strength of the aluminum foil finished product is 135-139 Mpa, the ductility is larger than or equal to 19%, and the cupping is larger than or equal to 5.9 mm. The aluminum foil finished product is suitable in tensile strength, small in fluctuation range, higher in ductility and cupping value, capable of better meeting the use requirements of air conditioner foil, capable of guaranteeing the product quality and meanwhile capable of improving the product quality. According to the method, the production process is greatly shortened, the production cost is reduced, and the production efficiency is improved.

The invention discloses a sulfide solid electrolyte stable in wet air, a preparation method thereof and a battery, and belongs to the technical field of all-solid-state batteries, the sulfide solid electrolyte comprises the following raw materials in parts by weight: 20-100 parts of sulfide solid electrolyte and 1 part of metal halide component, the chemical formula of the sulfide solid electrolyte is Li < 6-x > PS < 5-x > Cl < 1 + x >, 0 < = x < = 0.6, the metal halide component comprises at least one metal halide, the chemical formula of the metal halide is MXn, n is greater than or equal to 2 and less than or equal to 4, M is one of Zr, Al, Zn, Sn, Sb and Bi, and X is one of F, Cl, Br and I. The metal halide and the sulfide solid electrolyte in a specific ratio are mixed, subjected to ball milling and then subjected to annealing treatment, and an in-situ doping coating layer is obtained on the surface of the sulfide solid electrolyte; and under the condition that the ionic conductivity of the sulfide solid electrolyte is slightly influenced, the wet air stability of the sulfide solid electrolyte is effectively improved.

The invention discloses a double-metal gradient diffusion layer modified high-nickel ternary positive electrode material and a preparation method thereof. The preparation method comprises the following steps: filtering and uniformly dispersing high-nickel ternary positive electrode material powder; introducing inert gas into the atomic layer deposition system, and raising the temperature to a target temperature; respectively preheating the metal precursors A and B to proper temperatures; the preparation method comprises the following steps: sequentially introducing a metal precursor A, precursor water, a metal precursor B and precursor water into a reaction chamber, alternately depositing according to a pulse-reaction-purging sequence, and repeatedly circulating the process to obtain the bimetallic oxide coated high-nickel ternary positive electrode material, and post-annealing treatment. According to the bimetal gradient diffusion layer modified high-nickel ternary positive electrode material prepared by the preparation method disclosed by the invention, the lithium storage performance of the high-nickel ternary material is greatly improved, excellent cycling stability and rate capability are obtained, the coating layer is accurate and controllable, the preparation process is simple, meanwhile, large-batch production can be realized, and relatively high application value is achieved.

The invention discloses a CO2 laser and ultrafast laser hybrid welding system and method and a welded quartz glass optical element. The method comprises the steps that S1, at least two to-be-welded materials are clamped so that to-be-welded interfaces can make close contact; s2, ultrafast laser is adopted to conduct instantaneous heating and melting on the local area of the interface to be welded in the action area of the low-flux CO2 laser, and meanwhile auxiliary heat is provided by the low-flux CO2 laser; s3, after ultrafast laser local welding is completed, low-flux CO2 laser is adopted for continuing heating in the action area; s4, the position of the to-be-welded material is adjusted, and the to-be-welded interface which is not welded enters the action area; the steps S2-S3 are repeated until all the to-be-welded interfaces are welded and annealed; and S5, the welding area is naturally cooled, and composite welding is completed. By applying double laser, the temperature gradient is remarkably reduced, and thermal deformation is reduced; and CO2 laser post-welding annealing is carried out, so that the interface stress is effectively eliminated.

The invention discloses a composite fluorine removal agent and a preparation method thereof, and belongs to the technical field of water treatment. The preparation method of the composite fluorine removal agent comprises the following steps: dipping biomass charcoal in a lanthanum-containing solution, and calcining to obtain a La2O3 / charcoal carrier; the La2O3 / carbon carrier, nano-hydroxyapatite, MgO and magnetic Fe3O4 particles are mixed and then subjected to heat treatment, and a composite material is obtained; mixing the composite material, tetraethoxysilane and a solvent, dropwise adding ammonia water into the mixture for catalytic hydrolysis, and then annealing to obtain a SiO2-coated composite material; and mixing and granulating the SiO2 coated composite material and a binder, and then activating to obtain the composite fluorine removal agent. The method realizes the preparation of the composite fluorine removal agent which is wide in pH application range, can be recycled and can be suitable for efficient treatment of low-concentration fluorine wastewater.

