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Condensation method and condensation system for polysilicon reduction tail gas

A condensing system and polysilicon technology, applied in the field of condensation of polysilicon reduction tail gas and condensation system of polysilicon reduction tail gas, can solve problems such as unreasonable utilization of cooling capacity and loss of cooling capacity, and achieve rational utilization, reduce production energy consumption, and realize The effect of cooling

Active Publication Date: 2019-10-22
XINTE ENERGY
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] It can be seen that during the implementation of the above-mentioned technical solution, liquid-phase chlorosilanes at temperatures of 15 to 20°C, -10 to -15°C, -20 to -25, and -35 to -45°C are all sent to the chlorosilane buffer. In tank D, chlorosilanes in different temperature ranges are mixed, so that the temperature of chlorosilanes at higher temperatures (such as 15-20°C) is lowered, while the temperature of chlorosilanes at lower temperatures (such as -35-45°C) The temperature of silane rises, resulting in the loss of cooling capacity, and the utilization of cooling capacity is unreasonable

Method used

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  • Condensation method and condensation system for polysilicon reduction tail gas
  • Condensation method and condensation system for polysilicon reduction tail gas

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Embodiment 1

[0042] This embodiment provides a method for condensing polysilicon reduction tail gas, which is used to condense and separate the reduction tail gas in the polysilicon production process. The reduction tail gas includes hydrogen, hydrogen chloride gas and gas phase chlorosilane, and the gas phase chlorosilane includes A mixture of silicon, trichlorosilane and dichlorodihydrosilane.

[0043] Such as figure 1 As shown, the condensation method includes the following steps S101 to S107.

[0044] Step S101. Using ambient air to cool the reduction tail gas to obtain the reduction tail gas after cooling for the first time.

[0045] In this step, the temperature range of the reduction tail gas is 80-200°C. The reduction tail gas in this temperature range is obtained after preliminary cooling treatment of the reduction tail gas output from the reduction furnace. Otherwise, the outlet temperature of the reduction furnace is too high, and the Conducive to later recycling.

[0046] Sp...

Embodiment 2

[0069] This embodiment provides a polysilicon reduction tail gas condensation system, which is used to condense and separate the reduction tail gas in the polysilicon production process. The reduction tail gas includes hydrogen, hydrogen chloride gas and gaseous chlorosilane, and the gaseous chlorosilane includes A mixture of silicon, trichlorosilane and dichlorodihydrosilane.

[0070] Such as figure 2 As shown, the condensing system includes an air cooler E1, a chlorosilane heat exchanger E2, an air-air heat exchanger E3, a frozen brine heat exchanger E4, a deep cooler E5, a first chlorosilane separation tank V1 and a second chlorine Silane separation tank V2, the above equipment is connected by pipeline, and the connection between pipeline and each equipment is connected by flange.

[0071] Wherein, the air cooler E1 is used to cool the reduction tail gas with ambient air, and output the reduction tail gas after the first cooling.

[0072] In this embodiment, the temperat...

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Abstract

The invention provides a method for condensing polysilicon reduction tail gas, comprising: using ambient air to carry out the first cooling treatment on the reduction tail gas; using the cooling capacity from the absorption tower reactor to carry out the second cooling treatment on the reduction tail gas after the first cooling Cooling treatment; use frozen brine to perform the third cooling treatment on the reduced tail gas after the second cooling; perform the first gas-liquid separation treatment on the reduced tail gas after the third cooling; use refrigerant to perform the first gas-liquid separation treatment The non-condensable gas obtained after cooling is processed; the non-condensable gas after refrigerant cooling is subjected to gas-liquid separation treatment for the second time, and the liquid-phase chlorosilane obtained after the gas-liquid separation is mixed twice and then output to the desorption tower; The cooling capacity of the non-condensable gas obtained after the second gas-liquid separation is used to cool the reduced tail gas after the second cooling before cooling with frozen brine. Accordingly, a condensation system is provided. The cooling capacity utilization of the condensation method and the condensation system of the invention is reasonable.

Description

technical field [0001] The invention relates to the technical field of polysilicon production, in particular to a polysilicon reduction tail gas condensation method and a polysilicon reduction tail gas condensation system. Background technique [0002] Polysilicon is the building block material for the solar photovoltaic industry. At present, the production of polysilicon mainly adopts the improved Siemens method (that is, the reduction method of trichlorosilane), which refers to the use of vapor deposition method in the reduction furnace through H 2 to reduce SiHCl 3 Thereby preparing polysilicon, the specific reaction equation is: [0003] 3SiHCl 3 +H 2 →2Si+5HCl+SiCl 4 [0004] Because the temperature and other conditions in the reduction furnace are difficult to achieve uniformity, the actual reduction process is very complicated, accompanied by side reactions, which makes the components in the reduction tail gas more complicated, mainly including H 2 , HCl gas an...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01D53/00B01D5/00
CPCB01D5/0036B01D53/002B01D2256/16Y02P70/10
Inventor 王东杨海军苟海龙牛潇萌摆军李国苑常芙萍
Owner XINTE ENERGY