Modification method for improving bacterium resistance by armoring POSS (Polyhedral Oligomeric Silsesquioxane) on surface of polyamide reverse osmosis membrane
A technology of reverse osmosis membrane and polyamide, applied in reverse osmosis, semi-permeable membrane separation, chemical instruments and methods, etc., can solve the problem of being susceptible to bacterial contamination, and achieve improved anti-bacterial contamination, convenient preparation, high anti-bacterial performance effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
specific Embodiment approach 1
[0023] Specific embodiment one: what this embodiment records is a kind of modification method that the surface of POSS armored polyamide reverse osmosis membrane improves bacterial resistance, and the concrete steps of described method are as follows:
[0024] Step 1: the configuration mass fraction is the mixed solution of 2.3% camphorsulfonic acid, 0.1% sodium dodecylbenzenesulfonate and 2% m-phenylenediamine;
[0025] Step 2: Immerse the surface of the polyethersulfone base membrane in the mixed solution prepared in Step 1 for 10 minutes;
[0026] Step 3: Take out the polyethersulfone base membrane in step 2, let it dry in the air for 5-10 minutes, and remove the excess mixed solution on the surface of the polyethersulfone base membrane;
[0027] Step 4: Submerge the polyethersulfone base membrane obtained in Step 3 in 1,3,5-trimesoyl chloride n-hexane solution with a mass fraction of 0.1%, and keep it for 1 min;
[0028] Step 5: Take out the polyethersulfone base membrane...
specific Embodiment approach 2
[0031] Specific embodiment two: the modification method that the surface of a kind of POSS armored polyamide reverse osmosis membrane described in specific embodiment one improves antibacterial resistance, in step 6, described POSS-NH 2 ·The mass fraction of HCl is 0.1~1%.
specific Embodiment approach 3
[0032] Embodiment 3: In Embodiment 1, a method for modifying the surface of a POSS armored polyamide reverse osmosis membrane to improve bacterial resistance, in step 6, the retention time is 5 to 10 minutes.
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 