The present invention relates to a preparation process of a high-density tungsten-copper alloy. The preparation process comprises: mixing oxide powder of copper having a certain proportion with oxide powder of tungsten in a dual-power mixer, performing crushing and activation treatment on the mixed powder in a high-speed crusher, and then reducing in a hydrogen atmosphere to obtain the nano tungsten-copper composite powder; and carrying out sheathing, degassing, and hot isostatic pressing treatment on the nano tungsten-copper composite powder, carrying out thermoplastic processing, and then carrying out annealing treatment to obtain the high-density tungsten-copper alloy. The process of the present invention is simple and controllable, has high operability, and is easy to industrialize; the phenomena of component segregation caused by preparation of the tungsten-copper alloy by an infiltration method, and uneven crystal grain size caused by particle aggregation and growth are avoided; and the proportion of the two-phase components can be accurately regulated, so that the tungsten-copper alloy with a tungsten content of 5%-95% can be prepared. The density (relative density) of the prepared tungsten-copper alloy reaches 99.6% or above; the oxygen content is lower than 40 ppm; the alloy has a uniform structure; the crystal grains are fine; and the present invention has wide application prospects and popularization value.

The invention provides a large-size CVD (chemical vapor deposition) polycrystalline diamond film surface grinding method, belongs to the technical field of diamond material processing, and aims to solve the technical problems of low CVD polycrystalline diamond chemical mechanical grinding and polishing efficiency and high consumption. The preparation method comprises the following steps: firstly, carrying out graphical processing on the surface of a CVD polycrystalline diamond film by adopting a laser processing method, then plating diamond micro-powder with a nano-thickness catalyst layer, then mixing the diamond micro-powder with the catalyst layer and an oxidizing agent to obtain a grinding liquid, then grinding the polycrystalline diamond film, and finally carrying out annealing treatment to obtain the polycrystalline diamond film with the nano-thickness catalyst layer. And further obtaining the polycrystalline diamond film with low internal stress and nanoscale roughness on the surface. According to the method, the processing efficiency of the polycrystalline diamond film can be improved to a great extent and the surface roughness can be reduced through the surface patterning of the CVD polycrystalline diamond film, the plating of the diamond micro-powder catalyst layer and the grinding fluid preparation coupled grinding processing effect.

The invention discloses a method for preparing an oxide transistor based on a secondary post-annealing process and application thereof, and belongs to the field of integrated circuit micro-nano electronic devices. According to the method, after the structure of the oxide transistor is prepared, the oxide transistor is treated in a pre-annealing mode, and then secondary annealing treatment is carried out on the oxide transistor. The thermal stability of the oxide transistor can be improved based on the secondary post-annealing process, the carrier concentration of an active film of the oxide transistor prepared by the method is stable, the field effect mobility of the oxide transistor exceeds 60 cm < 2 > / volt.s, and the comprehensive characteristics of the device reach the international first-class level. And the application of the oxide phase inverter can be realized, and the method has wide development prospect and practical application potential. The method has the advantages of simple steps, convenience in operation and low cost.

