A core-shell structure n-titanium dioxide@p-cobalt titanate nanocrystalline film and its preparation method

A titanium dioxide, core-shell structure technology, applied in metal material coating process, vacuum evaporation coating, coating and other directions, to achieve the effect of firm bonding, improving sensitivity, and improving gas sensitivity

Active Publication Date: 2019-03-26
SHAANXI UNIV OF SCI & TECH
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Problems solved by technology

[Hashemian S, Foroghimoqhadam A. Effect of copper doping on CoTiO 3 ilmenite type nanoparticles for removal of congo red from aqueous solution[J].Chemical Engineering Journal,2014,235:299-306.] found that CoTiO 3 The film responds quickly to the ambient humidity [Jing Lu, Yabin Zhang, Zhuan Li, Jianfeng Huang, Yong Wang, Jianpeng Wu, Haiyan He. Rapid response and recovery humidity sensor based on CoTiO 3 thin filmprepared by RF magnetron co-sputtering with post annealing process[J].Ceramics International,2015,41(10):15176–15184], but there is still a certain gap between its sensitive characteristic indicators and the requirements of practical applications

Method used

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  • A core-shell structure n-titanium dioxide@p-cobalt titanate nanocrystalline film and its preparation method
  • A core-shell structure n-titanium dioxide@p-cobalt titanate nanocrystalline film and its preparation method
  • A core-shell structure n-titanium dioxide@p-cobalt titanate nanocrystalline film and its preparation method

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preparation example Construction

[0026] The preparation method of the present invention comprises the following steps:

[0027] (1) Install the cleaned substrate on the sample stage of the magnetron sputtering instrument, CoTiO 3 Target and TiO 2 The targets are respectively installed on two different RF target positions of the magnetron sputtering apparatus.

[0028] (2) Regulation of CoTiO 3 The angle between the normal direction of target sputtering and the substrate normal is 0°~90°, and then adjust the CoTiO 3 The distance between the target and the substrate is between 1cm and 7cm.

[0029] (3) Vacuumize to make the vacuum degree of the sputtering coating chamber reach 1.0×10 -4 Pa~9.9×10 -4 Pa, and then inject Ar gas, so that the working pressure of Ar gas in the sputtering coating chamber is 0.1Pa ~ 2Pa, CoTiO 3 The pre-sputtering of the target takes 5-15 minutes, preferably 10 minutes, and the target power is 100W-400W.

[0030] (4) Set the substrate heating program, the temperature rise rate ...

Embodiment 1

[0035] (1) Install the cleaned substrate on the sample stage, CoTiO 3 Target and TiO 2 The targets are respectively installed on two different RF target positions of the magnetron sputtering apparatus.

[0036] (2) Regulation of CoTiO 3 The angle between the normal direction of target sputtering and the substrate normal is 80°, and the CoTiO 3 The distance between target and substrate is 5cm.

[0037] (3) Vacuumize to make the vacuum degree of the sputtering coating chamber reach 1.0×10 -4 Pa, the working pressure of Ar gas in the sputtering coating chamber is 0.2Pa, CoTiO 3 The target is pre-sputtered for 10 minutes, and the target power supply is 400W.

[0038] (4) Set the substrate heating program, the heating rate is 10°C / min, the temperature is raised to 400°C and kept warm. Then CoTiO 3 The target starts sputtering, the target power is 400W, the sputtering time is 90min, and CoTiO 3 Ordered nanocrystalline films after switching off CoTiO 3 target power.

[0039...

Embodiment 2

[0044] (1) Install the cleaned substrate on the sample stage, CoTiO 3 Target and TiO 2 The targets are respectively installed on two different RF target positions of the magnetron sputtering apparatus.

[0045] (2) Regulation of CoTiO 3 The angle between the normal direction of target sputtering and the substrate normal is 50°, and the CoTiO 3 The distance between the target and the substrate is 1 cm.

[0046] (3) Vacuumize to make the vacuum degree of the sputtering coating chamber reach 1.0×10 -4 Pa, the working pressure of Ar gas in the sputtering coating chamber is 0.5Pa, CoTiO 3 The target is pre-sputtered for 10 minutes, and the target power supply is 300W.

[0047] (4) Set the substrate heating program, the heating rate is 20°C / min, the temperature is raised to 400°C and kept warm. Then CoTiO 3 The target starts sputtering, the target power is 300W, the sputtering time is 90min, and CoTiO 3 Ordered nanocrystalline films after switching off CoTiO 3 target power....

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Abstract

The invention relates to a core shell structure n - titanium dioxide @ p - cobalt titanate nanocrystalline thin film and a preparing method thereof. A clean substrate is installed on a sample stage of a magnetron sputtering device firstly, and a CoTiO3 target and a TiO2 target are installed at two radio frequency target positions of the magnetron sputtering device correspondingly; a sputtering film coating chamber of the magnet control sputtering device is vacuumized and injected with inactive gas, and gas pressure of the sputtering film coating chamber is kept at 0.1Pa - 2Pa; the CoTiO3 target is pre-sputtered for 5min - 15min; the substrate is heated up to 300 DEG C - 600 DEG C and is subjected to heat preservation, sputtering of the CoTiO3 target is started for 30min - 90min, and a CoTiO3 orderly nanocrystalline thin film is obtained; and the CoTiO3 orderly nanocrystalline thin film is adjusted to be parallel with the TiO2 target, the TiO2 target is sputtered for 10s - 120s, and the core shell structure n - titanium dioxide @ p - cobalt titanate nanocrystalline thin film is obtained. According to the core shell structure n - titanium dioxide @ p - cobalt titanate nanocrystalline thin film and the preparing method thereof, appearance of the thin film can be adjusted effectively, the film-forming property is good, operation is convenient, the producing period is short, efficiency is high, and the core shell structure n - titanium dioxide @ p - cobalt titanate nanocrystalline thin film and the preparing method thereof are suitable for industrial production.

Description

technical field [0001] The invention relates to the field of nanocrystalline thin films, in particular to a core-shell structure n-titanium dioxide@p-cobalt titanate nanocrystalline thin film and a preparation method thereof. Background technique [0002] Ferro-titanium CoTiO 3 is a kind from Al 2 o 3 Oxygen compounds of corundum structure. [Hashemian S, Foroghimoqhadam A. Effect of copper doping on CoTiO 3 ilmenite type nanoparticles for removal of congo red from aqueous solution[J].Chemical Engineering Journal,2014,235:299-306.] found that CoTiO 3 The film responds quickly to the ambient humidity [Jing Lu, Yabin Zhang, Zhuan Li, Jianfeng Huang, Yong Wang, Jianpeng Wu, Haiyan He. Rapid response and recovery humidity sensor based on CoTiO 3 thin filmprepared by RF magnetron co-sputtering with post annealing process[J].Ceramics International,2015,41(10):15176–15184], but there is still a certain gap between its sensitive characteristic indicators and the requirements of ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35C23C14/08
CPCC23C14/08C23C14/352
Inventor 卢靖史欢梁阔燚姚恺徐培光权潇白杨杨陶赟
Owner SHAANXI UNIV OF SCI & TECH
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