Metallization coating method for through hole of film circuit
A thin-film circuit and metallization technology, applied in the field of thin-film circuit through-hole metallization coating, can solve the problems of diffraction and sputtering film layers, etc., and achieve the effect of simple operation, solving peeling off, and easy and easy operation.
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[0030] The specific embodiment of the present invention will be further described below in conjunction with accompanying drawing and specific embodiment:
[0031] combine figure 1 and figure 2 , a thin film circuit through-hole metallization coating method, comprising the following steps:
[0032] Step 1: Provide a thin film circuit substrate of the required type and size, and use a laser drilling machine to perform through-hole processing on the thin film circuit substrate.
[0033] The thin film circuit substrate is made of aluminum oxide substrate with a purity of more than 99.6% or an aluminum nitride substrate or a quartz substrate with a purity of 98%, and the thickness of the substrate is 0.1mm to 0.65mm. For example, the selected hard dielectric substrate material is alumina ceramics with a purity of 99.6%, and a thickness of 0.254mm. Use a laser drilling machine, set the spiral interval to 0.01mm, automatically position through the equipment, scan 200 times with an...
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