Provided is a non-oriented electrical steel sheet that is excellent in iron loss and magnetic anisotropy under high magnetic flux and high frequency conditions, and a method for manufacturing the same. [Solution] A method for producing a grain-oriented electrical steel sheet includes the steps of heating a slab containing, by weight, 1.5 to 6.5% Si, 0.0005 to 3.5% Al, 0.01 to 3.0% Mn, 0.005 to 5.0% Cr, 0.0005 to 0.03% S, the balance being Fe and other unavoidable impurities, at 1050 to 1220°C, finish hot rolling the slab to obtain a hot-rolled sheet, hot-rolling the hot-rolled sheet at 850 to 1150°C for 30 to 300 seconds, cold-rolling the hot-rolled sheet that has been annealed to obtain a cold-rolled sheet, heating the cold-rolled sheet, and rolling the heated cold-rolled sheet. and final annealing at 600 to 1150°C for 10 to 300 seconds, wherein the cold rolling satisfies the following [Relationship 2], wherein the heating rate in the temperature range of 300 to 500°C during heating is 5 to 150°C / s, and the gas atmosphere in the temperature range of 500 to 750°C during the final annealing is composed of, by volume, 15 to 99.99% hydrogen, 0.0001 to 0.0030% oxygen, and the balance being an inert gas, and the oxygen content in the gas atmosphere in the temperature range of 800 to 1100°C during the final annealing is 1 to 1.5 times that in the temperature range of 500 to 750°C. [Relationship 2] Maximum temperature of cold-rolled sheet surface during cold rolling < 200 × cold rolling reduction / 100 + 40

This invention relates to the fields of semiconductor information storage and artificial synaptic devices, specifically to a biological synaptic intrinsically self-assembled topological phase-change memristor and its fabrication method. The fabrication method includes: providing a substrate; depositing a bottom electrode; and depositing SrFeO on the bottom electrode. x The thin film serves as the storage medium layer; the storage medium layer undergoes heat treatment, including in-situ annealing and post-annealing. By controlling the oxygen pressure difference between in-situ and post-annealing, the single-component SrFeO is made more efficient. x An intrinsically self-assembled superlattice structure, characterized by alternating vertical and horizontal orientation regions of oxygen vacancy channels, spontaneously forms within the thin film. This structure restricts the formation sites of conductive filaments, significantly improving the consistency and stability of the device's resistive switching cycle. The process of this invention is simple, requiring no introduction of a second-phase material. The resulting memristor requires no electrical formation, exhibits a high on / off ratio, multi-level storage, and short-term synaptic plasticity, making it applicable to neuromorphic computing chips and artificial intelligence devices.

The invention belongs to the technical field of copper alloys, and particularly relates to a brass alloy material and a preparation method and application thereof. The performance bottleneck of the brass alloy material is broken through through multi-scale optimization by utilizing component design-phase state regulation and control-process cooperation, so that the cutting machinability, corrosion resistance and mechanical properties of the brass alloy material are synergistically improved. A two-step heat treatment method is adopted, quenching is conducted through solid solution, annealing is conducted after quenching, staged heat treatment is conducted, a high beta phase is reserved in the solid solution stage, the beta phase is partially decomposed through annealing, the beta phase proportion is reduced, the alpha phase is increased, an alpha + beta double-phase structure is obtained, the beta phase proportion is dynamically reduced from 60%-80% to 20%-30%, the beta phase proportion is dynamically adjusted and controlled, and the mechanical property of the alloy is improved. The brass alloy material has the advantages of good processability and corrosion resistance, improvement of the chip breaking property, maintenance of the corrosion resistance of a copper matrix, improvement of the hardness and strength of the brass alloy material, improvement of the cutting chip breaking capability and avoidance of brittleness increase.

The invention relates to the technical field of metal material surface chemical heat treatment, in particular to W-containing ultrahigh-strength steel, a preparation method thereof and a surface carbon-nitrogen composite strengthening process. The preparation method comprises the following steps of smelting preparation of steel, forging cogging forming, annealing heat treatment after forging of a bar, carburization, subzero treatment and surface pressurization nitriding. The ultrahigh strength steel comprises the following chemical components: 0.27-0.34 wt.% of C; 0.4 to 1.4 wt.% of Cr; 9 to 10 wt.% of Ni; 6 to 8 wt.% of Co; 1.5 to 2.5 wt.% of Mo; 1.1 to 1.6 wt.% of W; and the balance of Fe and impurity elements. The highest hardness of the carbonitriding layer of the W-containing ultrahigh-strength steel is not lower than 900 HV, the tensile strength of the steel is not lower than 2000 MPa, the yield strength is not lower than 1700 MPa, the impact absorption capacity is not lower than 60 J, and the service condition requirements of gears for aero-engines are met.

The invention discloses a P-type thin film transistor and a preparation method thereof, and belongs to the field of integrated circuit micro-nano electronic devices. According to the invention, a germanium / aluminum film periodic alternating laminated structure is used as an active layer, and crystallization is promoted through a post-annealing process, so that the characteristics of the P-type transistor are realized. The prepared thin film transistor is excellent in performance, has practical application potential, is simple in process flow and low in cost, can be compatible with an existing oxide transistor platform, is expected to realize a thin film transistor CMOS circuit cooperatively integrated with an oxide device, and is of great significance to sustainable development and industrial upgrading in the field of integrated circuits.

The invention discloses a high-strength and high-elongation lining spring wire and a processing method thereof, and the processing method comprises the following steps: carrying out one-time continuous cold rolling on an SUS304 stainless steel raw wire, annealing, and cooling to obtain the high-strength and high-elongation lining spring wire. According to the method, the SUS304 stainless steel raw wire is subjected to annealing treatment after being subjected to one-time continuous cold rolling, original rolling state delivery of the lining spring wire is overturned, the tensile strength and the ductility are improved through optimization and innovation of process design and delivery in a state after heat treatment, and the method is suitable for production and machining of large-specification high-elasticity lining springs; cost waste caused by repeated rolling and solid solution is avoided, and the machining cost is saved.

This invention relates to the field of new energy vehicle power battery manufacturing technology, specifically a fully automated laser welding and packaging process for lithium iron phosphate battery cells used in new energy vehicles. The process includes: S1. The cell shell is made of 6061 aluminum alloy containing niobium, yttrium, and lanthanum, sandblasted, then ultrasonically cleaned with an ethanol solution containing a silane coupling agent, and dried at 85-95℃; S2. The cover plate is made of 304 stainless steel containing 0.15-0.25wt% zirconium and 0.06-0.08wt% cerium, and the sealing groove is pre-cured with modified polyimide adhesive and then butt-fitted to the shell; S3. The weld seam is pre-coated with a nano-coating containing 0.1-0.3wt% titanium hydride, pulsed welded using a 1064nm fiber laser, and protected with a mixture of argon, helium, and nitrogen gas; S4. Post-weld annealing, ultrasonic treatment by immersion in a titanate aqueous solution, and finally vacuum drying. This process optimizes the shell and cover plate materials, resulting in stable welding quality, high weld strength, good corrosion resistance, improved cell sealing performance and long-term reliability, fully automated operation, and excellent production efficiency and product consistency.

The invention discloses a preparation method of a semiconductor device, and relates to the technical field of semiconductor manufacturing. The preparation method comprises the steps that a first wafer bonding piece and a second wafer bonding piece are pre-cleaned respectively, pre-cleaning comprises megasonic assisted SC1 cleaning, and supercritical CO2 drying treatment is carried out on the pre-cleaned first wafer bonding piece and the pre-cleaned second wafer bonding piece respectively to remove moisture of the first wafer bonding piece and the second wafer bonding piece; performing surface activation on the first wafer bonding sheet and the second wafer bonding sheet; and bonding and connecting the first wafer bonding sheet and the second wafer bonding sheet in a silicon-oxygen bonding mode to prepare the semiconductor device. According to the preparation method, the cleaning effect can be improved, the surface roughness can be improved, the water remaining in the hole cavity structure after cleaning can be effectively removed, and the situation that the yield of the semiconductor device is reduced due to the fact that excessive water forms steam bubbles during annealing after bonding is prevented.

This invention provides a 5-series aluminum alloy sheet and its preparation method, relating to the field of aluminum alloy technology. The preparation method includes: S1, mixing the metal raw materials of the 5-series aluminum alloy sheet according to a specified ratio and sequentially melting and casting to obtain an aluminum alloy ingot; S2, sequentially subjecting the aluminum alloy ingot to homogenization treatment, hot rolling treatment, first cold rolling treatment, intermediate annealing, and second cold rolling treatment to obtain a cold-rolled sheet; S3, sequentially subjecting the cold-rolled sheet to final annealing, cooling treatment, and straightening treatment to obtain the 5-series aluminum alloy sheet; wherein the Fe element content in the 5-series aluminum alloy sheet is not less than 0.25% by mass, the final annealing temperature is 520~550℃, the final annealing holding time is 10~60s, the final annealing heating rate is 5~15℃ / s, and the cooling rate of the cooling treatment is 8~16℃ / s. The prepared 5-series aluminum alloy sheet exhibits excellent mechanical properties, formability, and surface quality.

METHOD FOR MANUFACTURING A COATED STEEL SHEET, GALVANIZED STEEL STRIP, GALVANIZED STEEL STRIP, SPOT-WELDED JOINT OF AT LEAST TWO METAL SHEETS AND USE OF A COATED STEEL SHEET. The present invention relates to a method for manufacturing a steel strip, a steel strip with controlled decarburization depth, a spot-welded joint and the use of said steel strip or said spot-welded joint. This invention is particularly suitable for the automotive industry due to the improved resistance to liquid metal embrittlement (LME) along with the target mechanical properties.

The application provides a preparation method of bronze etching material, which comprises the following steps: preparing a bronze etching blank, homogenizing annealing the bronze etching blank to obtain a bronze etching blank for use; roughing the bronze etching blank for use, rolling the roughed bronze etching blank to a first predetermined thickness and cutting edges, and then annealing to obtain a first blank; first finish rolling and first tempering the first blank to obtain a second blank; second finish rolling and second tempering the second blank to obtain a third blank, and the processing rate of the second finish rolling is 30%-35%; third finish rolling and third tempering the third blank to obtain a fourth blank, and the processing rate of the third finish rolling is 10.0-12.5%; fourth finish rolling and fourth tempering the fourth blank to obtain a first finished product, and the processing rate of the fourth finish rolling is 10.0-15.5%; and cleaning and passivating the first finished product to obtain bronze etching strip material. The preparation method of the bronze etching material can realize rapid forming of the bronze etching material and industrialized mass production.

The application discloses a preparation method of a hybrid seed layer assisted growth perovskite film and a perovskite-crystalline silicon laminated solar cell, and belongs to the technical field of solar cells. The perovskite film preparation method provided by the application comprises the following steps: (1) wetly depositing a hybrid seed layer solution on the surface of a substrate, and cooling after heat treatment to obtain a hybrid seed layer; and (2) dryly depositing an inorganic metal salt on the surface of the hybrid seed layer to form an inorganic metal salt layer, and then performing annealing treatment to obtain a perovskite film. The hybrid seed layer has the functions of crystal nucleus induction activity and interface regulation, a stable solid-solid reaction interface is constructed between the substrate and the precursor layer through a low-temperature liquid phase pre-deposition process, and bidirectional interface passivation, crystallization orientation regulation and energy level optimization are simultaneously realized, so that the photoelectric conversion efficiency and long-term operation stability of the laminated cell are significantly improved, and excellent batch preparation repeatability is achieved.

The invention provides a micro thermoelectric equipment processing method, and belongs to the technical field of micro thermoelectric equipment manufacturing. According to the method, firstly, a bottom electrode is processed, then, a P-type thermoelectric leg Sb2Te3 and an N-type thermoelectric leg Bi2Te3 are processed, then, a top suspended electrode is processed, developing liquid is diluted, the developing time is gradually prolonged, photoresist is dissolved to the upper surfaces of the thermoelectric legs or is 0-1 m lower than the upper surfaces of the thermoelectric legs, then, washing is carried out immediately, the undissolved photoresist is reserved at the moment, and finally, the top suspended electrode is processed. Therefore, the electrode serves as a sacrificial layer and helps to complete bridging between the top electrode and the thermoelectric leg, and finally annealing treatment is carried out. The manufacturing process provided by the invention is completely compatible with the processing process of the existing silicon-based microelectronic equipment, and has good universality and compatibility; a multi-layer vertical structure is formed by adopting an alternating process of an ultraviolet lithography technology and a magnetron sputtering technology, and wide-band photoelectric detection and on-chip local temperature regulation and control can be realized.

A nanoimprint DMD fabrication method for wide-viewing-angle double-sided OLED displays belongs to the field of organic light-emitting diodes. The method involves fabricating a photoresist grating structure; spin-coating a PDMS mixture onto a photoresist, applying pressure, and annealing to obtain a PDMS template with a grating structure; fabricating a hole injection / transport layer on a pre-prepared ITO glass substrate, followed by the fabrication of an emissive layer; evaporating an electron transport layer (TmPyPB); and after cooling, imprinting with the PDMS template to obtain a TmPyPB layer with a grating structure. The grating structure has a period of 430±5 nm and a height of 40±5 nm. Evaporating an electron injection layer (LiF), a cathode (Al+Ag), and an outermost cladding layer (HATCN) yields the wide-viewing-angle double-sided OLED. This method improves transmittance and overall brightness, exhibits near-zero haze high transmittance, a Lambertian-like radiation distribution, and excellent color stability at viewing angles greater than 110°.

The invention discloses a method for welding a wear-resistant element on a wear-resistant belt of a drilling tool stabilizer and the drilling tool stabilizer, and the method comprises the following steps: S1, manufacturing the wear-resistant element; s2, a drilling tool stabilizer is prepared, a hole is drilled in a wear-resistant belt of the drilling tool stabilizer, mounting holes distributed in an array mode are formed, and at least part of the structure of each wear-resistant element is embedded into each drilled mounting hole; s3, at least welding and filling the gap between the mounting hole and the wear-resistant element with transition type alloy powder; s4, welding and filling the wear-resistant belt with enhanced alloy powder, and covering the transition type alloy powder and the whole wear-resistant belt; and S5, after the wear-resistant belt is heated, heat preservation is conducted, then annealing cooling is conducted, so that the wear resistance and firmness of the wear-resistant element can be improved, and the service life of the wear-resistant element is prolonged.

The application relates to the alloy processing technical field, in particular to a large-specification Ti2AlNb alloy sheet and a preparation method thereof. The preparation method comprises the following steps: (a) carrying out one-pass rolling on a Ti2AlNb alloy slab along the width and length directions respectively at 1050-1100 DEG C to obtain an intermediate slab; and carrying out annealing treatment on the intermediate slab at 1000-1045 DEG C; (b) carrying out one-pass rolling on the annealed intermediate slab along the width and length directions respectively at 850-980 DEG C, carrying out cladding rolling along the length direction, and then carrying out annealing treatment at 800-950 DEG C. The application sequentially carries out high-temperature reversing rolling, intermediate annealing, low-temperature reversing rolling and post-rolling annealing, controls the transverse and longitudinal deformation amounts of the high-temperature reversing rolling and the low-temperature reversing rolling, guarantees the mechanical properties of the sheet and reduces the transverse and longitudinal performance difference of the sheet.

The invention relates to a high-aluminum steel smelting and continuous casting process adopting EBT electric arc furnace smelting, LF furnace refining, VD vacuum treatment and CC continuous casting, raw materials comprise pig iron, CrMo steel cuttings, carbon cuttings, high manganese, high chromium, ferromolybdenum, ferrosilicon and aluminum blocks, tapping is carried out after C and P in an electric arc furnace are removed to target values, the aluminum blocks are added into a steel ladle before tapping, the Al content is adjusted in advance, LF furnace deoxidation and alloying treatment are carried out, and the high-aluminum steel is obtained. The temperature is measured after vacuum breaking, sampling is conducted, the weak stirring time is larger than or equal to 15 min after calcium lines are fed, the VD station is switched to the CC station, a water gap of a large ladle is sealed through a long water gap, an overall submersed water gap is adopted for a tundish, molten steel in the tundish is subjected to heat preservation through a carbon-free covering agent and double-layer rice hulls, and an argon blowing stopper rod is adopted for the tundish; annealing treatment is carried out after a continuous casting billet is discharged, the method is suitable for smelting high-aluminum steel through a 60t EBT electric arc furnace, a 60t LF furnace and VOD / VD, and the problem that the Al content is unqualified after VD is solved; ca treatment prevents continuous casting flocculation flow; the molten steel utilization rate is improved through continuous casting production.

The invention provides a stress-corrosion-resistant economical austenitic stainless steel and a manufacturing method thereof, and the method comprises the following steps: (1) replacing part of Ni with Mn and N while Mo is not added in a component system during ingredient smelting, and reducing the content of Ni to 4-6%; (2) ensuring that the austenite formation factor AF is greater than or equal to 1.35 during refining; (3) casting; (4) hot rolling; (5) primary cold rolling and annealing: performing cold rolling with the rolling reduction of 5-10% on the black-skin plate or coil obtained by hot rolling, and then annealing and pickling to obtain a white-skin plate or coil; (6) performing second-round cold rolling and annealing, namely performing cold rolling with the rolling reduction of 75-85% on the white-skin plate or coil, and performing annealing and acid pickling; and (7) flattening: performing cold rolling deformation of 3-5% of rolling reduction on the white-skin plate or roll subjected to acid pickling in the step (6), annealing, and performing acid pickling to obtain an austenitic stainless steel product. The method has the advantages of low cost and simple process, and the product still has good stress corrosion resistance.

The invention relates to the technical field of preparation of magnetoelectric materials, and provides an organic-inorganic layered magnetoelectric composite material and a preparation method thereof, and the preparation method of the composite material comprises the following steps: S1, uniformly mixing dimethylformamide, barium titanate and P (VDF-HFP) to obtain a mixed slurry; s2, carrying out tape casting on the mixed slurry on the surface of a frosted plate by adopting a tape casting method, and drying to obtain a P (VDF-HFP) / BaTiO3 composite film; and S3, the dried composite film is quenched and then dried, nickel is sputtered on one face of the composite film, nickel or copper is sputtered on the opposite face of the composite film, and then annealing is conducted to obtain the organic-inorganic layered magnetoelectric composite material. The composite film provided by the invention has excellent electrical performance, magnetic performance and magnetoelectric coupling performance; when a magnetic field perpendicular to the electric signal output direction is applied, the magnetoelectric coupling performance can be enhanced through interface normal stress transfer, and a new thought is provided for preparation of high-performance functional devices.

The invention discloses a method for monitoring the resistance value of a metal film resistor off line, and the method comprises the following specific steps: sequentially depositing a film resistor lower dielectric layer, a chromium-silicon resistor layer, a tungsten-titanium barrier layer and a chromium-silicon film metal upper dielectric layer on a substrate, and then carrying out the annealing treatment, thereby obtaining a first product; removing the tungsten-titanium barrier layer and the chromium-silicon film metal upper dielectric layer of the first product through wet etching to obtain a second product; and detecting the resistance and temperature drift of the second product. According to the method, a silicon substrate with the same model as a product wafer is used, a resistor manufacturing process is adopted, but a photoetching etching process of a thin-film resistor is removed, only deposition and annealing processes are realized, the state of the resistor is determined after annealing, then a medium and a tungsten-titanium barrier layer above the resistor are removed in a wet etching manner, and finally, the resistance value and temperature drift of the resistor are tested. At the moment, the data is close to the Vanderberg resistance of the final actual resistance, so that the effect of finding the process deviation in time can be achieved.

The application discloses a kind of super-thick invar alloy plate of uniform organization and manufacturing method thereof, 6-9t invar alloy steel ingot is prepared by electric furnace→AOD refining→LF refining→VD refining→IC die casting process;Nb element is added in AOD refining process;After that, invar alloy steel ingot carries out stress relief annealing, and adopts three times upsetting and drawing process, upsetting reduction is according to the principle of increment, gradually refines steel ingot surface and heart grain structure, ensures that steel ingot internal organization is fully broken after recrystallization, then forged to target size after annealing, obtains invar alloy plate of thickness ≥50mm after air cooling;The application can prevent the grain coarsening of the heart of super-thick invar alloy plate with thickness greater than 50mm, and obtain super-thick invar alloy plate with grain size ≥4 levels and uniform organization.